Prosecution Insights
Last updated: May 29, 2026
Application No. 18/690,370

GAS-ASSISTED COCRYSTAL DE-SUBLIMATION

Final Rejection §103
Filed
Mar 08, 2024
Priority
Sep 10, 2021 — provisional 63/242,533 +2 more
Examiner
GAMBETTA, KELLY M
Art Unit
1718
Tech Center
1700 — Chemical & Materials Engineering
Assignee
The Regents of the University of Michigan
OA Round
2 (Final)
72%
Grant Probability
Favorable
3-4
OA Rounds
9m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 72% — above average
72%
Career Allowance Rate
670 granted / 930 resolved
+7.0% vs TC avg
Strong +33% interview lift
Without
With
+32.7%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
34 currently pending
Career history
982
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
83.2%
+43.2% vs TC avg
§102
6.3%
-33.7% vs TC avg
§112
3.1%
-36.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 930 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant's arguments filed 11/21/2025 have been fully considered but they are not persuasive. The applicant argues that Ye does not teach the sublimation of cocrystals, and points to an earlier article of Ye that sublimates single crystal powders. However, the earlier reference of Ye provided by the applicant was only cited as background information in the paper cited by the Examiner to detail a basic MAS method (p2 of Ye – Nature Communications). The reference of Ye used in the instant rejection (from Nature Communications) sublimates cocrystals as an improvement on that earlier method, shown in Ye page 8 where cocrystals such as fluoranthene-TCNB, anthracene-TCNB, pyrene-TCNB etc. and mixed powders are sublimated. Further, the naming convention of these types of materials (ie fluoranthene-TCNB, for example) indicates that they are cocrystals, not merely mixtures of powders. This is the same naming convention used for cocrystals as in the instant Examples. It is further noted that the applicant admits prior art where preformed cocrystals are known to be sublimated in para 0004. Additionally, the claim language only requires that ‘bulk cocrystalline materials’ be vaporized to deposit cocrystalline materials. The powder, under its broadest reasonable interpretation, would include materials that are used to make cocrystalline materials as bulk cocrystalline materials as the language is broad. Although the claims are interpreted in light of the specification, limitations from the specification are not read into the claims. See In re Van Geuns, 988 F.2d 1181, 26 USPQ2d 1057 (Fed. Cir. 1993). Therefore, for at least these reasons, the previous rejections are maintained. Information Disclosure Statement and Specification The listing of references in the specification is not a proper information disclosure statement. 37 CFR 1.98(b) requires a list of all patents, publications, or other information submitted for consideration by the Office, and MPEP § 609.04(a) states, "the list may not be incorporated into the specification but must be submitted in a separate paper." Therefore, unless the references have been cited by the examiner on form PTO-892 or placed in a proper PTO-1449, they have not been considered. Please amend the specification to conform with MPEP § 609.04(a). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 1-3, 5-12, 15-17 and 26 is/are rejected under 35 U.S.C. 103 as being unpatentable over Shtein et al. (WO 2020/215078 A1) in view of Ye et al. (Nature Communications, 2019, 10:761) As to claim 1, Shtein et al. teaches a solvent-free vapor deposition method (para 0054) comprising vaporizing a crystalline material to form a vapor (para 0041), entraining the vapor into a carrier gas (para 0039-the compound in the presence of a carrier gas, para 0056), and depositing a film comprising a cocrystalline material (plurality of different compounds/ vapors in para 0047) on one or more discrete regions of a substrate (para 0053 – patterned deposition). Shtein teaches vaporizing more than one crystalline powder in para 0114, but does not explicitly refer to these materials as cocrystaline materials. Ye et al. teaches the sublimation of cocrystals for use in pharmaceuticals to improve solubility or ease of formation of drugs (col. 1 p 2, col. 1 p 8) of cocrystals directly on a substrate without using solvents. Therefore, it would have been obvious to one of ordinary skill in the art at the time of filing that Shtein be able to also sublimate cocrystals of its compounds in its method as taught by Ye et al. in order to expand its purpose of pharmaceutical research to improve solubility or ease of formation of drugs. As to claim 2, Shtein teaches sublimation in para 0039. As to claim 3, Shtein teaches the pressure in para 0112, for example. As to claim 5, Shtein teaches heating to sublimate to a vapor in para 0080. As to claim 6, Shtein does not teach using solvents in its carrier gas in paras 0039, 0056, 0081 etc. As to claim 7, Shtein teaches a powder, a pressed pellet, and a porous material in para 0058. As to claim 8, Shtein desires no degradation of the material in para 0041, 0057. As to claim 9, the cocrystals in Ye are vaporized in a stoichiometric ratio on p 2 col. 2 (1:1 ratio). As to claim 10, Shtein teaches a crystalline or polycrystalline film in para 0068. As to claim 11, Shtein teaches the crystal size in para 0068. As to claim 12, Shtein teaches the crystals in as claimed in paras 0068-0069. As to claim 15, the cocrystals in Ye are present in a stoichiometric ratio on p 2 col. 2 (1:1 ratio). As to claim 16, Ye shows that the cocrystals maintain substantially the same ratio of 1:1 in Fig. 3, for example. As to claim 17, the substrate temperature is as claimed in Shtein para 0084. As to claim 26, Shtein et al. teaches the deposition of the claimed compounds in paras 0051-0053 and 0061-0063. Claim(s) 20, 22 and 24 is/are rejected under 35 U.S.C. 103 as being unpatentable over Shtein et al. (WO 2020/215078 A1) in view of Ye et al. (Nature Communications, 2019, 10:761) and in further view of Mascaro et al. (Organic Electronics 6 (2005) 211–220). Shtein and Ye teach the limitations of Claims 20, 22 and 24 above but do not teach an annealing step. Mascaro et al. teaches a post deposition annealing step of organic materials in order to reorient their crystals or modify their size in the abstract. The claimed time is over 30 minutes throughout the document, including the Figures. As to the temperature, it would have been obvious to a person having ordinary skill in the art at the time the invention was made to include the claimed temperature ranges, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves only routine skill in the art. In re Aller, 220 F.2d 454, 105 USPQ 223 (CCPA 1955). Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to KELLY M GAMBETTA whose telephone number is (571)272-2668. The examiner can normally be reached M-F 9-5:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Timothy Meeks can be reached at 571-272-1423. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. KELLY M. GAMBETTA Primary Examiner Art Unit 1715 /KELLY M GAMBETTA/ Primary Examiner, Art Unit 1718
Read full office action

Prosecution Timeline

Mar 08, 2024
Application Filed
Dec 17, 2024
Response after Non-Final Action
Jul 21, 2025
Non-Final Rejection mailed — §103
Nov 21, 2025
Response Filed
Feb 04, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12637585
Powder for an electrically insulating coating
2y 11m to grant Granted May 26, 2026
Patent 12640376
PROPRIETARY CURE MODULE AND METHOD FOR IMPREGNATING GRAPHITE
2y 8m to grant Granted May 26, 2026
Patent 12637763
METHOD FOR FORMING SICN THIN FILM
2y 0m to grant Granted May 26, 2026
Patent 12628623
SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING
3y 9m to grant Granted May 12, 2026
Patent 12618150
DEVICE FOR CHEMICAL VAPOUR DEPOSITION
2y 2m to grant Granted May 05, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
72%
Grant Probability
99%
With Interview (+32.7%)
3y 0m (~9m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 930 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month