Prosecution Insights
Last updated: October 25, 2026
Application No. 18/606,990

SEMICONDUCTOR STRUCTURE

Non-Final OA §103
Filed
Mar 15, 2024
Priority
Dec 19, 2023 — CN 202311753975.7
Examiner
NGUYEN, THANH T
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Enkris Semiconductor Inc.
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allowance Rate
1190 granted / 1427 resolved
+15.4% vs TC avg
Moderate +14% lift
Without
With
+14.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
33 currently pending
Career history
1457
Total Applications
across all art units

Statute-Specific Performance

§101
3.7%
-36.3% vs TC avg
§103
54.8%
+14.8% vs TC avg
§102
26.6%
-13.4% vs TC avg
§112
5.7%
-34.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1427 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Election/Restrictions Applicant’s election without traverse of Specie 2, claims 1-3, 6-14 in the reply filed on 9/4/26 is acknowledged. Claims 4-5 are withdrawn from further consideration by the examiner, 37 C.F.R. 1.142(b) as being drawn to a non-elected invention. Oath/Declaration Oath/Declaration filed on 3/19/24 has been considered. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1, 12 is/are rejected under 35 U.S.C. 103 as being unpatentable over CHEN et al. (U.S. Patent Publication No. 2015/0333241) in view of HAYAKAWA et al. (U.S. Patent Publication No. 2015/0099317). Referring to figure 6F, CHEN et al. teaches a semiconductor structure, comprising: a substrate (30); a light-emitting structure on the substrate, wherein the light-emitting structure comprises a first type semiconductor layer (321), an active layer (322) and a second type semiconductor layer (323) which are sequentially stacked on the substrate, and the first type semiconductor layer (321) comprises a first portion not covered by the active layer (322). However, the reference does not clearly teach a first heat-dissipation module at the first portion. HAYAKAWA et al. a first heat-dissipation module (130) at the first portion (see figure 1), a surface of the first heat-dissipation module away from the substrate is higher than a surface of the active layer away from the substrate (see figure 1, meeting claim 12). Therefore, it would have been obvious to a person ordinary skill in the requisite art at the time of the invention was filed would form a first heat-dissipation module at the first portion in CHEN et al. as taught by HAYAKAWA et al. because it is known in the art to improve heat extraction from the LED while retaining the exposed semiconductor region in thermal integration. Claim(s) 2-3, 13-14 is/are rejected under 35 U.S.C. 103 as being unpatentable over CHEN et al. (U.S. Patent Publication No. 2015/0333241) in view of HAYAKAWA et al. (U.S. Patent Publication No. 2015/0099317) as applied to claims 1, 12 and further in view of YU (U.S. Patent Publication No. 2012/0119246). Referring to figure 6F, CHEN et al. teaches a semiconductor structure, comprising: a substrate (30); a light-emitting structure on the substrate, wherein the light-emitting structure comprises a first type semiconductor layer (321), an active layer (322) and a second type semiconductor layer (323) which are sequentially stacked on the substrate, and the first type semiconductor layer (321) comprises a first portion not covered by the active layer (322). However, the reference does not clearly teach the first conductive structures are at a side of the first heat-dissipation sub-modules and the second heat-dissipation sub-modules facing the substrate, and the second conductive structures are at a side of the first heat-dissipation sub-modules and the second heat-dissipation sub-modules away from the substrate; wherein the first heat-dissipation modules are formed by groups which are connected in series, and each of the groups comprises one of the first heat-dissipation sub- modules, one of the first conductive structures, one of the second heat-dissipation sub- modules and one of the second conductive structures which are connected in series (in claims 2-3); pluralities of heat dissipation sub-modules (in claims 13-14). Yu et al. teaches a thermoelectric device wherein in a direction parallel to the substrate and along a sidewall of the active layer, the first heat-dissipation module comprises first heat-dissipation sub-modules (58) and second heat-dissipation sub-modules (60) which are arranged alternately (see figures 1M-1N), and a conductive layer that connects the first heat- dissipation sub-modules and the second heat-dissipation sub-modules in series (56, see figure 1G), wherein the first heat-dissipation sub-modules are made of P-type semiconductor thermoelectric materials (58), and the second heat-dissipation sub-modules are made of N-type semiconductor thermoelectric materials (60, see figure 1G-1N, meeting claim 2), the conductive layer (107/56) comprises: first conductive structures (107) disposed apart and second conductive structures (56) disposed apart, wherein the first conductive structures are at a side of the first heat-dissipation sub-modules and the second heat-dissipation sub-modules(58/60) facing the substrate, and the second conductive structures are at a side of the first heat-dissipation sub-modules and the second heat-dissipation sub-modules away from the substrate (see figures 1M-1N); wherein the first heat-dissipation modules are formed by groups which are connected in series, and each of the groups comprises one of the first heat-dissipation sub- modules, one of the first conductive structures, one of the second heat-dissipation sub- modules and one of the second conductive structures which are connected in series (see figures 1G-1N, meeting claim 3); the semiconductor structure further comprises: a second heat-dissipation module on a surface of the light-emitting structure away from the substrate (see figures 1N, 2, meeting claim 13); wherein in a direction parallel to the substrate, the second heat-dissipation module comprises: third heat-dissipation sub-modules and fourth heat-dissipation sub-modules which are alternately arranged, the third heat-dissipation sub-modules are made of P-type semiconductor thermoelectric materials, the fourth heat-dissipation sub-modules are made of N-type semiconductor thermoelectric materials; and fifth conductive structures disposed apart and sixth conductive structures disposed apart, wherein the fifth conductive structures are at a side of the third heat-dissipation sub- modules and the fourth heat-dissipation sub-modules facing the substrate, and the sixth conductive structures are at a side of the third heat-dissipation sub-modules and the fourth heat-dissipation sub-modules away from the substrate; wherein the second heat-dissipation modules are formed by groups which are connected in series, and each of the groups comprises one of the third heat-dissipation sub- modules, one of the fifth conductive structures, one of the fourth heat-dissipation sub- modules and one of the sixth conductive structures which are connected in series (TSVs, 56, 80, 58, 60, see claims 16-17, figures 1G-1N, 2, meeting claim 14). Therefore, it would have been obvious to a person ordinary skill in the requisite art at the time of the invention was filed would form the first heat-dissipation modules are formed by groups which are connected in series, and each of the groups comprises one of the first heat-dissipation sub- modules, one of the first conductive structures, one of the second heat-dissipation sub- modules and one of the second conductive structures which are connected in series in CHEN et al. as taught by Yu et al. because it is known in the art to improve heat extraction from the LED while retaining the exposed semiconductor region in thermal integration. Claim(s) 6-7 is/are rejected under 35 U.S.C. 103 as being unpatentable over CHEN et al. (U.S. Patent Publication No. 2015/0333241) in view of HAYAKAWA et al. (U.S. Patent Publication No. 2015/0099317) as applied to claims 1, 12 and further in view of Lee et al. (U.S. Patent No. 9,941,455). Referring to figure 6F, CHEN et al. teaches a semiconductor structure, comprising: a substrate (30); a light-emitting structure on the substrate, wherein the light-emitting structure comprises a first type semiconductor layer (321), an active layer (322) and a second type semiconductor layer (323) which are sequentially stacked on the substrate, and the first type semiconductor layer (321) comprises a first portion not covered by the active layer (322). However, the reference does not clearly teach a dielectric layer between the light-emitting structure and the first heat-dissipation module, so that the first heat-dissipation module is electrically isolated from the light- emitting structure (in claim 6); the dielectric layer further covers a sidewall of the light-emitting structure and a surface of the light- emitting structure away from the substrate; and the semiconductor structure further comprises:a first electrode electrically connected to the first type semiconductor layer through a first through-hole which is in the dielectric layer on the first portion; and a second electrode electrically connected to the second type semiconductor layer through a second through-hole which is in the dielectric layer on the second type semiconductor layer (in claim 7). Lee et al. teaches the semiconductor structure further comprises: a dielectric layer (153) between the light-emitting structure and the first heat-dissipation module (170), so that the first heat-dissipation module is electrically isolated from the light- emitting structure (see figures 44-47, meeting claim 6); the dielectric layer (151/153) further covers a sidewall of the light-emitting structure and a surface of the light- emitting structure away from the substrate; and the semiconductor structure further comprises: a first electrode (140) electrically connected to the first type semiconductor layer through a first through-hole (151a) which is in the dielectric layer on the first portion; and a second electrode (130) electrically connected to the second type semiconductor layer through a second through-hole (151b) which is in the dielectric layer on the second type semiconductor layer (see figures 44-47, meeting claim 7), a material of the dielectric layer is an insulation material, and the dielectric layer comprises a DBR structure (151/153, meeting claim 11). Therefore, it would have been obvious to a person ordinary skill in the requisite art at the time of the invention was filed would form the dielectric layer further covers a sidewall of the light-emitting structure and a surface of the light- emitting structure away from the substrate in CHEN et al. as taught by Lee et al. because it is known in the art to provide isolation between the structures. Allowable Subject Matter Claims 8-10 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Thanh Nguyen whose telephone number is (571) 272-1695, or by Email via address Thanh.Nguyen@uspto.gov. The examiner can normally be reached on Monday-Thursday from 6:00AM to 3:30PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner's supervisor, Yara Green, can be reached on (571) 270-3035. The fax phone number for this Group is (571) 273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pairdirect.uspto.gov. Should you have questions on access to thy Private PAIR system, contact the Electronic Business center (EBC) at 866-217-9197 (toll-free). /THANH T NGUYEN/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Mar 15, 2024
Application Filed
Sep 30, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12772500
BOTTOM CHANNEL TRENCH ISOLATED GATE ALL AROUND (GAA) FIELD EFFECT TRANSISTOR (FET)
2y 12m to grant Granted Oct 20, 2026
Patent 12765158
PROCESS FOR THE HALOGEN TREATMENT OF METAL OXIDE LAYERS
4y 6m to grant Granted Oct 13, 2026
Patent 12757466
MANUFACTURING METHOD FOR A SEMICONDUCTOR STRUCTURE
2y 11m to grant Granted Oct 06, 2026
Patent 12745601
MOUNT TAPE HAVING AN INNER SUPPORT LAYER BETWEEN ADHESIVE LAYERS FOR SEMICONDUCTOR DEVICE ASSEMBLY
4y 1m to grant Granted Sep 22, 2026
Patent 12745642
DEVICE, METHOD, AND SYSTEM TO MITIGATE WARPAGE OF A COMPOSITE CHIPLET
4y 1m to grant Granted Sep 22, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
98%
With Interview (+14.3%)
2y 9m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1427 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month