Tech Center 1700 • Art Units: 1712 1715 1717 1746 1798
This examiner grants 79% of resolved cases
Jethro M. Pence is an examiner in Tech Center 1700 and Art Unit 1712. He has managed 886 resolved cases, resulting in an allowance rate of 79.0%. This rate indicates that a high percentage of the applications he reviews are granted. The median days to allowance for these cases is 924. Additionally, the data shows an interview lift of 25.4%.
This positive lift suggests that conducting an interview with the examiner is a statistically effective strategy for increasing the probability of an allowance. Practitioners should consider this 25.4% lift when deciding whether to engage in direct communication. With 886 resolved cases, the data is statistically significant and provides a reliable basis for planning. The 79.0% allowance rate and 924 days to allowance suggest a steady and efficient path to grant for applicants in Art Unit 1712. Strategic use of interviews can further enhance the likelihood of a positive outcome for those seeking to secure intellectual property rights.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18699567 | FORMATION OF AN ABRADABLE COATING INSIDE A TURBOMACHINE CASING | Final Rejection | SAFRAN AIRCRAFT ENGINES |
| 18216028 | POST BAKING APPARATUS | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18751620 | PAINTING SYSTEM FOR AN AIRCRAFT COMPRISING A PAINT BOOTH OF REDUCED CROSS SECTION | Non-Final OA | Airbus Operations GmbH |
| 18561858 | Insulating Liquid Supply Apparatus | Non-Final OA | LG Energy Solution, Ltd. |
| 18388661 | SYSTEMS AND APPARATUS FOR SEMICONDUCTOR EQUIPMENT | Non-Final OA | ASM IP Holding B.V. |
| 18866771 | DEVICE, USE AND METHOD FOR DOSING OR LEVELLING | Non-Final OA | VOITH PATENT GMBH |
| 18826386 | THERMAL SPRAYING EQUIPMENT AND THERMAL SPRAYING CONTROL METHOD | Final Rejection | NHK SPRING CO., LTD. |
| 18430763 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18263738 | APPLICATION MECHANISM AND APPLICATION APPARATUS | Final Rejection | NTN Corporation |
| 18509106 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18279082 | FILM-FORMING APPARATUS, FILM-FORMING METHOD, GALLIUM OXIDE FILM AND LAMINATE | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18415868 | Apparatus And Method For Inductive Heating Of Coated Web Substrates During Process Operations | Non-Final OA | Durr Systems, Inc. |
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