Prosecution Insights
Last updated: August 17, 2026
Application No. 18/654,441

SEMICONDUCTOR DEVICE PACKAGES AND METHODS OF FORMATION

Non-Final OA §102
Filed
May 03, 2024
Examiner
ANYA, IGWE U
Art Unit
Tech Center
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
80%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
809 granted / 953 resolved
+24.9% vs TC avg
Minimal -5% lift
Without
With
+-4.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
20 currently pending
Career history
964
Total Applications
across all art units

Statute-Specific Performance

§101
1.4%
-38.6% vs TC avg
§103
50.9%
+10.9% vs TC avg
§102
36.4%
-3.6% vs TC avg
§112
7.0%
-33.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 953 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1 – 4, 7 and 15 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Kini et al. (US 2025/0107045). PNG media_image1.png 474 583 media_image1.png Greyscale (Claim 1) Kini et al. teach a semiconductor device package, comprising: a substrate (402); a plurality of semiconductor dies (204) on a first side of the substrate; a plurality of integrated circuit devices (208) on a second side of the substrate opposite the first side; a first vapor chamber lid structure (210) over the plurality of semiconductor dies and thermally coupled with the plurality of semiconductor dies; and a second vapor chamber lid structure (302) over the plurality of integrated circuit devices and thermally coupled with the plurality of integrated circuit devices (paragraphs 56 – 58). (Claim 2) Kini et al. teach wherein the plurality of integrated circuit devices comprise a plurality of voltage regulator module (VRM) integrated circuit devices (paragraph 48, PDC); and wherein the plurality of VRM integrated circuit devices are thermally coupled with the second vapor chamber lid structure by thermal interface material (paragraph 57). (Claim 3) Kini et al. teach wherein the second vapor chamber lid structure (302) comprises: a footing (vertical end extensions of 302 abutting 402) having a continuous closed-looped structure that defines a space in which the plurality of integrated circuit devices are located; a lid coupled (horizontal portion of 302) with the footing and spanning the space defined by the footing, wherein the lid is thermally coupled with the plurality of integrated circuit devices; and a vapor chamber within the lid (paragraph 58). (Claim 4) Kini et al. teach wherein the plurality of integrated circuit devices (208) are thermally coupled with a first side of the lid (302); and wherein the second vapor chamber ( lid structure further comprises a plurality of fins that are physically coupled with a second side of the lid opposing the first side. (Claim 7) Kini et al. teach wherein a footing (vertical end extensions of 210) of the first vapor chamber lid structure (210) is coupled to the first side (topside) of the substrate (402); and wherein a footing (vertical end extensions of 302) of the second vapor chamber lid structure is coupled to the second side (underside) of the substrate (402). PNG media_image2.png 478 619 media_image2.png Greyscale (Claim 15) Kini et al. teach a method, comprising: attaching a plurality of semiconductor dies (510) to a first side of a substrate (110) of a semiconductor device package; attaching a thermal lid structure (800) to the first side (topside) of the substrate (1100) such that the thermal lid structure is over the plurality of semiconductor dies and thermally coupled with the plurality of semiconductor dies; attaching a plurality of integrated circuit devices (602, PDC) to a second side (underside) of the substrate vertically opposite the first side; dispensing thermal interface material (604) onto the plurality of integrated circuit devices (PDC); and attaching a vapor chamber lid structure (700) to the second side (underside) of the substrate (1100) such that the vapor chamber lid structure is over the plurality of integrated circuit devices and thermally coupled with the plurality of integrated circuit devices through the thermal interface material. Claims 8 – 9 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Singh et al. (US 2019/0045665). PNG media_image3.png 455 632 media_image3.png Greyscale (Claim 8) Singh et al teach a semiconductor device package, comprising: a substrate (124); a plurality of semiconductor dies (122) on a front side of the substrate; a plurality of voltage regulator integrated circuit devices (128, LSC, paragraph 40) on a back side of the substrate opposing the front side; a first vapor chamber lid (118, heat spreader, paragraph 40, paragraph 44 heat spreader can be comprised of a vapor chamber) structure over the plurality of semiconductor dies and thermally coupled with the plurality of semiconductor dies; a second vapor chamber lid structure (138, paragraph 44) over the plurality of voltage regulator integrated circuit devices(128, LSC) and thermally coupled with the plurality of voltage regulator integrated circuit devices; and one or more package connectors (130) on the back side of the substrate (124), wherein the one or more package connectors (130) are located outside of a perimeter of the second vapor chamber lid structure (138). (Claim 9) Singh et al teach wherein the perimeter of the second vapor chamber lid structure (138) is at least partially within a perimeter of the first vapor chamber lid structure (118). Allowable Subject Matter Claims 5, 6, 10 – 14 and 16 – 20 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Prior art made of record and not relied upon, considered pertinent to applicant's disclosure are listed in PTO – 892 Form. Contact Information Any inquiry concerning this communication or earlier communications from the examiner should be directed to IGWE U ANYA whose telephone number is (571)272-1887. The examiner can normally be reached 8:00 AM - 6:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Matthew Landau can be reached at (571) 272- 1731. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /IGWE U ANYA/Primary Examiner, Art Unit 2891 July 25, 2026
Read full office action

Prosecution Timeline

May 03, 2024
Application Filed
Jul 30, 2024
Response after Non-Final Action
Jul 29, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
80%
With Interview (-4.8%)
2y 6m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 953 resolved cases by this examiner. Grant probability derived from career allowance rate.

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