Prosecution Insights
Last updated: July 17, 2026
Application No. 18/630,262

PLASMA PROCESSING APPARATUS AND ANNULAR CONSUMABLE PART

Non-Final OA
Filed
Apr 09, 2024
Priority
May 15, 2018 — JP 2018-094129 +2 more
Examiner
HASSANZADEH, PARVIZ
Art Unit
Tech Center
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
25%
Grant Probability
At Risk
1-2
OA Rounds
1y 5m
Est. Remaining
59%
With Interview

Examiner Intelligence

Grants only 25% of cases
25%
Career Allowance Rate
18 granted / 71 resolved
-34.6% vs TC avg
Strong +33% interview lift
Without
With
+33.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 9m
Avg Prosecution
18 currently pending
Career history
82
Total Applications
across all art units

Statute-Specific Performance

§103
86.8%
+46.8% vs TC avg
§102
1.9%
-38.1% vs TC avg
§112
2.4%
-37.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 71 resolved cases

Prosecution Timeline

Apr 09, 2024
Application Filed
Sep 24, 2024
Response after Non-Final Action
May 27, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12660536
SYSTEMS AND METHODS FOR SEMICONDUCTOR ETCHING
3y 0m to grant Granted Jun 16, 2026
Patent 12642054
MULTl-STATION TOOL WITH ROTATABLE TOP PLATE ASSEMBLY
3y 1m to grant Granted May 26, 2026
Patent 12618151
SUBSTRATE PROCESSING APPARATUS
3y 0m to grant Granted May 05, 2026
Patent 12590373
AQUEOUS COMPOSITION, STAINLESS STEEL SURFACE ROUGHENING METHOD USING SAME, AND METHOD FOR MANUFACTURING ROUGHENED STAINLESS STEEL
2y 9m to grant Granted Mar 31, 2026
Patent 12581883
ETCHING METHOD AND PLASMA ETCHING APPARATUS
2y 11m to grant Granted Mar 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
25%
Grant Probability
59%
With Interview (+33.2%)
3y 9m (~1y 5m remaining)
Median Time to Grant
Low
PTA Risk
Based on 71 resolved cases by this examiner. Grant probability derived from career allowance rate.

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