Prosecution Insights
Last updated: July 17, 2026
Application No. 18/609,555

INTEGRATED DEVICE COMPRISING EXTENDED METALLIZATION REGION FOR PILLAR INTERCONNECTS

Non-Final OA §102
Filed
Mar 19, 2024
Examiner
TRAPANESE, WILLIAM C
Art Unit
Tech Center
Assignee
Qualcomm Incorporated
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
10m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
493 granted / 640 resolved
+17.0% vs TC avg
Strong +21% interview lift
Without
With
+20.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
25 currently pending
Career history
667
Total Applications
across all art units

Statute-Specific Performance

§101
1.4%
-38.6% vs TC avg
§103
78.2%
+38.2% vs TC avg
§102
15.2%
-24.8% vs TC avg
§112
0.4%
-39.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 640 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 1-4, 7-14, 17-20 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Yasukawa et al (hereinafter Yasukawa, US20250096087A1). In regards to independent claim 1, Yasukawa teaches an integrated device comprising: a die substrate (100); a die interconnection portion coupled to the die substrate, wherein the die interconnection portion comprises (190+180): at least one die dielectric layer (180); and a plurality of die interconnects (190), wherein the die interconnection portion comprises: an inner die interconnection portion (left portion on Fig 7); and a periphery die interconnection portion, wherein the periphery die interconnect portion is free of the plurality of die interconnects (right portion of Fig. 7); a plurality of pad interconnects coupled to the die interconnection portion (Fig. 7 390); a plurality of metallization interconnects coupled to the plurality of pad interconnects, wherein at least one metallization interconnect from the plurality of metallization interconnects, vertically overlaps with the periphery die interconnection portion (UBM 400, Fig. 7), and a plurality of pillar interconnects coupled to the plurality of metallization interconnects (490). In regards to dependent claim 2, Yasukawa teaches the integrated device of claim 1, wherein the plurality of pillar interconnects comprise: a first pillar interconnect that vertically overlaps with the periphery die interconnection portion; and a second pillar interconnect that vertically overlaps with the inner die interconnection portion (Fig. 7). In regards to dependent claim 3, Yasukawa teaches the integrated device of claim 2, wherein the first pillar interconnect does not vertically overlap with the plurality of die interconnects (Fig. 7). In regards to dependent claim 4, Yasukawa teaches the integrated device of claim 2, wherein the integrated device comprises: an inner region; and a periphery region, wherein the inner die interconnection portion is part of the inner region of the integrated device, and wherein the periphery die interconnection portion is part of the periphery region of the integrated device (fig. 7 left side vs right side). In regards to dependent claim 7, Yasukawa teaches the integrated device of claim 4, wherein the die substrate includes an active region comprising a plurality of logic cells, wherein the active region is located in the inner region of the integrated device, and wherein the periphery region is free of any logic cells (Fig. 7). In regards to dependent claim 8, Yasukawa teaches the integrated device of claim 7, wherein at least one pillar interconnect does not vertically overlap with the active region (Fig. 7).. In regards to dependent claim 9, Yasukawa teaches the integrated device of claim 1, further comprising a seed layer that is part of the plurality of metallization interconnects ([0103}. In regards to dependent claim 10, Yasukawa teaches the integrated device of claim 1, further comprising a plurality of solder interconnects coupled to the plurality of pillar interconnects (490, Fig. 7). In regards to independent claim 11, Yasukawa teaches an integrated device comprising: a die substrate (100); a die interconnection portion coupled to the die substrate, wherein the die interconnection portion comprises (180, 190): at least one die dielectric layer (180); and a plurality of die interconnects (100, 190), a plurality of pad interconnects coupled to the die interconnection portion (190); an encapsulation layer coupled to (i) a side surface of the die substrate and (ii) a side surface of the die interconnection portion (170, Fig. 7); a plurality of metallization interconnects coupled to the plurality of pad interconnects, wherein at least one metallization interconnect from the plurality of metallization interconnect vertically overlaps with the encapsulation layer (220, Fig. 7), and a plurality of pillar interconnects coupled to the plurality of metallization interconnects (490). In regards to dependent claim 12, Yasukawa teaches the integrated device of claim 11, wherein the plurality of pillar interconnects comprise: a first pillar interconnect that vertically overlaps with the encapsulation layer; and a second pillar interconnect that vertically overlaps with the die interconnection portion. (Fig. 3) In regards to dependent claim 13, Yasukawa teaches the integrated device of claim 12, wherein the first pillar interconnect does not vertically overlap with the plurality of die interconnects (Fig. 3). In regards to dependent claim 14, Yasukawa teaches the integrated device of claim 12, wherein the integrated device comprises: an inner region; and a periphery region, wherein the die interconnection portion is part of the inner region of the integrated device, and wherein the encapsulation layer is part of the periphery region of the integrated device (Fig. 3, left side vs right side). In regards to dependent claim 17, Yasukawa teaches the integrated device of claim 14, wherein the die substrate includes an active region comprising a plurality of logic cells, wherein the active region is located in the inner region of the integrated device, and wherein the periphery region is free of any logic cells. (Fig. 7) In regards to dependent claim 18, Yasukawa teaches the integrated device of claim 17, wherein at least one pillar interconnect does not vertically overlap with the active region (Fig. 7). In regards to dependent claim 19, Yasukawa teaches the integrated device of claim 11, further comprising a seed layer that is part of the plurality of metallization interconnects ([0103]). In regards to dependent claim 20, Yasukawa teaches the integrated device of claim 11, further comprising a plurality of solder interconnects coupled to the plurality of pillar interconnects ([0490]). Allowable Subject Matter Claim 5,6, 15, 16 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM C TRAPANESE whose telephone number is (571)270-3304. The examiner can normally be reached Monday - Friday 7am-12pm & 8pm-10pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached at (571)272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM C TRAPANESE/Primary Examiner, Art Unit 2812
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Prosecution Timeline

Mar 19, 2024
Application Filed
Jul 01, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
98%
With Interview (+20.9%)
3y 2m (~10m remaining)
Median Time to Grant
Low
PTA Risk
Based on 640 resolved cases by this examiner. Grant probability derived from career allowance rate.

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