Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2881 2899
This examiner grants 85% of resolved cases
Jason L. McCormack is a high-volume examiner in Tech Center 2800 and Art Unit 2881, with 1050 resolved cases. The examiner maintains a high allowance rate of 84.6%, which is very favorable for applicants. This rate suggests that the examiner is generally inclined to grant patents, making Art Unit 2881 a productive environment for securing intellectual property rights. The 84.6% figure indicates that most applications will eventually reach allowance under this examiner's review.
The interview lift is 8.1%, a relatively small increase. This suggests that while interviews are beneficial, the high baseline allowance rate of 84.6% means that many applications are allowed without the need for such intervention. The median days to allowance is 783, which is quite efficient. This 783-day timeframe indicates that the examiner moves cases through the system quickly. For practitioners, the combination of a high allowance rate and a fast 783-day median pendency across 1050 resolved cases suggests a streamlined and predictable prosecution experience in Tech Center 2800. The 8.1% interview lift remains a useful option for resolving specific issues.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18366322 | APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18778127 | MASS SPECTROMETRY METHOD FOR FLUOROETHER COMPOUND | Non-Final OA | DAIKIN INDUSTRIES, LTD. |
| 18857632 | ION GUIDE AND MASS SPECTROMETER | Non-Final OA | HITACHI HIGH-TECH CORPORATION |
| 18781599 | Ion Beam Etching Apparatus And Method | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18522600 | METHOD AND SYSTEM FOR MANIPULATING PARTICLE BY USING OPTICAL TWEEZER | Non-Final OA | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
| 18927064 | COMPACT BEAM PROCESSING SYSTEM HAVING IN-SITU IMAGING METROLOGY | Non-Final OA | Applied Materials, Inc. |
| 18417347 | MEASURING SYSTEMS, PROCESSING SYSTEMS, AND RELATED APPARATUS AND METHODS, INCLUDING BAND GAP MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18895633 | OPERANDO SCANNING ELECTRON MICROSCOPY PLATFORM AND METHODS OF USING THE SAME | Non-Final OA | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
| 18789936 | COLLECTION PROBE AND METHODS FOR THE USE THEREOF | Non-Final OA | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
| 18404832 | CONCEPT AND METHOD FOR LARGE ION POPULATION SPACE CHARGE DRIVEN ION MOBILITY SEPARATIONS | Final Rejection | Battelle Memorial Institute |
| 18674144 | COMPENSATION RASTER SCANNING | Non-Final OA | Carl Zeiss SMT GmbH |
| 18419940 | APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD | Final Rejection | Carl Zeiss SMT GmbH |
| 18866471 | DROPLET GENERATOR NOZZLE | Non-Final OA | ASML Netherlands B.V. |
| 18911806 | CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS FOR IMAGING | Non-Final OA | ASML Netherlands B.V. |
| 18890506 | CHARGED PARTICLE APPARATUS AND METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18844195 | EUV Light Source Target Metrology | Non-Final OA | ASML Netherlands B.V. |
| 18776207 | INSPECTION APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
| 18748694 | METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM | Non-Final OA | ASML NETHERLANDS B.V. |
| 17771761 | CHARGED PARTICLE INSPECTION SYSTEM AND METHOD USING MULTI-WAVELENGTH CHARGE CONTROLLERS | Final Rejection | ASML NETHERLANDS B.V. |
| 18350643 | METHOD AND APPARATUS FOR NON-INVASIVE SEMICONDUCTOR TECHNIQUE FOR MEASURING DIELECTRIC/SEMICONDUCTOR INTERFACE TRAP DENSITY USING SCANNING ELECTRON MICROSCOPE CHARGING | Final Rejection | FemtoMetrix, Inc. |
| 18888100 | BETA TILT SAMPLE HOLDER | Non-Final OA | FEI Company |
| 17989550 | Method Of Imaging And Milling A Sample | Final Rejection | FEI Company |
| 18587377 | ULTRA-HIGH X-RAY PHOTON RADIATION FOR FLASH RADIOTHERAPY | Non-Final OA | Reveam, Inc. |
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