Prosecution Insights
Last updated: April 19, 2026
Application No. 18/669,836

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

Non-Final OA §102
Filed
May 21, 2024
Examiner
PATEL, DHARTI HARIDAS
Art Unit
2838
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
NGK Insulators Ltd.
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
2y 5m
To Grant
95%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allow Rate
1079 granted / 1239 resolved
+19.1% vs TC avg
Moderate +8% lift
Without
With
+7.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
23 currently pending
Career history
1262
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
42.3%
+2.3% vs TC avg
§102
43.5%
+3.5% vs TC avg
§112
2.2%
-37.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1239 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1, 3, and 5-6 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Satake Publication No. US 2021/0043489. Regarding claim 1, Satake discloses a member for semiconductor manufacturing apparatus, comprising: a ceramic plate [Fig. 2, electrostatic chuck 6] having a wafer placement surface [Fig. 2, 21] on its upper surface and a built-in electrode [Fig. 3, electrode 6a; par. 0013, 0015]; a base plate [Fig. 2, base 2a; par. 0013] provided on a lower surface of the ceramic plate; a base plate through-hole [Fig. 2, 34; 200; par. 0034-0036] that penetrates the base plate in an up-down direction; an insulating tube [Fig. 2, insulating member comprising inner sleeve 201 and outer sleeve 202] inserted into the base plate through-hole [par. 0037 and 0038]; an adhesive layer [Fig. 2, adhesive layers 7 and 8] including an insulating tube upper surface adhesion part [Fig. 2, adhesive layer 7] and an insulating tube outer circumferential surface adhesion part [Fig. 2, adhesive layer 8], the insulating tube upper surface adhesion part being configured to bond the lower surface of the ceramic plate and an upper surface of the insulating tube together [par. 0030; adhesive layer is disposed between the ceramic plate 6 and upper surface of the insulation tube 201], the insulating tube outer circumferential surface adhesion part being continuous to the insulating tube upper surface adhesion part [Fig. 2, adhesive layer 7 is being continuous to the adhesive layer 8] and configured to bond an inner circumferential surface of the base plate through-hole and an outer circumferential surface of the insulating tube together [Fig. 2, adhesive layer 8 is configured to bond between the outer sleeve and the base plate]; and a positioning structure [Fig. 2, the protrusion portions of the lower ends of 201 and 202] configured to perform positioning so that a distance between the lower surface of the ceramic plate and the upper surface of the insulating tube reaches a predetermined distance [par. 0038; “The lower ends of the inner sleeve 201 and the outer sleeve 202 protrude at the their lower portions so as to have an L-shaped cross section, and the protrusion portions of the inner sleeve 201 and the outer sleeve 202 are inserted and fitted into a step in the base 2a. As a result, the position of the inner sleeve 201 and the outer sleeve 202 is determined. In this state, the inner sleeve 201 presses the O-ring 203 from below so as to bring the O-ring 203 into contact with the rear surface 22 of the electrostatic chuck 6”]; wherein the positioning structure includes: an outer circumferential projection provided on the outer circumferential surface of the insulating tube [Fig. 2, as shown and described in par. 0038]; and a regulator provided in the base plate [Fig. 2, the lower end of the base plate where the protrusion portions of the 201 is inserted] and configured to regulate upward movement of the outer circumferential projection by coming into contact with an upper surface of the outer circumferential projection [par. 0038]. Regarding claim 3, Satake discloses that when a position in an up-down direction of the upper surface of the insulating tube is viewed along an outer circumference of the insulating tube, the position in an up-down direction varies stepwise [Fig. 2, the inner and outer sleeves are fitted into the step in the base 2a; par. 0038’] or continuously. Regarding claim 5, Satake discloses that the base plate through-hole is part of a power supply member insertion hole into which a power supply member to provide electric power to the electrode is inserted, the power supply member being provided downward from the electrode of the member for semiconductor manufacturing apparatus, or part of a lift pin hole which penetrates the member for semiconductor manufacturing apparatus in an up-down direction [par. 0017; holes 200 for a plurality of lifter pins 61 connected to a lifting mechanism 62], and into which a lift pin is inserted, or part of a gas hole that penetrates the member for semiconductor manufacturing apparatus in an up-down direction to supply gas to the wafer placement surface. Regarding claim 6, Satake discloses a member for semiconductor manufacturing apparatus, comprising: a ceramic plate [Fig. 2, electrostatic chuck 6] having a wafer placement surface [Fig. 2, 21] on its upper surface and a built-in electrode [Fig. 3, electrode 6a; par. 0013, 0015]; a base plate [Fig. 2, base 2a; par. 0013] provided on a lower surface of the ceramic plate; a base plate through-hole [Fig. 2, 34; 200; par. 0034-0036] that penetrates the base plate in an up-down direction; an insulating tube [Fig. 2, insulating member comprising inner sleeve 201 and outer sleeve 202] inserted into the base plate through-hole [par. 0037 and 0038]; an adhesive layer [Fig. 2, adhesive layers 7 and 8] including an insulating tube upper surface adhesion part [Fig. 2, adhesive layer 7] and an insulating tube outer circumferential surface adhesion part [Fig. 2, adhesive layer 8], the insulating tube upper surface adhesion part being configured to bond the lower surface of the ceramic plate and an upper surface of the insulating tube together [par. 0030; adhesive layer is disposed between the ceramic plate 6 and upper surface of the insulation tube 201], the insulating tube outer circumferential surface adhesion part being continuous to the insulating tube upper surface adhesion part [Fig. 2, adhesive layer 7 is being continuous to the adhesive layer 8] and configured to bond an inner circumferential surface of the base plate through-hole and an outer circumferential surface of the insulating tube together [Fig. 2, adhesive layer 8 is configured to bond between the outer sleeve and the base plate]; and a positioning structure [Fig. 2, the protrusion portions of the lower ends of 201 and 202] configured to perform positioning so that a distance between the lower surface of the ceramic plate and the upper surface of the insulating tube reaches a predetermined distance [par. 0038; “The lower ends of the inner sleeve 201 and the outer sleeve 202 protrude at the their lower portions so as to have an L-shaped cross section, and the protrusion portions of the inner sleeve 201 and the outer sleeve 202 are inserted and fitted into a step in the base 2a. As a result, the position of the inner sleeve 201 and the outer sleeve 202 is determined. In this state, the inner sleeve 201 presses the O-ring 203 from below so as to bring the O-ring 203 into contact with the rear surface 22 of the electrostatic chuck 6”]; wherein when a position in an up-down direction of the upper surface of the insulating tube is viewed along an outer circumference of the insulating tube, the position in an up-down direction varies stepwise [Fig. 2, the inner and outer sleeves are fitted into the step in the base 2a; par. 0038’] or continuously. Allowable Subject Matter Claim 2 and 4 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is an examiner’s statement of reasons for allowance of claim 2: The prior art does not disclose that the positioning structure includes an upper surface projection provided on the upper surface of the insulating tube. This feature in combination with the rest of the claim limitations is not anticipated or rendered obvious by the prior art of record. The following is an examiner’s statement of reasons for allowance of claim 4: The prior art does not disclose that the insulating tube outer circumferential surface adhesion part is formed from the lower surface of the ceramic plate to an intermediate point of the adhesive agent pool. This feature in combination with the rest of the claim limitations is not anticipated or rendered obvious by the prior art of record. Claim 7 is allowed. The following is an examiner’s statement of reasons for allowance of claim 7: The prior art does not disclose that the insulating tube outer circumferential surface adhesion part is formed from the lower surface of the ceramic plate to an intermediate point of the adhesive agent pool. This feature in combination with the rest of the claim limitations is not anticipated or rendered obvious by the prior art of record. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DHARTI PATEL whose telephone number is (571)272-8659. The examiner can normally be reached M - F 9 AM - 5 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Thienvu Tran can be reached at 571-270-1276. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. DHARTI PATEL Primary Examiner Art Unit 2836 /DHARTI H PATEL/Primary Examiner, Art Unit 2838
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Prosecution Timeline

May 21, 2024
Application Filed
Mar 07, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
95%
With Interview (+7.8%)
2y 5m
Median Time to Grant
Low
PTA Risk
Based on 1239 resolved cases by this examiner. Grant probability derived from career allow rate.

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