Prosecution Insights
Last updated: October 25, 2026
Application No. 18/685,257

SEMICONDUCTOR STRUCTURE FOR OPTOELECTRONIC APPLICATIONS

Non-Final OA §102§103§112
Filed
Feb 21, 2024
Priority
Sep 22, 2021 — FR FR2109949 +1 more
Examiner
CARTER, MICHAEL W
Art Unit
2828
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Soitec
OA Round
1 (Non-Final)
74%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
90%
With Interview

Examiner Intelligence

Grants 74% — above average
74%
Career Allowance Rate
644 granted / 867 resolved
+6.3% vs TC avg
Strong +15% interview lift
Without
With
+15.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
24 currently pending
Career history
903
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
56.2%
+16.2% vs TC avg
§102
18.0%
-22.0% vs TC avg
§112
21.3%
-18.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 867 resolved cases

Office Action

§102 §103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-18 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claims 1, 6, 10, and 15 as well as their respective dependent claims due to their dependency recite particular values of the attenuation coefficient. However, they fail to provide specific units. The claimed value is therefore indefinite. Claim Rejections - 35 USC § 103 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-4, 6-8 and 10-13, 15-17 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by JP-2004207536 (Honjiyou). For claim 1, Honjiyou teaches a semiconductor structure for optoelectronic applications (fig. 1-2) comprising: a first layer made of a crystalline semiconductor (fig. 1, 9; [0109]), the first layer being placed disposed on an intermediate layer (fig. 1, 3-10) including or adjacent to a direct-bonding interface (fig. 1, 10 may be considered a direct bonding interface), the intermediate layer being disposed on - a second layer made of a crystalline semiconductor (fig. 1, 1 and 2), wherein the intermediate layer is composed of a material different from those of the first and second layers (Si, [0089]-[0091]), and the intermediate layer has an attenuation coefficient lower than 100 (the attenuation coefficient is an inherent property of the layer which includes Si [0089] which is the same material claimed later in claim 1 and will therefore have a corresponding attenuation coefficient), and a refractive index that differs by less than 0.3 from the refractive index: - of at least one sub-layer of the first layer adjacent to the intermediate layer, and - of at least one sub-layer of the second layer adjacent to the intermediate layer (Honjiyou uses that same materials including GaAs [0089] and [0109] in the sub-layers of the first and second layer and will therefore have similar refractive index differences), and wherein the crystalline semiconductor of the first layer comprises gallium arsenide ([0109]), the crystalline semiconductor of the second layer comprises gallium arsenide ([0089]), and the material of the intermediate layer comprises silicon ([0089], [0081]). For claim 10, Honjiyou teaches a semiconductor structure for optoelectronic applications (fig. 1) comprising: a first layer comprising crystalline gallium arsenide (fig. 1, 9; [090] and [0109]); a second layer comprising crystalline gallium arsenide (fig. 1, 1-2; [0089] and [0106]); and an intermediate layer comprising silicon disposed directly between and in direct physical contact with each of the first layer and the second layer (fig. 1, 3-10), the intermediate layer having an attenuation coefficient lower than 100 (the attenuation coefficient is an inherent property of the layer which includes Si [0089] which is the same material claimed later in claim 1 and will therefore have a corresponding attenuation coefficient; further, the attenuation coefficient units may be arbitrarily chosen such that the attenuation coefficient is lower than 100), the intermediate layer having a refractive index that differs by less than 0.3 from a refractive index: of at least a portion of the first layer directly adjacent to and in direct physical contact with the intermediate layer, and of at least a portion of the second layer directly adjacent to and in direct physical contact with the intermediate layer (Honjiyou uses that same materials including GaAs [0089] and [0109] in the sub-layers of the first and second layer and will therefore have similar refractive index differences); and wherein a direct bonding interface is disposed within the intermediate layer, at an interface between the intermediate layer and the first layer, or at an interface between the intermediate layer and the second layer (fig. 1 and 2, a direct bonding interface is at least within the intermediate layer between 6 and 3; [0111]-[0115]). For claim 2 and 11, Honjiyou teaches the material of the intermediate layer is amorphous ([0089]). For claim 3, 7, 12, and 16, Honjiyou teaches the crystalline material of the first layer comprises a single crystal of sufficiently high crystal quality to form a seed for epitaxy ([0109]). For claim 4, 8, 13, and 17, Honjiyou teaches the first layer forms all or some of a vertical-cavity surface-emitting laser (fig. 1, DBR 9 of VCSEL 1; title and description of fig. 1). For claim 6 and 15, Honjiyou does not explicitly state the attenuation coefficient of the intermediate layer is lower than 1. However, the attenuation coefficient is an inherent property of the layer which includes Si [0089] which is the same material claimed in claim 1 and will therefore inherently have a corresponding attenuation coefficient. Further, the attenuation coefficient units may be arbitrarily chosen such that the attenuation coefficient is lower than 1. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 5, 9, 14, and 18 are rejected under 35 U.S.C. 103 as obvious JP-2004207536 (Honjiyou). For claims 5, 9, 14, and 18, Honjiyou teaches the second layer is a carrier substrate ([0088]). Honjiyou does not teach the second layer having an optical transparency higher than 30%. However, the examiner takes official notice that optical transparency was well-known results effective variable in the art before the filing date of the claimed invention. It would have been obvious to one having ordinary skill in the art before the filing date of the claimed invention to determine suitable optical transparency of the second layer including higher than 30% in order to allow a beam to be output through the substrate, since it has been held that discovering an optimum value of a result effective variable involves only routine skill in the art. In re Boesch, 617 F.2d 272, 205 USPQ 215 (CCPA 1980). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Michael W Carter whose telephone number is (571)270-1872. The examiner can normally be reached M-F, 9:00-5:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, MinSun Harvey can be reached at 571-272-1835. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Michael Carter/ Primary Examiner, Art Unit 2828
Read full office action

Prosecution Timeline

Feb 21, 2024
Application Filed
Sep 30, 2026
Non-Final Rejection mailed — §102, §103, §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12738706
METHOD AND LASER PULSE ENHANCEMENT APPARATUS FOR RESONANTLY ENHANCING PULSED LASER LIGHT FOR PRACTICAL APPLICATIONS AND SENSITIVE MEASUREMENTS
3y 0m to grant Granted Sep 15, 2026
Patent 12725999
LASER LIGHT SOURCE AND METHOD OF MANUFACTURING THE SAME
3y 5m to grant Granted Sep 01, 2026
Patent 12719237
OPTICAL SEMICONDUCTOR DEVICE, OPTICAL UNIT, AND METHOD FOR MANUFACTURING OPTICAL UNIT
3y 11m to grant Granted Aug 25, 2026
Patent 12719238
CORRUGATED BURIED HETEROSTRUCTURE LASER AND METHOD FOR FABRICATING THE SAME
3y 4m to grant Granted Aug 25, 2026
Patent 12712337
LASER LIGHT SOURCE AND LIDAR SYSTEM COMPRISING THE LASER LIGHT SOURCE
4y 2m to grant Granted Aug 18, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
74%
Grant Probability
90%
With Interview (+15.4%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 867 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month