Prosecution Insights
Last updated: October 02, 2026
Application No. 18/661,326

METHODS AND SYSTEMS FOR MEASURING SEMICONDUCTOR DEVICES

Final Rejection §102§103
Filed
May 10, 2024
Priority
Dec 27, 2018 — divisional of 10/971,409 +1 more
Examiner
TRAN, TAN N
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Lodestar Licensing Group LLC
OA Round
2 (Final)
87%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
974 granted / 1121 resolved
+18.9% vs TC avg
Moderate +10% lift
Without
With
+9.9%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
31 currently pending
Career history
1158
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
50.5%
+10.5% vs TC avg
§102
33.8%
-6.2% vs TC avg
§112
7.6%
-32.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1121 resolved cases

Office Action

§102 §103
DETAILED ACTION Claim Rejections - 35 USC § 102 1. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. 2. Claim(s) 2 – 5, 7 – 9, 19, 20 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by FUKAYAMA et al. (20160079102). With regard to claim 2, FUKAYAMA et al. disclose a method (for example, see figs. 3, 4), comprising: receiving an image (for example, a camera 16 providing an image; for example, see paragraph [0018]) of a semiconductor die assembly (100, for example, see fig. 3); detecting, in the image, a set of measurement features (alignment markers 54, 56, in fig. 3 below, functions as a set of measurement features) associated with a plurality of semiconductor dies (12, 20, 26), wherein at least two semiconductor dies (20, 26) of the plurality of semiconductor dies (12, 20, 26) comprise measurement features (alignment markers 54, 56 functions as a set of measurement features); and determining distances (referred to as “D1” by examiner’s annotation shown in fig. 4 below) between a pair of adjacent semiconductor dies (20, 26) of the plurality of semiconductor dies (12, 20, 26) inherently based at least in part on determining distances (referred to as “D2” by examiner’s annotation shown in fig. 4 below; wherein the distance D2 is smaller than the distance D1 in order to secure the electrical connections between the bumps 24, 28 formed on both the pair of adjacent semiconductor dies 20, 26) between the measurement features (alignment markers 54, 56 functions as a set of measurement features) associated with the at least two semiconductor dies (20, 26). PNG media_image1.png 463 597 media_image1.png Greyscale PNG media_image2.png 351 798 media_image2.png Greyscale With regard to claim 3, FUKAYAMA et al. disclose the image is captured by an image capture device (16), the method further comprising: determining the distances (D2) between the measurement features (54, 56) based at least in part on a distance (a gap, formed between the semiconductor dies 20, 26 and the capture device 16, functioning as a distance) between the image capture device (16) and the semiconductor die assembly (the semiconductor die assembly including the semiconductor dies 20, 26). With regard to claim 4, FUKAYAMA et al. disclose the measurement features (54, 56) are vertically aligned relative to each other. With regard to claim 5, FUKAYAMA et al. disclose determining thicknesses of interconnects (the bumps 24, 28 function as interconnects) extending between each pair of adjacent semiconductor dies (20, 26) based at least in part on determining the distances (D1) between the measurement features (54, 56). With regard to claim 7, FUKAYAMA et al. disclose the set of measurement features (54, 56) are closer to a first side (a top side of the semiconductor die 20 functions as a first side) of the at least two semiconductor dies (20, 26) than a second side (a bottom side of the semiconductor die 20 functions as a second side) of the at least two semiconductor dies (20, 26), and wherein the method further comprises: receiving a second image (for example, a camera 16 providing an image; for example, see paragraph [0018]) of the semiconductor die assembly; detecting, in the second image, a second set of measurement features (the markers 52, 50 functioning as second measurement features) associated with the plurality of semiconductor dies (20, 26) closer to the second side (the bottom side of the semiconductor die 20 functions as the second side) than to the first side (the top side of the semiconductor die 20 functions as the first side), wherein the at least two semiconductor dies (12, 20) comprise measurement features (52, 50) of the second set of measurement features (the markers 52, 50); determining distances (referred to as “D3” by examiner’s annotation shown in fig. 4 below) between a pair of adjacent semiconductor dies (12, 20) of the plurality of semiconductor dies (12, 20, 26) based at least in part on determining distances (referred to as “D4” by examiner’s annotation shown in fig. 4 below; wherein the distance D4 is smaller than the distance D3 in order to secure the electrical connections between the bumps 14, 22 formed on both the pair of adjacent semiconductor dies 12, 20) between the measurement features (52, 50) of the second set of measurement features (the markers 52, 50). PNG media_image3.png 365 797 media_image3.png Greyscale With regard to claim 8, FUKAYAMA et al. disclose the first side (the top side) and the second side (the bottom side) of each semiconductor die (20) are parallel (parallel in horizontal direction). With regard to claim 9, FUKAYAMA et al. disclose the first side (the top side) and the second side (the bottom side) of each semiconductor die (20) are perpendicular (in a vertical view, so the top side is perpendicular to the bottom side). With regard to claim 19, FUKAYAMA et al. disclose a method (for example, see figs. 3, 4), comprising: receiving an image (for example, a camera 16 providing an image; for example, see paragraph [0018]) of a semiconductor die assembly (100, for example, see fig. 3); detecting, in the image, a set of measurement features (alignment markers 54, 56, in fig. 3 below, functions as a set of measurement features) associated with a plurality of semiconductor dies (12, 20, 26), wherein each semiconductor die (20, 26) comprises measurement features (alignment markers 54, 56 functions as a set of measurement features); and determining, for each pair of semiconductor dies (20, 26) of the plurality of semiconductor dies (12, 20, 26), a distance (referred to as “D1” by examiner’s annotation shown in fig. 4 below) between a top semiconductor die (26) of a pair of semiconductor dies (20, 26) and a bottom semiconductor die (20) of the pair of semiconductor dies (20, 26) inherently based at least in part on determining a distance (referred to as “D2” by examiner’s annotation shown in fig. 4 below; wherein the distance D2 must be smaller than the distance D1 in order to secure the electrical connections between the bumps 24, 28 formed on both the pair of adjacent semiconductor dies 20, 26) between the measurement features (alignment markers 54, 56 functions as a set of measurement features) associated with the top semiconductor die (26) and the measurement features (54, 56) associated with the bottom semiconductor die (20). PNG media_image1.png 463 597 media_image1.png Greyscale PNG media_image2.png 351 798 media_image2.png Greyscale With regard to claim 20, FUKAYAMA et al. disclose determining, for each pair of semiconductor dies (20, 26), a thickness of interconnects (the bumps 24, 28 function as interconnects) extending between the top semiconductor die (26) and the bottom semiconductor die (20) based at least in part on determining the distances (D1) between the measurement features (54, 56) associated with the top semiconductor die (26) and the measurement features (54, 56) associated with the bottom semiconductor die (20). Claim Rejections - 35 USC § 103 3. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 4. Claims 6, 21 are rejected under 35 U.S.C. 103 as being unpatentable over FUKAYAMA et al. (20160079102) in view of Lee (7741652). With regard to claim 6, FUKAYAMA et al. do not clearly disclose determining a degree of warpage between each pair of adjacent semiconductor dies based at least in part on determining the distances between the measurement features. However, Lee discloses determining a degree (any degree is a degree) of warpage between each pair of adjacent semiconductor dies (100, 400) based at least in part on determining the distances between the measurement features (referred to as “10A” and “10B” by examiner’s annotation shown in fig. 3 below; wherein the measurement features 10A, 10B are portions of the alignment feature 10). (for example, see column 1, lines 19 – 21, column 5, lines 1 – 5, fig. 3). PNG media_image4.png 456 747 media_image4.png Greyscale Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have modified the FUKAYAMA et al.’s device to have determining a degree of warpage between each pair of adjacent semiconductor dies based at least in part on determining the distances between the measurement features as taught by Lee in order to enhance more flexible package and alignment efficiency for enhancing a stability operation of the semiconductor device, as is known to one of ordinary skill in the art. With regard to claim 21, FUKAYAMA et al. do not clearly disclose determining, for each pair of semiconductor dies a degree of warpage between the top semiconductor die and the bottom semiconductor die based at least in part on determining the distance between the measurement features associated with the top semiconductor die and the measurement features associated with the bottom semiconductor die. However, Lee discloses determining, for each pair of semiconductor dies a degree (any degree is a degree) of warpage between the top semiconductor die (400) and the bottom semiconductor die (100) based at least in part on determining the distance between the measurement features (referred to as “10A” and “10B” by examiner’s annotation shown in fig. 3 below; wherein the measurement features 10A, 10B are portions of the alignment feature 10) associated with the top semiconductor die (400) and the measurement features (10A, 10B) associated with the bottom semiconductor die (100). (for example, see column 1, lines 19 – 21, column 5, lines 1 – 5, fig. 3). PNG media_image4.png 456 747 media_image4.png Greyscale Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have modified the FUKAYAMA et al.’s device to have determining, for each pair of semiconductor dies a degree of warpage between the top semiconductor die and the bottom semiconductor die based at least in part on determining the distance between the measurement features associated with the top semiconductor die and the measurement features associated with the bottom semiconductor die as taught by Lee in order to enhance more flexible package and alignment efficiency for enhancing a stability operation of the semiconductor device, as is known to one of ordinary skill in the art. Allowable Subject Matter 5. Claims 10 - 18 are allowable over the prior art of record because none of these references disclose or can be combined to yield the claimed invention such as forming, based at least in part on forming the conductive pads, measurement features spaced apart from a side of a semiconductor die by a distance of about 2000 µm to 5000 µm; and stacking the plurality of semiconductor dies based at least in part on forming the measurement features as recited in claim 10. Response to Arguments 6. Applicant’s arguments filed 07/21/26 have been fully considered but they are not persuasive. It is argued, at pages of the remarks, that “Fukayama does not disclose at all discuss any vertical measurement or there are no figures in Fukayama, or any accompanying description, that show or discuss a dimension or distance between chips”. However, figs. 3, 4 of Fukayama does show determining distances between a pair of adjacent semiconductor dies (20, 26) of the plurality of semiconductor dies (12, 20, 26) inherently based at least in part on determining distances (referred to as “D2” by examiner’s annotation shown in fig. 4 below; wherein the distance D2 must be smaller than the distance D1 in order to secure the electrical connections between the bumps 24, 28 formed on both the pair of adjacent semiconductor dies 20, 26) between the measurement features (alignment markers 54, 56 functions as a set of measurement features) associated with the at least two semiconductor dies (20, 26). PNG media_image2.png 351 798 media_image2.png Greyscale Conclusion 7. THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any extension fee pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the date of this final action. 8. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TAN N TRAN whose telephone number is (571) 272 - 1923. The examiner can normally be reached on 8:30-5:00PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached on (571) 272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TAN N TRAN/ Primary Examiner, Art Unit 2812
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Prosecution Timeline

May 10, 2024
Application Filed
May 12, 2026
Non-Final Rejection mailed — §102, §103
Jul 21, 2026
Response Filed
Sep 15, 2026
Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
87%
Grant Probability
97%
With Interview (+9.9%)
2y 1m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 1121 resolved cases by this examiner. Grant probability derived from career allowance rate.

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