Prosecution Insights
Last updated: October 27, 2026
Application No. 18/573,719

ETCHING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT USING SAME

Non-Final OA §103
Filed
Dec 22, 2023
Priority
Jul 02, 2021 — JP 2021-110798 +1 more
Examiner
LU, JIONG-PING
Art Unit
1713
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Mitsubishi Gas Chemical Company, Inc.
OA Round
3 (Non-Final)
84%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
814 granted / 974 resolved
+18.6% vs TC avg
Moderate +8% lift
Without
With
+7.9%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
42 currently pending
Career history
1022
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
48.9%
+8.9% vs TC avg
§102
28.5%
-11.5% vs TC avg
§112
16.6%
-23.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 974 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office Action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on June 12, 2026 has been entered. Response to Amendments/Arguments The amendment made to claim 1, the cancelation of claim 6, and the withdrawal of claim 9, as filed on June 12, 2026, are acknowledged. Applicant’s arguments, see Remarks filed on June 12, 2026, with respect to rejection to amended claim 1 have been considered but are moot because the arguments do not apply to new ground(s) of rejection in this Office Action necessitated by the amendments made to the claims. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office Action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claims 1-5 and 7-8 are rejected under 35 U.S.C. 103 as being obvious over Wu et al. (WO2016042408). Regarding claim 1, Wu discloses an etching composition (abstract), comprising an oxidizing agent (A) (paragraph 0029), a fluorine compound (B) (HF, paragraph 0028), and a metal tungsten corrosion inhibiter (C), wherein the metal tungsten corrosion inhibiter (C) contains an ammonium salt represented by formula (1) as recited in the instant claim, wherein in formula (1), wherein R1 represents an unsubstituted alkyl group having 16 carbon atoms; each R2 independently represents an unsubstituted alkyl group having 1 carbon atom; and X− represents a hydroxide ion (hexadecyltrimethylammonium hydroxide, paragraph 0030), wherein the oxidizing agent (A) comprises an oxoacid of iodine (periodic acid, paragraph 0029), and wherein the etching composition has a pH from 0 to 4 (paragraph 0027). The pH range disclosed by Wu encompasses the range recited in the instant claim. In the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). MPEP 2144.05(I). It is noted that claim 1 is drawn to a composition claim and the recitation of "for a semiconductor substrate for a memory element " is considered as intended use of the claimed composition. A composition claim covers what the composition is not what the composition does. See In re Spada, 911 F.2d 705, 708, 15 USPQ2d 1655, 1657 (Fed. Cir. 1990) ("The discovery of a new property or use of a previously known composition, even when that property and use are unobvious from prior art, can not impart patentability to claims to the known composition."); Titanium Metals Corp. of Am. v. Banner, 778 F.2d 775, 782, 227 USPQ 773, 778 (Fed. Cir. 1985) (intended use of an old composition does not render composition claim patentable); and In re Zierden, 56 C.C.P.A. 1223, 411 F.2d 1325, 1328, 162 USPQ 102, 104 (CCPA 1969) (" [M]ere statement of a new use for an otherwise old or obvious composition cannot render a claim to the composition patentable."). Regarding claims 2-3, Wu discloses wherein said R represents a substituted or unsubstituted aryl(poly)heteroalkylene group having 14 to 20 carbon atoms (benzethonium chloride, paragraph 0030). Regarding claim 4, Wu is silent about that the composition has a surface tension of 50 mN/m or less. However, it is noted that claim 2 is drawn to a composition claim, and a composition claim covers what the composition is not what the composition does. See In re Spada, 911 F.2d 705, 708, 15 USPQ2d 1655, 1657 (Fed. Cir. 1990) ("The discovery of a new property or use of a previously known composition, even when that property and use are unobvious from prior art, can not impart patentability to claims to the known composition."). Regarding claim 5, Wu discloses that the composition further comprises a pH adjuster (D) (paragraph 0033). Regarding claim 7, Wu discloses an organic solvent (E) (paragraph 0031). Regarding claim 8, Wu discloses wherein the organic solvent (E) is an alcohol (methanol, paragraph 0031). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JIONG-PING LU whose telephone number is (571) 270-1135. The examiner can normally be reached on M-F: 9:00am – 5:00pm. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua L Allen, can be reached at telephone number (571)270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from Patent Center. Status information for published applications may be obtained from Patent Center. Status information for unpublished applications is available through Patent Center for authorized users only. Should you have questions about access to Patent Center, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) Form at https://www.uspto.gov/patents/uspto-automated- interview-request-air-form. /JIONG-PING LU/ Primary Examiner, Art Unit 1713
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Prosecution Timeline

Dec 22, 2023
Application Filed
Dec 16, 2025
Non-Final Rejection mailed — §103
Mar 12, 2026
Response Filed
Apr 15, 2026
Final Rejection mailed — §103
Jun 12, 2026
Response after Non-Final Action
Jul 08, 2026
Request for Continued Examination
Jul 11, 2026
Response after Non-Final Action
Oct 16, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
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2y 4m to grant Granted Oct 20, 2026
Patent 12760223
SILICON ETCHING SOLUTION AND METHOD FOR PRODUCING SILICON ETCHING SOLUTION, METHOD FOR TREATING SUBSTRATE, AND METHOD FOR PRODUCING SILICON DEVICE
3y 1m to grant Granted Oct 13, 2026
Patent 12754475
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
3y 6m to grant Granted Oct 06, 2026
Patent 12753515
CONTINUOUS COIL PRETREATMENT PROCESS
2y 11m to grant Granted Oct 06, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
84%
Grant Probability
92%
With Interview (+7.9%)
2y 1m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 974 resolved cases by this examiner. Grant probability derived from career allowance rate.

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