Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
12 pending office actions • 2 art units • 9 examiners • 0 of 12 (0%) have an AI response strategy ready • 33 patents granted in the last 365 days
NuFlare Technology Inc. has 12 pending office actions within the Semiconductors, Circuits & Optics technology area. These actions are handled by 9 distinct examiners. Despite the number of examiners, the portfolio is concentrated within 2 distinct art units. This concentration suggests that while many examiners are involved, the subject matter remains focused within a narrow technical range at the patent office.
Laura Eloise Gourlie is the busiest examiner for the company, with 3 pending office actions. This concentration under one examiner represents a significant portion of the 12 pending office actions currently active for the portfolio. The involvement of 9 distinct examiners indicates a diverse set of perspectives within the 2 distinct art units. Managing 12 pending office actions across 9 distinct examiners requires coordination across multiple individual dockets within the Semiconductors, Circuits & Optics sector to ensure consistent results.
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 + other | 1 (8%) |
| §103 only | 3 (25%) |
| §102 only | 1 (8%) |
| §112 only | 2 (17%) |
| Multi-statute (no §101) | 5 (42%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| GOURLIE, LAURA ELOISE | 3 | 64.4% | +38.8% |
| WANG, JING | 2 | 100.0% | +0.0% |
| FEATHERLY, HANA SANEI | 1 | 74.3% | +18.4% |
| SIMPSON, LIXI CHOW | 1 | 74.0% | +8.9% |
| MCCORMACK, JASON L | 1 | 84.6% | +8.1% |
| KALISZEWSKI, ALINA ROSE | 1 | 84.4% | +23.8% |
| GASSEN, CHRISTOPHER J | 1 | 79.6% | +25.0% |
| LOGIE, MICHAEL J | 1 | 63.4% | +9.3% |
| FORD, NATHAN K | 1 | 32.8% | +35.4% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18911476 | METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM | WANG, JING | — |
| 18890971 | MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS | MCCORMACK, JASON L | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 6 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18343128 | BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS | GOURLIE, LAURA ELOISE | 45d overdue |
| 18909190 | ELECTROMAGNETIC LENS, SCANNING ELECTRON MICROSCOPE, AND MULTI-ELECTRON BEAM INSPECTION APPARATUS | GOURLIE, LAURA ELOISE | — |
| 18823820 | MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD | WANG, JING | — |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | — |
| 18733003 | METHOD FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, APPARATUS FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, STORAGE MEDIUM, AND ELECTRON BEAM LITHOGRAPHY APPARATUS | GASSEN, CHRISTOPHER J | — |
| 18635723 | BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING APPARATUS | LOGIE, MICHAEL J | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 7 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18343128 | BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS | GOURLIE, LAURA ELOISE | 45d overdue |
| 18136461 | VAPOR PHASE GROWTH APPARATUS | FORD, NATHAN K | 3d overdue |
| 19008101 | PHOTOELECTRON SOURCE, MULTI-PHOTOELECTRON SOURCE AND MULTI-BEAM IRRADIATION APPARATUS | FEATHERLY, HANA SANEI | — |
| 18914392 | BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM | GOURLIE, LAURA ELOISE | — |
| 18909190 | ELECTROMAGNETIC LENS, SCANNING ELECTRON MICROSCOPE, AND MULTI-ELECTRON BEAM INSPECTION APPARATUS | GOURLIE, LAURA ELOISE | — |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | — |
| 18733003 | METHOD FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, APPARATUS FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, STORAGE MEDIUM, AND ELECTRON BEAM LITHOGRAPHY APPARATUS | GASSEN, CHRISTOPHER J | — |
| Art Unit | Apps |
|---|---|
| 2881 | 2 |
| 1716 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19008101 | PHOTOELECTRON SOURCE, MULTI-PHOTOELECTRON SOURCE AND MULTI-BEAM IRRADIATION APPARATUS | FEATHERLY, HANA SANEI | — | §103 | Non-Final OA | — | Pending | Jan 02, 2025 |
| 18914392 | BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM | GOURLIE, LAURA ELOISE | — | §112 | Non-Final OA | — | Pending | Oct 14, 2024 |
| 18911476 | METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM | WANG, JING | — | §103 | Non-Final OA | — | Pending | Oct 10, 2024 |
| 18910271 | INSPECTION APPARATUS AND METHOD FOR GENERATING INSPECTION IMAGE | SIMPSON, LIXI CHOW | — | §102 | Non-Final OA | — | Pending | Oct 09, 2024 |
| 18909190 | ELECTROMAGNETIC LENS, SCANNING ELECTRON MICROSCOPE, AND MULTI-ELECTRON BEAM INSPECTION APPARATUS | GOURLIE, LAURA ELOISE | — | §103§112 | Non-Final OA | — | Pending | Oct 08, 2024 |
| 18890971 | MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS | MCCORMACK, JASON L | — | §112 | Non-Final OA | — | Pending | Sep 20, 2024 |
| 18823820 | MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD | WANG, JING | — | §102§103§112 | Non-Final OA | — | Pending | Sep 04, 2024 |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | KALISZEWSKI, ALINA ROSE | — | §102§103§112 | Non-Final OA | — | Pending | Jul 01, 2024 |
| 18733003 | METHOD FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, APPARATUS FOR DETERMINING LINE SEGMENT INTERSECTIONS IN FIGURE OF WRITING DATA, STORAGE MEDIUM, AND ELECTRON BEAM LITHOGRAPHY APPARATUS | GASSEN, CHRISTOPHER J | — | §101§102§103§112 | Non-Final OA | — | Pending | Jun 04, 2024 |
| 18635723 | BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING APPARATUS | LOGIE, MICHAEL J | 2881 | §102§103 | Final Rejection | — | Pending | Apr 15, 2024 |
| 18343128 | BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS | GOURLIE, LAURA ELOISE | 2881 | §102§103§112 | Final Rejection | 45d overdue | Pending | Jun 28, 2023 |
| 18136461 | VAPOR PHASE GROWTH APPARATUS | FORD, NATHAN K | 1716 | §103 | Final Rejection | 3d overdue | Pending | Apr 19, 2023 |
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