Prosecution Insights
Last updated: September 17, 2026
Application No. 18/685,794

POLYONIUM SALT PHOTOACID GENERATOR FOR ARF LIGHT SOURCE DRY LITHOGRAPHY, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF

Non-Final OA §112
Filed
Feb 22, 2024
Priority
Aug 25, 2021 — CN 202110979286.2 +1 more
Examiner
CHU, JOHN S Y
Art Unit
Tech Center
Assignee
China Advanced Lithographic Material Technology Co. Ltd.
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
4m
Est. Remaining
82%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
750 granted / 977 resolved
+16.8% vs TC avg
Moderate +5% lift
Without
With
+5.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
56 currently pending
Career history
1042
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
55.4%
+15.4% vs TC avg
§102
20.7%
-19.3% vs TC avg
§112
14.1%
-25.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 977 resolved cases

Office Action

§112
DETAILED CORRESPONDENCE This Office action is in response to the application received February 22, 2024. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 11-15, and 20-22 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 11 discloses a compound of formula (II) wherein the some of the variables for Formula (II) are undefined, such as “X” R1 to R4, p, q, Ra , and Rb . Claim 1 recites a formula (I) with its own defined variables, while claim 11 contains a different compound with different cations, and need their variables to be defined. Correction is necessary. Claims 1-10, 16-19 and 23 are seen as allowable over the prior art of record. None of the prior art of record disclose the claimed onium salt of formula (I) in claim 1, the method of making the onium salt of claim 11, the photoacid generator recited in claim 16, the photoresist composition of claim 17 and the photolithography process of claim 19. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. KIM et al (2016/0266494) disclose hardmasks with polymer having diphenoxybenzene as a precursor, however lack a disulfonate photoacid generating sulfonium or iodonium salt as claimed. with end-capped groups, photoacid and a solvent. TEUSCHER (3,867,147) disclose light sensitive diazo compounds that can be made with diphenoxybenzene, see col. 26, line 4 and Example 117. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Keith Hendricks, can be reached at telephone number 571-272-1401. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu August 21, 2026
Read full office action

Prosecution Timeline

Feb 22, 2024
Application Filed
Aug 25, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12736882
POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING
4y 4m to grant Granted Sep 15, 2026
Patent 12736876
COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME
4y 5m to grant Granted Sep 15, 2026
Patent 12730375
RESIST COMPOSITION AND METHOD FOR USING RESIST COMPOSITION
4y 0m to grant Granted Sep 08, 2026
Patent 12717229
METHODS AND MATERIALS FOR METALLIC PHOTORESIST
3y 7m to grant Granted Aug 25, 2026
Patent 12704781
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
3y 1m to grant Granted Aug 11, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
82%
With Interview (+5.3%)
2y 11m (~4m remaining)
Median Time to Grant
Low
PTA Risk
Based on 977 resolved cases by this examiner. Grant probability derived from career allowance rate.

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