Prosecution Insights
Last updated: October 02, 2026
Application No. 18/688,636

ORGANOPOLYSILOXANE COMPOUND, ROOM TEMPERATURE-CURABLE ORGANOPOLYSILOXANE COMPOSITION, AND ARTICLE

Non-Final OA §112
Filed
Mar 01, 2024
Priority
Sep 03, 2021 — JP 2021-143977 +1 more
Examiner
LING, DORIS
Art Unit
Tech Center
Assignee
Shin-Etsu Chemical Co., Ltd.
OA Round
1 (Non-Final)
25%
Grant Probability
At Risk
1-2
OA Rounds
1y 0m
Est. Remaining
52%
With Interview

Examiner Intelligence

Grants only 25% of cases
25%
Career Allowance Rate
6 granted / 24 resolved
-35.0% vs TC avg
Strong +27% interview lift
Without
With
+27.3%
Interview Lift
resolved cases with interview
Typical timeline
3y 7m
Avg Prosecution
42 currently pending
Career history
58
Total Applications
across all art units

Statute-Specific Performance

§101
1.4%
-38.6% vs TC avg
§103
58.0%
+18.0% vs TC avg
§102
12.6%
-27.4% vs TC avg
§112
20.9%
-19.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 24 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . The Office Action is in response to the application filed 03/01/2024. Claim Analysis Summary of Claim 1: A room temperature curable organopolysiloxane composition comprising: (A) 100 parts by weight of an organopolysiloxane compound of the following general formula (1): PNG media_image1.png 209 574 media_image1.png Greyscale wherein each of R1 and R2 is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and R1 and R2 may be the same or different groups; and n is independently an integer of 2 to 10, m is independently an integer of 1 to 8, 1 is 2 or 3 independently for each silicon atom bonded, a is an integer of 50 to 3,000, and b is an integer of 0 to 10. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (B) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 6 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor, or for pre-AIA the applicant regards as the invention. The term “strong base” in Claim 6 is a relative term which renders the claim indefinite. The term “strong” is not defined by the claim, the specification does not provide a standard for ascertaining the requisite degree, and one of ordinary skill in the art would not be reasonably apprised of the scope of the invention. Allowable Subject Matter Claims 1-5 and 7-19 are allowed. The following is a statement of reasons for the indication of allowable subject matter: The prior art, taken alone or in combination, do not teach or fairly suggest the organopolysiloxane compound of general formula (1) as set forth by the claims. The prior art made of record and not relied upon is considered pertinent to Applicant’s disclosure. In particular Altes et al. (EP 1008613A3), Cella (US 4210596A), Cella (US 4395507A), Nitzsche et al. (US 3629359 A), Fataftah et al. (Preparation of dimethylsilyl bis-enol ethers. Tetrahedron Letters,Vo1.27,No.34,pp 4067-4070,1986), Rochin et al. (Synthese regioselective de trisenoxysilanes. Journal of Organometallic Chemistry, 273 (1984) C7-C10), and Rochin et al. (Nouvelle synthese regioselective de β-alcoxycetones a partir d'enoxysilanes et de trisenoxysilanes engendres in situ. Journal of Organometallic Chemistry, 281 (1985) C24--C28) are cited for their disclosures of relevant organopolysiloxanes and/or the cylcoalkene oxysilane structures in the related arts. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DORIS LING whose telephone number is (571)270-3961. The examiner can normally be reached Monday-Friday, 8:30am-5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, ARRIE LANEE REUTHER can be reached on (571)270-7026. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DORIS LING/Examiner, Art Unit 1764 /ROBERT C BOYLE/Primary Examiner, Art Unit 1764
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Prosecution Timeline

Mar 01, 2024
Application Filed
Sep 02, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
25%
Grant Probability
52%
With Interview (+27.3%)
3y 7m (~1y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 24 resolved cases by this examiner. Grant probability derived from career allowance rate.

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