Prosecution Insights
Last updated: April 19, 2026
Application No. 18/533,220

SIGNAL PROCESSING SYSTEM AND POWER SUPPLY DEVICE HAVING A SIGNAL PROCESSING SYSTEM

Final Rejection §102
Filed
Dec 08, 2023
Examiner
SATHIRAJU, SRINIVAS
Art Unit
2844
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Trumpf Huettinger GmbH + Co. Kg
OA Round
2 (Final)
89%
Grant Probability
Favorable
3-4
OA Rounds
2y 2m
To Grant
94%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allow Rate
715 granted / 806 resolved
+20.7% vs TC avg
Moderate +5% lift
Without
With
+5.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
30 currently pending
Career history
836
Total Applications
across all art units

Statute-Specific Performance

§101
2.1%
-37.9% vs TC avg
§103
43.6%
+3.6% vs TC avg
§102
17.6%
-22.4% vs TC avg
§112
16.7%
-23.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 806 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-10, and 12- 20 are rejected under 35 U.S.C. 102 (a) (1) as being US2021/0225614 A1 by De Chambriner (Chambriner). Referring to claim 1 Chambirier Fig 1-20 teaches: A signal processing system (Fig 20 item 1901 processing system and paragraph [0133] and abstract) comprising an acquisition device (item CPU 1906 paragraph [0134]) configured to acquire a repeating signal trace in a specified time interval (see paragraph [0038]), wherein the signal trace varies as a function of a plasma process state of a plasma process (See paragraph [0026] and Fig 1), a determining device configured to generate a data stream describing the plasma process, based on at least two signal traces acquired in one time interval each (See paragraphs [0028] and [0035] and where De Chambirier discloses tracing the electrical signals of the plasma process parameters), wherein the data stream contains a continuously determined stability indicator for the plasma process (see paragraph [0037]), and De Chambirier further teaches wherein the specified time interval of the repeating signal trace and/or a data stream interval are predetermined by process fluctuations of the plasma process. (See paragraph [0041] and/or [0072]). Referring to claim 2 Chambirier teaches the signal processing system according to claim 1, wherein the time interval is specified externally. (Fig 5 paragraph [0070] and [0081] and Fig 18 and [0104]). Referring to claim 3 Chambirier teaches the signal processing system according to claim 1, wherein the time interval is determined internally by the signal processing system, using the acquisition device or the determining device. (See paragraph [0014] and[0110]). Referring to claim 4 Chambirier teaches the signal processing system according to claim 1, wherein the data stream is generated based on a comparison of the at least two signal traces of consecutive time intervals (see paragraph [0052]-[0054]). Referring to claim 5 Chambirier teaches the signal processing system according to claim 1, wherein the data stream is generated based on a comparison of the at least two signal traces acquired in one time interval each. (See paragraph [0074] [0075] and [0111]). Referring to claim 6 Chambirier teaches the signal processing system according to claim 4, wherein the stability indicator is determined based on a plurality of the comparisons with a plurality of acquired signal traces. (See Fig 17 and paragraphs [0102] –[0107]). Referring to claim 7 Chambirier teaches the signal processing system according to claim 6, wherein the stability indicator is determined as a mean value or a maximum value, from the plurality of comparisons. (See Fig 17, Fig 18 paragraph [0020] and [0104]). Referring to claim 8 Chambirier teaches the signal processing system according to claim 1, wherein the determining device is configured to generate multiple data streams with multiple different stability indicators determined according to different statistical evaluations. (See abstract and claims 1, 12). Referring to claim 9 Chambirier teaches the signal processing system according to claim 8, wherein the determined stability indicators are used alone or in combination with other data for machine learning, as test data and as training data. (See paragraph [0078] where Chambirier suggests using machine learning during operation/ collecting the data). Referring to claim 10 Chambirier teaches the signal processing system according to claim 1, wherein, for generating the data stream, a time window used for determining the stability indicator is at least as long as a data stream interval. ( See Fig 1 and paragraph [0037] and Fig 17 and steady state paragraph [0102]). Claim 11 (Cancelled). Referring to claim 12 Chambirier teaches the signal processing system according to claim 1, further comprising a memory device for recording the signal traces. (See Fig 2 paragraph [0052]). Referring to claim 13 Chambirier teaches the signal processing system according to claim 12, wherein the memory device is configured as a ring buffer. (see Fig 20 item 1920 paragraph [0134] ) is configured as a ring buffer (item 1948 is local storage or buffer paragraph [0135]). Referring to claim 14 Chambirier teaches the signal processing system according to claim 1, further comprising a synchronization device (Fig 2 item 285/275 matching or tuning network ) for synchronizing the acquisition device to a signal trace frequency. (See Fig 18 and paragraph [0052]). Referring to claim 15 Chambirier teaches the signal processing system according to claim 1, further comprising a comparison device configured to compare recorded signal traces, and/or to compare values determined from the recorded signal traces, with one another or with a reference. (See paragraph [0052]). Referring to claim 16 Chambirier teaches the signal processing system according to claim 1, wherein the determining device is configured to determine a mean signal trace over multiple time intervals. (See paragraph [0030]). Referring to claim 17 Chambirier teaches the signal processing system according to claim 1, wherein the determining device is configured to determine a deviation of a sample of a signal trace from a mean signal trace. (See Fig 18 and paragraph [0104]) Referring to claim 18 Chambirier teaches the signal processing system according to claim 1, wherein the determining device is configured to determine an envelope, including minimum and maximum values of corresponding samples of multiple time intervals, and wherein the stability indicator is determined from the minimum and maximum values. (See Fig 14-18 paragraphs [0100] to [0107]). Referring to claim 19 Chambirier teaches the A power supply device for generating a pulsed electrical high- frequency power signal for a plasma (See claim 12), comprising a power generator (Fig 1 item 105/110 pararaph [0027]), an impedance matching arrangement (item 115/120 paragraph [0028]) connected to the power generator (105/11), and the signal processing system according to claim 1. (abstract and claim 12). Referring to claim 20 Chambirier teaches A process control arrangement for a plasma process (See Fig 20 and abstract) , configured to use the stability indicator from the signal processing system of claim 1 (See Fig 18 and paragraph [0104]) for controlling the plasma process (see claim 1, 12). Conclusion Claims 1-20 are rejected. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SRINIVAS SATHIRAJU whose telephone number is (571)272-4250. The examiner can normally be reached 8:30AM-5.30 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Regis J Betsch can be reached at 571-270-7101. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SRINIVAS SATHIRAJU/Examiner, Art Unit 2844 2/15/2026
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Prosecution Timeline

Dec 08, 2023
Application Filed
Aug 09, 2025
Non-Final Rejection — §102
Nov 10, 2025
Response Filed
Feb 12, 2026
Examiner Interview (Telephonic)
Feb 15, 2026
Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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PLASMA PROCESSING APPARATUS
2y 5m to grant Granted Apr 14, 2026
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Patent 12598689
ROTATING CORE PLASMA COMPRESSION SYSTEM
2y 5m to grant Granted Apr 07, 2026
Patent 12598691
BEAM TRANSPORT SYSTEM AND METHOD, ACCELERATOR INCLUDING BEAM TRANSPORT SYSTEM, AND ION SOURCE INCLUDING THE ACCELERATOR
2y 5m to grant Granted Apr 07, 2026
Patent 12592362
PLASMA PROCESSING APPARATUS
2y 5m to grant Granted Mar 31, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
89%
Grant Probability
94%
With Interview (+5.2%)
2y 2m
Median Time to Grant
Moderate
PTA Risk
Based on 806 resolved cases by this examiner. Grant probability derived from career allow rate.

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