Last updated: July 17, 2026

Application No. 18/588,275

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, FILM THICKNESS MEASUREMENT METHOD, AND TEMPERATURE MEASUREMENT METHOD

Non-Final OA

Filed

Feb 27, 2024

Priority

Feb 28, 2023 — JP 2023-030028

Examiner

CARTER, JONATHAN LANGDON

Art Unit

1713

Tech Center

1700 — Chemical & Materials Engineering

Assignee

KIOXIA Corporation

OA Round

1 (Non-Final)

Examiner Intelligence

CARTER, JONATHAN LANGDON View full profile →

Grants only 0% of cases

Career Allowance Rate

0 granted / 0 resolved

-65.0% vs TC avg

Minimal +0% lift

Without

With

+0.0%

Interview Lift

resolved cases with interview

Typical timeline

Avg Prosecution

24 currently pending

Career history

Total Applications

across all art units

Statute-Specific Performance

§103

90.0%

+50.0% vs TC avg

§102

2.0%

-38.0% vs TC avg

§112

8.0%

-32.0% vs TC avg

Black line = Tech Center average estimate • Based on career data from 0 resolved cases

Prosecution Timeline

Feb 27, 2024

Application Filed

May 21, 2026

Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

18/583,263

Patent 12610766

METHOD OF PATTERNING A SEMICONDUCTOR STRUCTURE

2y 2m to grant Granted Apr 21, 2026

Study what changed to get past this examiner. Based on 1 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2

Expected OA Rounds

Grant Probability

Low

PTA Risk

Based on 0 resolved cases by this examiner. Grant probability derived from career allowance rate.