DETAILED ACTION
Elections/Restrictions
1. This office action is a response to Applicant's election filed on 06/01/2026 without traverse of Group I, claims 1-9 & 17 for further examination. Claims 10-16 & 18-20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim.
Notice of Pre-AIA or AIA Status
2. The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Priority
3. Receipt is acknowledged of papers submitted under 35 U.S.C. 119(a)-(d), which papers have been placed of record in the file.
Information Disclosure Statement
4. The information disclosure statement (IDS) submitted on 12/14/2023 is being considered by the examiner.
Drawings
5. The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, the “tensile deformation pattern” & “thermal deformation pattern” recited in claim 1 must be shown or the feature(s) canceled from the claim(s). No new matter should be entered.
Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance.
Claim Rejections - 35 USC § 112
6. The following is a quotation of 35 U.S.C. 112(b):
(B) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
7. Claims 2-9 are rejected under 35 U.S.C. 112(b), as being indefinite for failing to particularly point out and distinctly claim the subject matter which applicant regards as the invention.
As regards to claim 2, line 7 recites the limitation “the first edge”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the first edge” as “a first edge of the two first edges” recited in line 2. To correct this problem, amend line 7 to recite “a first edge of the two first edges”.
As regards to claim 2, line 7 recites the limitation “the second edge”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the second edge” as “a second edge of the two second edges” recited in line 2. To correct this problem, amend line 7 to recite “a second edge of the two second edges”.
As regards to claim 5, lines 5 & 9 recite the limitation “the mask openings”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the mask openings” as “the plurality of mask openings” recited in line 2 and referenced as such in line 3. To correct this problem, amend line 5 to recite “the plurality of mask openings”.
As regards to claim 5, line 9 recites the limitation “the closer”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the closer” as “closer”. To correct this problem, amend line 9 to recite “closer”.
As regards to claim 5, line 9 recites the limitation “the greater”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the greater” as “greater”. To correct this problem, amend line 9 to recite “greater”.
As regards to claim 6, lines 5 & 9 recite the limitation “the mask openings”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the mask openings” as “the plurality of mask openings” recited in line 2 and referenced as such in line 3. To correct this problem, amend line 5 to recite “the plurality of mask openings”.
As regards to claim 6, line 9 recites the limitation “the closer”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the closer” as “closer”. To correct this problem, amend line 9 to recite “closer”.
As regards to claim 6, line 9 recites the limitation “the greater”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the greater” as “greater”. To correct this problem, amend line 9 to recite “greater”.
As regards to claim 8, lines 2 & 3 recite “first-type”. This phrase renders the claim indefinite because it was unclear what "type" the claim was intended to convey, thereby rendering the scope of the claim unascertainable. See MPEP § 2173.05(b). For examination purposes, examiner is interpreting “suck-back type coating gun unit” as type. To correct this problem, amend claim 8 to particularly point out and distinctly claim the subject matter which applicant regards as the invention.
As regards to claim 8, lines 2 & 3 recite “second-type”. This phrase renders the claim indefinite because it was unclear what "type" the claim was intended to convey, thereby rendering the scope of the claim unascertainable. See MPEP § 2173.05(b). For examination purposes, examiner is interpreting “suck-back type coating gun unit” as type. To correct this problem, amend claim 8 to particularly point out and distinctly claim the subject matter which applicant regards as the invention.
As regards to claim 8, lines 2 & 3 recite the limitation “the area”. There is insufficient antecedent basis for this limitation in the claim. For examination purposes, examiner is interpreting “the area” as “an area”. To correct this problem, amend lines 2 & 3 to recite “an area”.
As regards to claim 9, lines 1 & 2 (twice) recite “second-type”. This phrase renders the claim indefinite because it was unclear what "type" the claim was intended to convey, thereby rendering the scope of the claim unascertainable. See MPEP § 2173.05(b). For examination purposes, examiner is interpreting “suck-back type coating gun unit” as type. To correct this problem, amend claim 8 to particularly point out and distinctly claim the subject matter which applicant regards as the invention.
Claims 3-7 are rejected at least based on their dependency from claim 2.
Claim Rejections
8. In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
9. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention.
Claim Rejections - 35 USC § 102
10. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention.
(a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention.
11. Claims 1-9 & 17 are rejected under AIA 35 U.S.C. 102(a)(1) as being anticipated by Baek et al. (US 2022/0384769 A1) hereinafter Baek (the terminology of the claims in the application is used, but the references of Baek are included between parentheses).
As regards to claim 1, Baek discloses a mask (abs; fig 4-12), comprising:
a first clamping region (AR3) and a second clamping region (AR3) opposite to each other in a first direction (x-direction) ([0084]; [0086]; [0115]-[0116]; fig 3 & 10); and
at least one mask opening region (DP) disposed between the first clamping region (AR3) and the second clamping region (AR3) ([0084]; [0086]-[0088]; [0090]-[0092]; [0095]; [0097]-[0098]; [0100]-[0103]; [0115]-[0116]; fig 3-10);
wherein the mask opening region (DP) is in a first initial shape before being tensioned ([0097]-[0103]), the mask opening region (DP) is in a first target shape during an evaporation deposition process ([0097]-[0103]), and the first initial shape is different from the first target shape ([0097]-[0103]); and the first initial shape comprises a compensation pattern with respect to the first target shape ([0097]-[0103]), and the compensation pattern comprises a tensile deformation pattern (tensile force) and a thermal deformation pattern (mask 1200 may include, for example, stainless steel, invar, nickel (Ni), cobalt (Co), a nickel alloy, a nickel-cobalt alloy and the like, these materials have a low thermal expansion coefficient, thus patterns are low thermal deformation patterns) ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 2, Baek discloses a mask (abs; fig 4-12), wherein the mask opening region (DP) comprises two first edges opposite to each other (see fig 3-4 & 9-10) in the first direction (x-direction), two second edges opposite to each other (see fig 3-4 & 9-10) in a second direction (y-direction), and the two second edges are connected to the two first edges (see fig 3-4 & 9-10); the first direction (x-direction) is a tensioning direction of the mask (1200), and the second direction (y-direction) is perpendicular to the first direction (x-direction); and the compensation pattern comprises at least one first compensation pattern (see fig 4 & 9) extending along a first edge of the two first edges (see fig 3-4 & 9-10) and at least one second compensation pattern (see fig 4 & 9) extending along a second edge of the two second edges (see fig 3-4 & 9-10) ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 3, Baek discloses a mask (abs; fig 4-12), comprising a first centerline (see fig 2-3 & 10) extending along the first direction (x-direction) and passing through the center of the mask (1200), and a second centerline (see fig 2-3 & 10) extending along the second direction (y-direction) and passing through the center of the mask (1200); the mask (1200) opening region (DP) comprises a third centerline (see fig 2-3 & 10) extending along the first direction (x-direction) and passing through the center of the mask (1200) opening region (DP), and a fourth centerline (see fig 2-3 & 10) extending along the second direction (y-direction) and passing through the center of the mask (1200) opening region (DP); the first compensation pattern is configured to protrude toward (see fig 5-6B; [0097]; [0102]) the second centerline (see fig 2-3 & 10), and the second compensation pattern is configured to protrude (see fig 5-6B; [0097]; [0102]) away from the first centerline (see fig 2-3 & 10) ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 4, Baek discloses a mask (abs; fig 4-12), wherein the at least one second compensation pattern comprises two second compensation patterns symmetrically arranged (see fig 3-4 & 9-10) with respect to the third centerline (see fig 2-3 & 10) of the mask (1200) opening region (DP) ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 5, Baek discloses a mask (abs; fig 4-12), wherein the mask opening region (DP) comprises a plurality of mask openings (DH) arranged at intervals (see fig 3-4 & 9-10); the plurality of mask openings (DH) are arranged in rows (see fig 4 & 9) along the first direction (x-direction) and in columns (see fig 4 & 9) along the second direction (y-direction); all the plurality of mask openings (DH) in a same mask opening region (DP) have a same size (see fig 4 & 9) along the first direction (x-direction), and any two adjacent mask openings (DH) in a same row are equally spaced (see fig 4 & 9) along the first direction (x-direction); in the rows of mask openings (DH) located on a same side of the third centerline (see fig 2-3 & 10) along the second direction (y-direction), closer the mask openings (DH) in the same row to the third centerline (see fig 2-3 & 10), greater the spacing in the first direction (x-direction) between two adjacent mask openings (DH) in the same row ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 6, Baek discloses a mask (abs; fig 4-12), wherein the mask opening region (DP) comprises a plurality of mask openings (DH) arranged at intervals (see fig 3-4 & 9-10); the plurality of mask openings (DH) are arranged in rows (see fig 4 & 9) along the first direction (x-direction) and in columns (see fig 4 & 9) along the second direction (y-direction); all the plurality of the mask openings (DH) in a same mask opening region (DP) have a same size (see fig 4 & 9) along the second direction (y-direction), and any two adjacent mask openings (DH) in a same column are equally spaced (see fig 4 & 9) along the second direction (y-direction); in the columns of mask openings (DH) located on a same side of the fourth centerline (see fig 2-3 & 10) along the first direction (x-direction), closer the mask openings (DH) in the same column to the fourth centerline (see fig 2-3 & 10), greater the spacing in the second direction (y-direction) between two adjacent mask openings (DH) in the same column ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 7, Baek discloses a mask (abs; fig 4-12), the at least one mask opening region (DP) comprises at least two mask opening regions (DP) arranged in sequence (see fig 3 & 10) along the first direction (x-direction), and the at least two mask opening regions (DP) are symmetrically distributed with respect to the second centerline (see fig 2-3 & 10) ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 8, Baek discloses a mask (abs; fig 4-12), wherein the at least one mask opening region (DP) comprises a first-type (see fig 4 & 9, larger DH holes) mask opening region (DP) and a second-type (see fig 4 & 9, smaller DH holes) mask opening region (DP), and an area of the first-type (see fig 4 & 9, larger DH holes) mask opening region (DP) is greater than an area of the second-type (see fig 4 & 9, smaller DH holes) mask opening region (DP) column ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 9, Baek discloses a mask (abs; fig 4-12), wherein the second-type (see fig 4 & 9, smaller DH holes) mask opening region (DP) comprises at least two second-type (see fig 4 & 9, smaller DH holes) mask opening regions (DP), and the at least two second-type (see fig 4 & 9, smaller DH holes) mask opening regions (DP) are arranged adjacently (see fig 3-6B & 9-10) to form a mask compensating region (see fig 3-6B & 9-10); the mask compensating region before being tensioned (see fig 3-6B & 9-10), with respect to the mask compensating region during the evaporation deposition process (see fig 3-6B & 9-10), comprises a third compensation pattern (see fig 3-6B & 9-10, holes DH forming patterns) extending along an edge (see fig 3-4 & 9-10) of the mask compensating region in the first direction (x-direction) and a fourth compensation pattern (see fig 3-6B & 9-10, holes DH forming patterns) extending along another edge (see fig 3-4 & 9-10) of the mask compensating region (see fig 3-6B & 9-10) in a second direction (y-direction); the first direction (x-direction) is a tensioning direction of the mask (1200), and the second direction (y-direction) is perpendicular to the first direction (x-direction) column ([0082]-[0088]; [0090]-[0105]; [0115]-[0116]; fig 3-10).
As regards to claim 17, Baek discloses a mask assembly (abs; fig 4-12), comprising a mask frame (1100) and the mask (1200) according to claim 1, arranged on the mask frame (1100) ([0074]-[0081]; fig 1-2).
Conclusion
12. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure: all references cited on the attached PTO-892 Notice of References Cited excluding the above relied upon references.
13. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Jethro M Pence whose telephone number is (571)270-7423. The examiner can normally be reached M-TH 8:00 A.M. - 6:30 P.M..
Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Dah-Wei D. Yuan can be reached on 571-272-1295. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000.
/Jethro M. Pence/
Primary Examiner
Art Unit 1717
Prosecution Insights