Prosecution Insights
Last updated: April 19, 2026
Application No. 18/524,770

METHOD OF MANUFACTURING BONDED SUBSTRATE, METHOD OF MANUFACTURING CIRCUIT SUBSTRATE, AND CIRCUIT SUBSTRATE

Non-Final OA §102§103
Filed
Nov 30, 2023
Examiner
MAIGA, SIDI MOHAMED
Art Unit
2847
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
NGK Insulators Ltd.
OA Round
1 (Non-Final)
76%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
85%
With Interview

Examiner Intelligence

Grants 76% — above average
76%
Career Allow Rate
22 granted / 29 resolved
+7.9% vs TC avg
Moderate +9% lift
Without
With
+9.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
32 currently pending
Career history
61
Total Applications
across all art units

Statute-Specific Performance

§103
64.2%
+24.2% vs TC avg
§102
28.5%
-11.5% vs TC avg
§112
6.6%
-33.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 29 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group II in the reply filed on 09/30/2025 is acknowledged. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 8 – 10, 21 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by TSUSHIMA et al. (US 20230292433 A1). Regarding claim 8, TSUSHIMA discloses (Fig. 1 – 5) a circuit substrate (30) comprising: a ceramic substrate (10); copper plates (20) which are bonded to two main surfaces of the ceramic substrate (10), respectively; and silver-plating films (para [0159]) formed on surfaces of the copper plates, wherein a number of facets existing on a surface of the copper plate in an interface between the copper plate and the silver-plating film is 3000 or less per mm2 (See para [0012], [0029], [0159] and Fig. 2). Regarding claim 9, TSUSHIMA discloses the circuit substrate according to claim 8, wherein the number of facets with a diameter of 2.5 μ m or more is 1200 or less per mm2, and the number of facets with a diameter of less than 2.5 μ m is 1800 or less per mm2 (See para [0028] - [0030]). Regarding claim 10, TSUSHIMA discloses the circuit substrate according to claim 9, wherein the number of facets with a facet diameter of less than 1.5 μ m is 1200 or less per mm2 (See para [0028] - [0030]). Regarding claim 21, TSUSHIMA discloses the circuit substrate according to claim 8, wherein a diameter of the facets is less than 9.5 μ m (See para [0028] - [0030]). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 8 – 10, 21 is/are rejected under 35 U.S.C. 103 as being unpatentable over SUENAGA et al. (US 20230187310 A1) in view of TSUSHIMA et al. (US 20230292433 A1) Regarding claim 8, SUENAGA discloses (Fig. 4) a circuit substrate (10) comprising: a ceramic substrate (2); copper plates (11, 12) which are bonded to two main surfaces of the ceramic substrate, respectively; and silver-plating films (4) formed on surfaces of the copper plates, SUENAGA is silent on wherein a number of facets existing on a surface of the copper plate in an interface between the copper plate and the silver-plating film is 3000 or less per mm2. However, TSUSHIMA discloses (Fig. 1 - 5) wherein a number of facets existing on a surface of the copper plate in an interface between the copper plate (20) and the silver-plating film (para [0159]) is 3000 or less per mm2 (See para [0012], [0029], [0159] and Fig. 2). SUENAGA and TSUSHIMA are both considered to be analogous to the claimed invention because they are in the same field of circuit substrate. Therefore, it would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have modified SUENAGA to incorporate the teachings of TSUSHIMA and provide wherein a number of facets existing on a surface of the copper plate in an interface between the copper plate (20) and the silver-plating film (para [0159]) is 3000 or less per mm2 (See para [0012], [0029], [0159] and Fig. 2). Doing so a circuit board has a good heat radiation capability, and is reduced in failures, such as the phenomenon that an etching solution used in forming a circuit pattern remains, and thus the reliability as a product is enhanced (See para [0029]). Regarding claim 9, SUENAGA in view of TSUSHIMA discloses the circuit substrate according to claim 8, wherein TSUSHIMA further discloses the number of facets with a diameter of 2.5 μ m or more is 1200 or less per mm2, and the number of facets with a diameter of less than 2.5 μ m is 1800 or less per mm2 (See para [0028] - [0030]). Regarding claim 10, SUENAGA in view of TSUSHIMA discloses the circuit substrate according to claim 9, wherein TSUSHIMA further discloses the number of facets with a facet diameter of less than 1.5 μ m is 1200 or less per mm2 (See para [0028] - [0030]). Regarding claim 21, SUENAGA in view of TSUSHIMA discloses the circuit substrate according to claim 8, wherein TSUSHIMA further discloses a diameter of the facets is less than 9.5 μ m (See para [0028] - [0030]). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SIDI MOHAMED MAIGA whose telephone number is (703)756-1870. The examiner can normally be reached Monday - Friday 8 am 5 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Timothy Thompson can be reached on 571-272-2342. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SIDI M MAIGA/Examiner, Art Unit 2847 /STANLEY TSO/ Primary Examiner, Art Unit 2847
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Prosecution Timeline

Nov 30, 2023
Application Filed
Dec 19, 2025
Non-Final Rejection — §102, §103
Mar 26, 2026
Applicant Interview (Telephonic)
Mar 31, 2026
Examiner Interview Summary

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12586995
ELECTRICAL APPARATUS AND PLUG
2y 5m to grant Granted Mar 24, 2026
Patent 12588142
HIGH-FREQUENCY ELECTRONIC COMPONENT
2y 5m to grant Granted Mar 24, 2026
Patent 12568584
WIRING BOARD
2y 5m to grant Granted Mar 03, 2026
Patent 12563665
INSULATING CIRCUIT BOARD AND SEMICONDUCTOR DEVICE IN WHICH SAME IS USED
2y 5m to grant Granted Feb 24, 2026
Patent 12550257
WIRING SUBSTRATE
2y 5m to grant Granted Feb 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
76%
Grant Probability
85%
With Interview (+9.4%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 29 resolved cases by this examiner. Grant probability derived from career allow rate.

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