Prosecution Insights
Last updated: July 17, 2026
Application No. 18/583,744

ELECTRONIC DEVICES AND METHODS OF MANUFACTURING ELECTRONIC DEVICES

Non-Final OA §103
Filed
Feb 21, 2024
Examiner
ZHU, SHENG-BAI
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Amkor Technology Singapore Holding Pte. Ltd.
OA Round
1 (Non-Final)
62%
Grant Probability
Moderate
1-2
OA Rounds
4m
Est. Remaining
68%
With Interview

Examiner Intelligence

Grants 62% of resolved cases
62%
Career Allowance Rate
444 granted / 714 resolved
-5.8% vs TC avg
Moderate +6% lift
Without
With
+6.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
64 currently pending
Career history
780
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
95.1%
+55.1% vs TC avg
§102
3.0%
-37.0% vs TC avg
§112
1.3%
-38.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 714 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Detailed Action Election/Restriction Applicant’s election of Species I (Claims 1-9) in the reply filed on 5/29/2026 is acknowledged. Because applicant did not distinctly and specifically point out the supposed errors in the restriction requirement, the election has been treated as an election without traverse (MPEP § 818.03(a)). Specification Objection The title of the invention is not descriptive. A new title is required that is clearly indicative of the invention to which the claims are directed. Claim Rejections – 35 U.S.C. 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claims 1 and 5-7 rejected under 35 U.S.C. 103 as being unpatentable over Chen (U.S. Patent Pub. No. 2020/0058627), in view of Hsiung (U.S. Patent Pub. No. 2019/0181092). Regarding Claim 1 FIG. 1 of Chen discloses a method of manufacturing an electronic device, the method comprising: providing vertical interconnects (200) over an upper side of a first carrier (C); bonding a routing component inorganic layer (AD) on a lower side of a routing component (300) to an inorganic layer (102) on the upper side of the first carrier; encapsulating (FIG. 1C) the vertical interconnects and the routing component in a lower encapsulant (400); providing an upper substrate (502) to an upper side of the lower encapsulant such that a conductive structure (504) of the upper substrate is coupled to upper sides of the vertical interconnects and to an upper side of the routing component (FIG. 1E); coupling (FIG. 1F) a first electronic component (704) and a second electronic component (804) to an upper side of the upper substrate; removing the first carrier from the routing component and the vertical interconnects (FIG. 1I). Chen is silent with respect to “providing a second carrier over the first electronic component and the second electronic component”; and “providing a lower substrate to a lower side of the lower encapsulant such that a conductive structure of the lower substrate is coupled to lower sides of the vertical interconnects”. FIG. 3 of Hsiung discloses a similar method of manufacturing an electronic device, comprising bonding a routing component inorganic [0019] layer (308) on a lower side of a routing component (310) to an inorganic layer (306) on the upper side of the first carrier (302); providing a second carrier (350) over the first electronic component (318) and the second electronic component (320); removing the first carrier from the routing component and the vertical interconnects (314); and providing a lower substrate (354) to a lower side of the lower encapsulant such that a conductive structure of the lower substrate is coupled to lower sides of the vertical interconnects It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Hsiung. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of reducing production cost ([0015] of Hsiung). Regarding Claim 5 With respect to “bonding occurs at temperatures ranging from approximately 25° C. to approximately 400° C”, said temperature is related to the formation of chemical bonds. For example, U.S. Patent Pub. No. 2006/0233971 to Terao teaches a heating temperature of approximately 80° C. to approximately 250° C [0183]. When the temperature is low, no sufficient chemical bonds would be formed. When the heating temperature is raised higher than the upper limit, the effect is not improved corresponding to the increase in the heating temperature. Therefore, said temperature is considered to be a result effective variable. The claim to a specific temperature therefore constitutes an optimization of ranges. In re Huang, 100 F.3d 135, 40 USPQ2d 1685, 1688 (Fed. Cir. 1996). It would have been obvious to one of ordinary skill in the art at the time of the invention to use the parameters as claimed, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves only routine skill in the art (MPEP 2144.05). Regarding Claim 6 FIG. 3 of Hsiung discloses encapsulating the first electronic component and the second electronic component in an upper encapsulant (324) prior to providing the second carrier. Regarding Claim 7 FIG. 1 of Chen discloses providing the upper substrate comprises coupling the conductive structure of the upper substrate to a routing component redistribution structure at the upper side of the routing component. Claim 2 rejected under 35 U.S.C. 103 as being unpatentable over Chen and Hsiung, in view of Liff (CN 112563235, machine-translation provided). Regarding Claim 2 Chen as modified by Hsiung discloses Claim 1. Chen as modified by Hsiung is silent with respect to “bonding comprises forming a covalent bond between the routing component inorganic layer and the inorganic layer on the upper side of the first carrier”. FIG. 1 of Liff discloses a similar method of manufacturing an electronic device, wherein bonding comprises forming a covalent bond between the routing component inorganic layer (116) and the inorganic layer (111) on the upper side of the first carrier. It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Liff. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of improving yield and reliability ([0017] of Liff). Claim 3 rejected under 35 U.S.C. 103 as being unpatentable over Chen and Hsiung, in view of Hirayama (CN 106783735, machine-translation provided). Regarding Claim 3 Chen as modified by Hsiung discloses Claim 1. Chen as modified by Hsiung is silent with respect to “bonding comprises forming hydroxyl (OH) groups on the lower side of the routing component inorganic layer and the upper side of the inorganic layer”. FIG. 1 of Hirayama discloses a similar method of manufacturing an electronic device, wherein bonding comprises forming hydroxyl (OH) groups on the lower side of the routing component inorganic layer and the upper side of the inorganic layer. It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Hirayama. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of improving sealing and tightness of the structure (Abstract of Hirayama). Claim 4 rejected under 35 U.S.C. 103 as being unpatentable over Chen and Hsiung, in view of Oh (KR 102120897, machine-translation provided). Regarding Claim 4 Chen as modified by Hsiung discloses Claim 1. Chen as modified by Hsiung is silent with respect to “generating hydrogen (H) on the lower side of the routing component inorganic layer and the upper side of the inorganic layer through plasma treatment; binding oxygen (O) particles separated during plasma treatment to the hydrogen (H) generated on the lower side of the routing component inorganic layer and the upper side of the inorganic layer; and inducing hydroxyl (OH) groups on the lower side of the routing component inorganic layer and the upper side of the inorganic layer”. FIG. 2 of Oh discloses a similar method of manufacturing an electronic device, wherein generating hydrogen (H) on the lower side of the routing component inorganic layer and the upper side of the inorganic layer through plasma treatment; binding oxygen (O) particles separated during plasma treatment to the hydrogen (H) generated on the lower side of the routing component inorganic layer and the upper side of the inorganic layer; and inducing hydroxyl (OH) groups on the lower side of the routing component inorganic layer and the upper side of the inorganic layer. It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Oh. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of prevent peeling off due to thermal stress (text of Oh). Claim 8 rejected under 35 U.S.C. 103 as being unpatentable over Chen and Hsiung, in view of Yoo (U.S. Patent Pub. No. 2022/0320043). Regarding Claim 8 Chen as modified by Hsiung discloses Claim 1. Chen as modified by Hsiung is silent with respect to “coupling the conductive structure of the lower substrate to lower sides of routing component through-interconnects that extend through a routing component die”. FIG. 4 of Yoo discloses a similar method of manufacturing an electronic device, wherein coupling the conductive structure of the lower substrate (100) to lower sides of routing component (200) through-interconnects (260) that extend through a routing component die. It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Yoo. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of providing a semiconductor package with increased electrical characteristics ([0004] of Yoo). Claim 9 rejected under 35 U.S.C. 103 as being unpatentable over Chen and Hsiung, in view of Tsai (U.S. Patent Pub. No. 2020/0020834). Regarding Claim 9 Chen as modified by Hsiung discloses Claim 1. Chen as modified by Hsiung is silent with respect to “coupling a lower side of the lower substrate to an upper side of a base substrate; and providing external interconnects to a lower side of the base substrate”. FIG. 1 of Tsai discloses a similar method of manufacturing an electronic device, comprising coupling a lower side of the lower substrate (PM2) to an upper side of a base substrate (PM3); and providing external interconnects (170) to a lower side of the base substrate. It would have been obvious to one of ordinary skill in the art before the effective filing of the claimed invention to modify the device of Chen, as taught by Tsai. The ordinary artisan would have been motivated to modify Chen in the above manner for purpose of electrical connection to a circuit carrier ([0042] of Tsai). Pertinent Art U.S. Patent Pub. No. 2022/0208669, 2021/0391268, 20180226349, and JP 2023181141. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SHENG-BAI ZHU whose telephone number is (571)270-3904. The examiner can normally be reached on 11am – 7pm EST. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Chad Dicke can be reached on (571)270-7996. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SHENG-BAI ZHU/Primary Examiner, Art Unit 2897
Read full office action

Prosecution Timeline

Feb 21, 2024
Application Filed
Jun 10, 2026
Non-Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
62%
Grant Probability
68%
With Interview (+6.0%)
2y 9m (~4m remaining)
Median Time to Grant
Low
PTA Risk
Based on 714 resolved cases by this examiner. Grant probability derived from career allowance rate.

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