Prosecution Insights
Last updated: October 02, 2026
Application No. 18/662,107

CAPACITOR, SEMICONDUCTOR DEVICE COMPRISING THE CAPACITOR, AND METHOD OF FABRICATING THE CAPACITOR

Non-Final OA §112
Filed
May 13, 2024
Priority
Jan 19, 2022 — RE 10-2022-0008030 +2 more
Examiner
GEYER, SCOTT B
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
2 (Non-Final)
94%
Grant Probability
Favorable
2-3
OA Rounds
0m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 94% — above average
94%
Career Allowance Rate
685 granted / 727 resolved
+26.2% vs TC avg
Minimal +4% lift
Without
With
+4.2%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 10m
Avg Prosecution
26 currently pending
Career history
736
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
21.0%
-19.0% vs TC avg
§102
41.5%
+1.5% vs TC avg
§112
24.2%
-15.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 727 resolved cases

Office Action

§112
DETAILED ACTION Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112: The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention. Claim 5 is rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claims contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention. Claim 5 recites (in lines 1-2): “the lower electrode further comprises Si”. Claim 5 depends from claim 4, which in turn depends from claim 1. Therefore, claim 5 recites a quaternary nitride compound: TiNbSiN. However, the applicant’s specification ly provides support for ternary nitride compounds. For example, in paragraphs 0057-0059, MM’N compound possibilities are listed. The applicant also has other paragraphs for a lower electrode material (for example paragraphs 0019 and 0056); however these paragraphs do not recite or disclose any silicon (Si) being used. Claims 8 and 22 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, because the specification, while being enabling for some oxides and oxynitrides (from M’O or M’ON), does not reasonably provide enablement for all elements listed within these two claims. The specification does not enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make or use the invention commensurate in scope with these claims. Several examples are listed below. Polonium (Po) – an extremely rare and unstable element. Francium (Fr) – extremely rare and unstable, any measurable quantity has never been seen. Uranium (U) – known radioactive and dangerous element. Promethium (Pm) – radioactive and unstable element. Osmium (Os) – extremely rare element, unknown if Os can form oxynitrides (for M’ON); Osmium oxide is highly dangerous and poisonous. Technetium (Tc) - extremely rare element and all isotopes are radioactive. Oxygen (O) – M’ON would yield NO2 which is a gas, and as such is not a viable interfacial film for a capacitor device structure. Oxygen (O) – M’O would yield O2 which is also a gas. Nitrogen (N) - M’ON would yield N2O which is also a gas. Nitrogen (N) - M’O would yield NO which is also a gas. As shown by this list, the elements from the list (in claims 8 and 22) clearly include those elements which are entirely not feasible, either due to instability, scarcity, inherent dangers, or structural incompatibility (i.e. a gas). Therefore, claims 8 and 22 as currently written contain subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor had possession of the claimed invention. Response to Arguments Applicant’s arguments with respect to the pending claims have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Due to the new grounds of rejection, this office action is Non-Final. Contact Information Any inquiry concerning this communication or earlier communications from the examiner should be directed to Scott B. Geyer (telephone: 571-272-1958). The examiner can normally be reached on Monday to Friday, 10AM - 4PM (ET). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at: http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine S. Kim (telephone: 571-272-8458). The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (in U.S.A. or Canada) or 571-272-1000. /SCOTT B GEYER/ Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

May 13, 2024
Application Filed
Jun 02, 2026
Non-Final Rejection mailed — §112
Jul 29, 2026
Response Filed
Sep 02, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12751151
DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME
2y 9m to grant Granted Sep 29, 2026
Patent 12733223
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
3y 2m to grant Granted Sep 08, 2026
Patent 12733243
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
2y 7m to grant Granted Sep 08, 2026
Patent 12733374
DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME
2y 6m to grant Granted Sep 08, 2026
Patent 12727293
SEMICONDUCTOR LIGHT EMITTING DIODE INCLUDING PASSIVATION LAYER HAVING DIFFERENT THICKNESSES
3y 8m to grant Granted Sep 01, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

2-3
Expected OA Rounds
94%
Grant Probability
98%
With Interview (+4.2%)
1y 10m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 727 resolved cases by this examiner. Grant probability derived from career allowance rate.

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