Prosecution Insights
Last updated: August 17, 2026
Application No. 18/595,092

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Non-Final OA §102§103
Filed
Mar 04, 2024
Priority
Mar 13, 2023 — JP 2023-039019
Examiner
PRIDEMORE, NATHAN ANDREW
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
KIOXIA Corporation
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
1y 0m
Est. Remaining
91%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
59 granted / 77 resolved
+8.6% vs TC avg
Moderate +14% lift
Without
With
+14.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
36 currently pending
Career history
107
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
49.7%
+9.7% vs TC avg
§102
23.0%
-17.0% vs TC avg
§112
24.7%
-15.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 77 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Invention I, Species 1, Modifications A1, B1, and C1 in the reply filed on 23 June 2026 is acknowledged. Claims 1-20 are pending in the application, with claims 12-20 withdrawn from consideration. Applicant submits claims 1-11 read on the elected species/modifications. Claim 5 is drawn to non-elected modification A2 (Fig. 18). However, this claim is being considered in the present application, therefore the restriction requirement of 04/28/2026 is partially withdrawn. Specifically, the election requirement between modifications A1 and A2, only, is withdrawn. Claims 1-11 are treated on the merits in this Office action. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-6 and 8-11 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Nam Jae Lee et al. (US 20220149053 A1; hereinafter Lee). PNG media_image1.png 685 771 media_image1.png Greyscale Regarding Claim 1, Lee discloses a semiconductor device (Fig. 4, Fig. 5, Annotated Fig. 5) comprising: a stacked film (90; ¶0055) including a plurality of electrode layers (49; ¶0065) and a plurality of first insulators (41; ¶0065) alternately in a first direction (up/down), a top layer (top of 41; hereinafter T41) of the stacked film being a second insulator that is one of the plurality of first insulators (41); a columnar portion (60/61) including a third insulator (63; ¶0056) provided on a side face of the stacked film, a charge storage layer (65; ¶0056) provided on a side face of the third insulator (63), a fourth insulator (67; ¶0056) provided on a side face of the charge storage layer (65), and a first semiconductor layer (CL; ¶0069) provided on a side face of the fourth insulator (67), the columnar portion (60/61) being provided in the stacked film (90), a metal layer (70; ¶0072, ¶0076) provided on the stacked film (90) and the columnar portion (60/61), electrically connected to the first semiconductor layer (CL) (Fig. 5; ¶0068-¶0078), and including one or more layers (71/73), wherein an upper end of the columnar portion (Annotated Lee Fig. 5; UECP) is provided at a height between an upper face (top of T41) and a lower face (bottom of T41) of the second insulator (T41), and a lower end (Annotated Fig. 5; L73) of a highest layer (73) among the one or more layers (71/73) is provided at a position lower than the upper face of the second insulator (top of T41) (as shown in annotated Fig. 5). Regarding Claim 2, Lee discloses the device of claim 1, wherein the lower end of the highest layer (L73) is provided at a position higher than the lower face of the second insulator (bottom of T41) (as shown in Annotated Fig. 5). Regarding Claim 3, Lee discloses the device of claim 1, wherein the highest layer (73) is an interconnect material layer in an interconnect layer that includes the metal layer (73 is an interconnect material layer commensurate in scope with the definition of “interconnect material layer” provided in the instant specification at ¶0048; wherein “The interconnect material layer of the present embodiment is a main layer in the interconnect layer and occupies a maximum volume in the interconnect layer”). Regarding Claim 4, Lee discloses the device of claim 3, wherein the one or more layers further include a barrier metal layer (71; ¶0072) provided below the interconnect material layer (73). Regarding Claim 5, Lee discloses the device of claim 1, further comprising a second semiconductor layer (DS; ¶0069) provided between the first semiconductor layer (CL) and the metal layer (70). Regarding Claim 6, Lee discloses the device of claim 1, wherein an upper face of the columnar portion (UECP) is tilted relative to a plane orthogonal to the first direction (up/down) (as shown in Annotated Fig. 5). Regarding Claim 8, Lee discloses the device of claim 1, wherein the columnar portion further includes a fifth insulator (CO; ¶0069) provided on a side face of the first semiconductor layer (CL). Regarding Claim 9, Lee discloses the device of claim 8, wherein an upper end of the first semiconductor layer (top of CL at location indicated by the arrow of UECP in Annotated Fig. 5) is provided at a position higher than a triple point (annotated Fig. 5; TP) where the first semiconductor layer (CL), the fifth insulator (CO) and the metal layer (70) contact one another (TP is where 70 and CL are in electrical contact, and where CL and CO are in physical contact). Regarding Claim 10, Lee discloses the device of claim 9, wherein a thickness of the first semiconductor layer (CL) at a position higher than the triple point (TP) is smaller than a thickness of the first semiconductor layer (CL) at a position lower than the triple point (TP) (as shown in Annotated Fig. 5; wherein the top of CL decreases in thickness upward from TP). Regarding Claim 11, Lee discloses the device of claim 10, wherein the thickness of the first semiconductor layer (CL) at a position higher than the triple point (TP) decreases with a height from the triple point (as shown in Annotated Fig. 5; wherein the top of CL decreases in thickness upward from TP). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 7 is rejected under 35 U.S.C. 103 as being unpatentable over Lee. Regarding Claim 7, Lee discloses the device of claim 1. Lee is silent regarding explicitly disclosing wherein the metal layer (70) is included in a source line, and a highest electrode layer among the plurality of electrode layers (49) is included in a source-side select line. However, Lee teaches configuring the memory device multiple ways is a result effective variable of the desired orientation of the device (Fig. 2A and Fig. 2B; ¶0037-¶0053), configuring the top line (49) as a source select line or drain select line (¶0041-¶0052). It would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to configure the device of Lee with the metal layer included in a source line and the highest electrode as a source select line in order to provide a device with the desired orientation. Furthermore, Applicant has not presented persuasive evidence that the claimed orientation/configuration is for a particular purpose that is critical to the overall claimed invention (i.e. the invention would not work without the specific claimed orientation/configuration). Also, the applicant has not shown that the claimed orientation/configuration produces a result that was new or unexpected enough to patentably distinguish the claimed invention over the cited prior art., it would have been obvious to one of the ordinary skill in the art before the effective filing date of the claimed invention to orient/configure the device of Lee by re-arranging the orientation/configuration of the source/drain lines and source/drain select lines with a reasonable expectation of success since it has been held that rearranging parts of an invention involves only routine skill in the art. In re Japikse, 181 F.2d 1019, 86 USPQ 70 (CCPA 1950), see MPEP 2144.04 VI. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Jaeduk Lee et al. (US 20250014644 A1) discloses in Fig. 27B a similar configuration for the features of Claim 1, including a metal layer (49) with a lower surface at a level between the upper/lower faces of a top insulator layer (23) of a stacked film (23/29), wherein a columnar portion includes the claimed insulators and semiconductor channel layer. Any inquiry concerning this communication or earlier communications from the examiner should be directed to NATHAN PRIDEMORE whose telephone number is (703)756-4640. The examiner can normally be reached Monday - Friday 8:00am - 4:00pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, JULIO MALDONADO can be reached at (571) 272-1864. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. NATHAN PRIDEMORE Examiner Art Unit 2898 /NATHAN PRIDEMORE/Examiner, Art Unit 2898 /JULIO J MALDONADO/Supervisory Patent Examiner, Art Unit 2898
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Prosecution Timeline

Mar 04, 2024
Application Filed
Jul 17, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
91%
With Interview (+14.3%)
3y 5m (~1y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 77 resolved cases by this examiner. Grant probability derived from career allowance rate.

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