Prosecution Insights
Last updated: October 24, 2026
Application No. 18/523,314

SEMICONDUCTOR PACKAGE

Non-Final OA §103
Filed
Nov 29, 2023
Priority
Dec 07, 2022 — RE 10-2022-0170052
Examiner
BELOUSOV, ALEXANDER
Art Unit
2818
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
402 granted / 525 resolved
+8.6% vs TC avg
Strong +16% interview lift
Without
With
+16.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
30 currently pending
Career history
559
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
61.9%
+21.9% vs TC avg
§102
25.0%
-15.0% vs TC avg
§112
12.2%
-27.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 525 resolved cases

Office Action

§103
DETAILED ACTION Allowable Subject Matter Claim 17 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter. Claim 17 recites the details of lower trenches, including what they overlap and what they do not overlap. The combination of these limitations is not found in the prior art. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1, 3-5, 7-11 & 19 are rejected under 35 U.S.C. 103 as being unpatentable over (US-2015/0318261) by Chung et al (“Chung”) in view of (US-2017/0358558) by Lee et al (“Lee”). Regarding claim 1, Chung discloses in FIG. 5 and related text, e.g., a semiconductor package (300) comprising: a lower chip (340); a chip stacked structure (various 309’s) arranged on the lower chip, the chip stacked structure comprising a plurality of upper chips (four 309’s are shown); an underfill layer (317) disposed between the lower chip and the chip stacked structure and between the plurality of upper chips (see FIG. 5); and a molding layer (319) surrounding the underfill layer and the chip stacked structure. Chung does not disclose “wherein the lower chip has at least one lower trench positioned on an upper surface of the lower chip, and at least one of the plurality of upper chips has at least one upper trench positioned on an upper surface of the at least one of the plurality of upper chips”. Lee discloses in FIG. 6 and related text, e.g., “wherein the lower chip (110; see par. 28) has at least one lower trench (150) positioned on an upper surface of the lower chip (see FIG. 6), and at least one of the plurality of upper chips (210/310/410) has at least one upper trench (250/350/450) positioned on an upper surface of the at least one of the plurality of upper chips”. It would have been obvious to one of ordinary skill in the art at the time of the invention to modify the device of Chung with “wherein the lower chip has at least one lower trench positioned on an upper surface of the lower chip, and at least one of the plurality of upper chips has at least one upper trench positioned on an upper surface of the at least one of the plurality of upper chips” as taught by Lee, in order to allow for more area for underfill layer to occupy, thus resulting in a better control of underfill process, and in order to increase the surface area of chip, thus resulting in a better heat dissipation (due to heat dissipating from larger total area). Regarding claim 3, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein: the at least one upper trench overlaps the underfill layer in a vertical direction (see FIG. 6 of Lee; also compare to FIG. 5 of Chung; in both cases the limitations are met; hence, the limitations are met in combined device); and the at least one upper trench is filled with the underfill layer (see FIG. 6 of Lee). Regarding claim 4, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein each of the plurality of upper chips except for an uppermost chip of the plurality of upper chips includes the at least one upper trench (such an embodiment is disclosed in FIG. 1 of Lee, for example). Regarding claim 5, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein the at least one upper trenches of the plurality of upper chips overlap each other in a vertical direction (see FIG. 6 of Lee). Regarding claim 7, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein at least one of a cross section of the at least one lower trench and a cross section of the at least one upper trench has a shape selected from a quadrangular shape (see FIG. 6 of Lee), a triangular shape, and a U shape. Regarding claim 8, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein at least one of the at least one lower trench and the at least one upper trench comprises a plurality of trenches each having a circular shape in a plan view (see FIG. 5 of Lee and par. 51; it makes clear that even though squares are shown, the trenches may have “various shapes”; “circular shape” is one of the examples of basic shapes, and thus the “circular shape” is at the very least obvious in light of Lee’s explicit teachings), the plurality of trenches are arranged along an edge of the upper surface of the lower chip and an upper chip of the plurality of upper chips, respectively, to be spaced apart from each other (see FIGs. 5-6). Regarding claim 9, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein the at least one upper trench and the at least one lower trench have different shapes from each other in a plan view (see par. 51 of Lee; shapes not being the same shape is explicitly taught, without any limitations; thus, the above limitations are at the very least obvious in light of Lee’s explicit teachings). Regarding claim 10, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein: each of the lower chip and the chip stacked structure configures highband memory (HBM) (see pars. 23-24; such an arrangement is explicitly taught); and each of the plurality of upper chips of the chip stacked structure comprises dynamic random access memory (DRAM) (see pars. 23-24; such an arrangement is explicitly taught). Regarding claim 11, the combined device of Chung and Lee disclose in cited figures and related text, e.g., wherein the lower chip and at least some of the plurality of upper chips comprise through electrodes (FIG. 5 of Chung, 315 and FIG. 6 of Lee, 130) penetrating the lower chip and the at least some of the plurality of upper chips (see the cited figures), respectively, in a vertical direction. Regarding claim 19, the combined device of Chung and Lee disclose in cited figures and related text, e.g., a semiconductor package comprising: a package substrate (FIG. 5 of Chung, 100); a redistribution structure (inside 200) arranged on the package substrate; a sub-semiconductor package (300) arranged on the redistribution structure; and a semiconductor chip (400) arranged on the redistribution structure and spaced apart from the sub-semiconductor package in a horizontal direction, wherein the sub-semiconductor package comprises a lower chip (see claim 1), a chip stacked structure arranged on the lower chip (see claim 1), the chip stacked structure comprising a plurality of upper chips (see claim 1), an underfill layer disposed between the lower chip and the chip stacked structure and between the plurality of upper chips (see claim 1), and a molding layer surrounding the underfill layer and the chip stacked structure (see claim 1), wherein the lower chip has at least one lower trench positioned on an upper surface of the lower chip (see claim 1), and at least one of the plurality of upper chips has at least one upper trench positioned on an upper surface of the at least one of the plurality of upper chips (see claim 1). Claims 2, 12, 14-16, 18 & 20 are rejected under 35 U.S.C. 103 as being unpatentable over (US-2015/0318261) by Chung et al (“Chung”) in view of (US-2017/0358558) by Lee et al (“Lee”) as applied to claim(s) above, and further in view of (US-2020/0343198) by Tsai et al (“Tsai”). Regarding claim 2, Chung and Lee disclose substantially the entire claimed structure as recited in above claims, except “a portion of the at least one lower trench overlaps the molding layer in a vertical direction, and a remaining portion of the at least one lower trench overlaps the underfill layer in the vertical direction, the portion of the at least one lower trench overlapping the molding layer in the vertical direction is filled with the molding layer; and the remaining portion of the at least one lower trench overlapping the underfill layer in the vertical direction is filled with the underfill layer”. Tsai discloses in FIG. 1M and related text, e.g., “a portion of the at least one lower trench (123) overlaps the molding layer (170, see par. 60) in a vertical direction (see FIG. 1M), and a remaining portion of the at least one lower trench overlaps the underfill layer (160) in the vertical direction (see FIG. 1M), the portion of the at least one lower trench overlapping the molding layer in the vertical direction is filled with the molding layer (see FIG. 1M); and the remaining portion of the at least one lower trench overlapping the underfill layer in the vertical direction is filled with the underfill layer (see FIG. 1M).” It would have been obvious to one of ordinary skill in the art at the time of the invention to further modify the device of Chung and Lee with “a portion of the at least one lower trench overlaps the molding layer in a vertical direction, and a remaining portion of the at least one lower trench overlaps the underfill layer in the vertical direction, the portion of the at least one lower trench overlapping the molding layer in the vertical direction is filled with the molding layer; and the remaining portion of the at least one lower trench overlapping the underfill layer in the vertical direction is filled with the underfill layer” as taught by Tsai, in order to simplify the processing steps of making the packaged device, by preventing the underfill layer from reaching the scribe line, thus shrinkage volume of the underfill layer is reduced and warpage of package due to thermal expansion mismatch is also reduced (see par. 65). Regarding claim 12, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., a semiconductor package comprising: a lower chip (see claim 1); a chip stacked structure arranged on the lower chip, the chip stacked structure comprising a plurality of upper chips (see claim 1); an underfill layer disposed between the lower chip and the chip stacked structure and between the plurality of upper chips (see claim 1); and a molding layer surrounding the underfill layer and the chip stacked structure (see claim 1), wherein the lower chip has at least one lower trench positioned on an upper surface of the lower chip (see claim 1), a portion of the at least one lower trench overlaps the molding layer in a vertical direction (see claim 2), and a remaining portion of the at least one lower trench overlaps the underfill layer in the vertical direction (see claim 2), and the portion of the at least one lower trench overlapping the molding layer in the vertical direction is filled with the molding layer (see claim 2), and the remaining portion of the at least one lower trench overlapping the underfill layer in the vertical direction is filled with the underfill layer (see claim 2). Regarding claim 14, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., wherein a cross section of the at least one lower trench has a shape selected from a quadrangular shape, a triangular shape, and a U shape (see claim 7). Regarding claim 15, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., wherein: the at least one lower trench comprises a plurality of trenches arranged along an edge of the upper surface of the lower chip to be spaced apart from each other (see FIG. 5 of Lee; it shows a two trench variant); and each of the plurality of trenches has a circular shape in a plan view (see claim 8; such an arrangement is at the very least obvious in light of Lee’s explicit teachings). Regarding claim 16, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., wherein a plurality of lower trenches are arranged in two rows along the edge of the upper surface of the lower chip in a plan view (see FIG. 5 of Lee). Regarding claim 18, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., wherein a vertical length of the at least one lower trench is in a range of about 1 um to about 500 um (see par. 33 of Tsai). Regarding claim 20, the combined device of Chung, Lee and Tsai disclose in cited figures and related text, e.g., wherein: a portion of the at least one lower trench overlaps the molding layer in a vertical direction (see claim 2), and a remaining portion of the at least one lower trench overlaps the underfill layer in the vertical direction (see claim 2); the portion of the at least one lower trench overlapping the molding layer in the vertical direction is filled with the molding layer (see claim 2), and the remaining portion of the at least one lower trench overlapping the underfill layer in the vertical direction is filled with the underfill layer (see claim 2); and each of the lower chip and the chip stacked structure configures highband memory (HBM), and each of the plurality of upper chips of the chip stacked structure comprises dynamic random access memory (DRAM) (see claim 10). Conclusion Additional references (if any) are cited on the PTO-892 as disclosing similar features to those of the instant invention. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Alexander Belousov whose telephone number is (571)-272-3167. The examiner can normally be reached on 10 am-4 pm. If attempts to reach the examiner by telephone are unsuccessful, the examiner's supervisor, Jeff Natalini can be reached on 571-272-2266. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Alexander Belousov/Patent Examiner, Art Unit 2894 09/27/26 /JEFF W NATALINI/Supervisory Patent Examiner, Art Unit 2818
Read full office action

Prosecution Timeline

Nov 29, 2023
Application Filed
Oct 02, 2026
Non-Final Rejection mailed — §103
Oct 19, 2026
Interview Requested

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12765081
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
3y 2m to grant Granted Oct 13, 2026
Patent 12757514
THREE-LAYERED STACKED IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME
3y 2m to grant Granted Oct 06, 2026
Patent 12751083
HYBRID CELL HEIGHT DESIGN WITH A BACKSIDE POWER DISTRIBUTION NETWORK
3y 9m to grant Granted Sep 29, 2026
Patent 12740155
BACKSIDE CONDUCTING LINES IN INTEGRATED CIRCUITS
2y 5m to grant Granted Sep 15, 2026
Patent 12733277
LIGHT SHIELD FOR PIXEL OF IMAGE SENSOR
3y 5m to grant Granted Sep 08, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
93%
With Interview (+16.3%)
2y 11m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 525 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month