Prosecution Insights
Last updated: July 17, 2026
Application No. 18/523,332

HEATER LIFE PREDICTION METHOD, HEAT TREATMENT APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM

Non-Final OA §102
Filed
Nov 29, 2023
Priority
Dec 01, 2022 — JP 2022-193000
Examiner
NIMOX, RAYMOND LONDALE
Art Unit
2896
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
NuFlare Technology Inc.
OA Round
1 (Non-Final)
70%
Grant Probability
Favorable
1-2
OA Rounds
5m
Est. Remaining
81%
With Interview

Examiner Intelligence

Grants 70% — above average
70%
Career Allowance Rate
330 granted / 472 resolved
+1.9% vs TC avg
Moderate +11% lift
Without
With
+10.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
36 currently pending
Career history
523
Total Applications
across all art units

Statute-Specific Performance

§101
22.5%
-17.5% vs TC avg
§103
45.5%
+5.5% vs TC avg
§102
17.5%
-22.5% vs TC avg
§112
12.8%
-27.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 472 resolved cases

Office Action

§102
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1-12 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by SUZUKI ET AL. (US 20050056635 A1) (hereinafter “SUZUKI”). With respect to Claim(s) 1, SUZUKI teaches ‘Heater Inspection Apparatus And Semiconductor Manufacturing Apparatus Having Heater Inspection Apparatus Mounted Thereon’ and the BRI of: A heater life prediction method (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) comprising predicting a life (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) of a heater in a semiconductor manufacturing apparatus (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) comprising a treatment chamber in which a treatment of a substrate is performed (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), and the heater configured to heat the substrate loaded into the treatment chamber (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), wherein prediction of the life of the heater comprises: calculating a resistance change amount being a difference between a resistance value of the heater and an initial value of the resistance value, or a resistance change rate obtained by dividing the resistance change amount by the initial value (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) in a step in which constant output control is executed on the heater between the treatments of different substrates (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2); and predicting the life of the heater on a basis of the calculated resistance change amount or the calculated resistance change rate (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2). With respect to Claim(s) 5, SUZUKI teaches ‘Heater Inspection Apparatus And Semiconductor Manufacturing Apparatus Having Heater Inspection Apparatus Mounted Thereon’ and the BRI of:: A heat treatment apparatus (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) comprising: a treatment chamber in which a treatment of a substrate is performed (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2); a heater configured to heat the substrate loaded into the treatment chamber (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2); and a life predictor configured to predict a life of the heater (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), wherein the life predictor calculates a resistance change amount being a difference between a resistance value of the heater and an initial value of the resistance value, or a resistance change rate obtained by dividing the resistance change amount by the initial value (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) in a step in which constant output control is executed on the heater between the treatments of different substrates (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), and predicts the life of the heater on a basis of the calculated resistance change amount or the calculated resistance change rate (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2). With respect to Claim(s) 9, SUZUKI teaches ‘Heater Inspection Apparatus And Semiconductor Manufacturing Apparatus Having Heater Inspection Apparatus Mounted Thereon’ and the BRI of:: A non-transitory computer-readable storage medium having a heater life prediction program stored therein to cause a computer to perform a procedure (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) for predicting a life of a heater in a heat treatment apparatus (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) comprising a treatment chamber in which a treatment of a substrate is performed (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), and the heater configured to heat the substrate loaded into the treatment chamber (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2), the procedure comprising: calculating a resistance change amount being a difference between a resistance value of the heater and an initial value of the resistance value, or a resistance change rate obtained by dividing the resistance change amount by the initial value (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2) in a step in which constant output control is executed on the heater between the treatments of different substrates (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2); and predicting the life of the heater on a basis of the calculated resistance change amount or the calculated resistance change rate (See, e.g., ¶ 0099, 0133-0135; See also, e.g., Fig(s). 2). With respect to Claim(s) 2, 6, 10, SUZUKI teaches the BRI of the parent claim(s). SUZUKI further teaches the BRI of: the life of the heater is predicted based on a relation between the resistance change amount or the resistance change rate and a preset threshold (See, e.g., ¶ 0028). With respect to Claim(s) 3, 7, 11, SUZUKI teaches the BRI of the parent claim(s). SUZUKI further teaches the BRI of: notifying a user that the heater is close to an end of the life (See, e.g., ¶ 0028). With respect to Claim(s) 4, 8, 12, SUZUKI teaches the BRI of the parent claim(s). SUZUKI further teaches the BRI of: the step in which the constant output control is executed is at least one of a film forming step of forming a film on the substrate, a temperature decreasing step of decreasing a temperature of the substrate, and an unloading step of unloading the substrate from the treatment chamber (See, e.g., ¶ 0004, 0020). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to RAYMOND NIMOX whose telephone number is (469)295-9226. The examiner can normally be reached Mon-Thu 10am-8pm CT. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, ANDREW SCHECHTER can be reached at (571) 272-2302. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. RAYMOND NIMOX Primary Examiner Art Unit 2857 /RAYMOND L NIMOX/Primary Examiner, Art Unit
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Prosecution Timeline

Nov 29, 2023
Application Filed
Jun 29, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
70%
Grant Probability
81%
With Interview (+10.9%)
3y 1m (~5m remaining)
Median Time to Grant
Low
PTA Risk
Based on 472 resolved cases by this examiner. Grant probability derived from career allowance rate.

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