Prosecution Insights
Last updated: October 23, 2026
Application No. 18/649,886

FIELD-EFFECT TRANSISTOR AND METHOD FOR PRODUCING A FIELD-EFFECT TRANSISTOR

Non-Final OA §112
Filed
Apr 29, 2024
Priority
May 03, 2023 — DE 10 2023 204 065.4
Examiner
CHI, SUBERR L
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Robert Bosch GmbH
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
561 granted / 663 resolved
+16.6% vs TC avg
Minimal +3% lift
Without
With
+2.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
19 currently pending
Career history
693
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
44.5%
+4.5% vs TC avg
§102
24.0%
-16.0% vs TC avg
§112
28.4%
-11.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 663 resolved cases

Office Action

§112
DETAILED ACTION Notice of AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election Claims #25-26 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention/species, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on July 27, 2026. Claims #14-24 are under examination in the present Office Action. IDS The IDS document(s) filed on May 24, 2024 has been considered. Copies of the PTO-1449 documents are herewith enclosed with this office action. Specifications The title is objected to because a more descriptive title is requested. Claim Rejections – 35 U.S.C. § 112(b) The following is a quotation of 35 U.S.C. § 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. Claims 14-24 are rejected under 35 U.S.C. § 112(b) or pre-AIA 35 U.S.C. § 112, second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor, or for pre-AIA the applicant, regards as the invention. As to claim 14, it is unclear what is meant by ‘in particular’ in the limitation “fins and gate trenches extending in particular horizontally” (emphasis added). The Examiner assumes ‘extending horizontally’. As to claim 14, it is unclear if the first types in “a drain layer doped according to a first type; a channel layer located vertically between the source layer doped according to a first type and the drain layer doped according to a first type; fins and gate trenches extending in particular horizontally wherein each of the fins and the gate trenches extends in a vertical direction from the source layer doped according to a first type to the drain layer doped according to a first type, and wherein the gate trenches arc in each case formed between two adjacent fins; and a support structure for the fins” (emphasis added) refer to a first type of a source layer. The Examiner suggests “the first type” to prevent antecedent basis issues. As to claim 15, it is unclear if “from the source layer doped according to a first type to the drain layer doped according to a first type” (emphasis added) is referring to a new first type or the same first type that the source layer is doped according to. Indication of Allowable Subject Matter Claims 14-24 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action. As to claim 14, Huang et al. (U.S. Patent Publication No. 2016/0149036 A1), hereafter “Huang”, teaches in FIG. 1 a source layer 232 doped according to a first type; a drain layer 232 doped according to a first type; a channel layer (not shown but necessarily present in a finFET) located vertically between the source layer and the drain layer; fins 220 and gate trenches (space between adjacent fins) extending horizontally wherein the gate trenches, by definition, are in each case formed between two adjacent fins; and a support structure 314+320 for the fins. However, Huang does not teach each of the gate trenches extends in a vertical direction from the source layer doped according to a first type to the drain layer doped according to a first type because the source and drain layers 232 are laterally spaced apart, not vertically stacked. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SUBERR CHI whose telephone number is (571)270-3955. The examiner can normally be reached 10am to 6pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached on (571) 272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SUBERR L CHI/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Apr 29, 2024
Application Filed
Oct 01, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Patent 12751110
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
87%
With Interview (+2.7%)
2y 9m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 663 resolved cases by this examiner. Grant probability derived from career allowance rate.

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