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Office Actions › Hitachi Ltd. › 18684171
Last updated: July 17, 2026
Application No. 18/684,171

SCANNING PROBE MICROSCOPE AND SAMPLE USED THEREIN

Non-Final OA
Filed
Feb 15, 2024
Priority
Aug 20, 2021 — JP 2021-134656 +1 more
Examiner
MCCORMACK, JASON L
Art Unit
2881
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Hitachi Ltd.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
93%
With Interview

Interview Optional

— +8.0% interview lift. Interview lift (+8.0%) is below the 15.0% threshold. A written response is recommended.
Based on 1037 resolved cases, 2023–2026

Examiner Intelligence

MCCORMACK, JASON L View full profile →
Grants 85% — above average
85%
Career Allowance Rate
877 granted / 1037 resolved
+16.6% vs TC avg
Moderate +8% lift
Without
With
+8.0%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
49 currently pending
Career history
1071
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
76.0%
+36.0% vs TC avg
§102
4.2%
-35.8% vs TC avg
§112
13.6%
-26.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1037 resolved cases

Prosecution Timeline

Feb 15, 2024
Application Filed
May 21, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

18/159,852
Patent 12683117
MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION, METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WITH A MIRROR MODE OF OPERATION AND ASSOCIATED COMPUTER PROGRAM PRODUCT
3y 5m to grant Granted Jul 14, 2026
18/220,931
Patent 12683118
SCANNING ELECTRON MICROSCOPY-BASED SAMPLE ANALYSIS
3y 0m to grant Granted Jul 14, 2026
18/284,532
Patent 12683114
ELECTRON BEAM MODULATION DEVICE AND ELECTRON BEAM MODULATION METHOD
2y 9m to grant Granted Jul 14, 2026
18/475,637
Patent 12680973
SECONDARY ELECTRON DETECTOR FOR ION BEAM SYSTEMS
2y 9m to grant Granted Jul 14, 2026
17/940,688
Patent 12676283
METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK
3y 10m to grant Granted Jul 07, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
93%
With Interview (+8.0%)
2y 1m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1037 resolved cases by this examiner. Grant probability derived from career allowance rate.

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