Prosecution Insights
Last updated: October 02, 2026

Examiner: GAMBETTA, KELLY M

Tech Center 3700 • Art Units: 1715 1718 1792 2812 2898 3774

This examiner grants 72% of resolved cases

Analysis

Kelly M. Gambetta serves in Tech Center 3700 and Art Unit 1715. She has overseen 950 resolved cases, resulting in an allowance rate of 71.8 percent. This 71.8 percent allowance rate indicates a consistent level of success for applications on her docket. With 950 resolved cases, the data offers a clear view of her examination patterns.

The interview lift for Gambetta is 33.1 percent. This 33.1 percent lift shows a significant improvement in allowance outcomes when an interview is conducted compared to cases without an interview. Practitioners should consider an interview as a key strategy, as the 33.1 percent lift suggests it is highly effective for overcoming rejections. This data point highlights the value of direct engagement in Art Unit 1715.

The median time to allowance is 1104 days. This 1104 day duration represents the typical timeframe from filing to a patent grant. Applicants can use this 1104 day median to set realistic expectations for their prosecution timeline. The combination of a 71.8 percent allowance rate and this median pendency defines the current prosecution environment for this examiner.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

71.8%
Allow Rate
+1.8% vs TC avg
991
Total Applications
+33.1%
Interview Lift
1104
Avg Prosecution Days
Based on 950 resolved cases, 2023–2026

Rejection Statute Breakdown

0.8%
§101 Eligibility
17.3%
§102 Novelty
58.5%
§103 Obviousness
18.5%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19008803 METHOD AND APPARATUS FOR AREA-SELECTIVE DEPOSITION Final Rejection ASM IP Holding B.V.
18524307 SUBSTRATE PROCESSING METHOD Non-Final OA ASM IP Holding B.V.
18072764 METHODS FOR IMPROVING THIN FILM QUALITY Final Rejection ASM IP Holding B.V.
18690370 GAS-ASSISTED COCRYSTAL DE-SUBLIMATION Non-Final OA THE REGENTS OF THE UNIVERSITY OF MICHIGAN
18973613 ALUMINUM-CHROMIUM OXIDE COATING AND METHOD THEREFOR Non-Final OA RTX CORPORATION
18748021 SLURRY INFILTRATION WITH FREEZE DRYING AND GELLING FOR MORE UNIFORM DISTRIBUTION OF PARTICULATE MATERIAL Non-Final OA RTX CORPORATION
18678693 DAMAGE RESISTANT CERAMIC MATRIX COMPOSITES Final Rejection RTX CORPORATION
18569210 METHOD OF MANUFACTURING POWER SEMICONDUCTOR ELEMENT Non-Final OA JUSUNG ENGINEERING CO., LTD.
18233984 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND INCREASED DENSITY Non-Final OA Applied Materials, Inc.
18228555 MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION OF NANOCRYSTALLINE DIAMOND FILM Non-Final OA Applied Materials, Inc.
18128124 CERAMIC SYNTHESIS THROUGH SURFACE COATING OF POWDERS Non-Final OA Applied Materials, Inc.
19282491 VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITION Non-Final OA National University of Singapore
19273395 COATED CUTTING TOOL Non-Final OA AB SANDVIK COROMANT
18954901 METHOD FOR FORMING INSULATION FILM Final Rejection Tokyo Electron Limited
18653410 FILM-FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18598293 METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM Non-Final OA Kokusai Electric Corporation
18551302 SUBSTRATE TREATING METHOD AND TREATMENT LIQUID Final Rejection SCREEN Holdings Co., Ltd.
18880333 A METHOD FOR OPERATING A CHEMICAL VAPOR DEPOSITION PROCESS Non-Final OA CANATU FINLAND OY
17906731 COMPOSITE SUBSTRATE AND PRODUCTION METHOD THEREFOR Non-Final OA SHIN-ETSU CHEMICAL CO., LTD.
18859908 SURFACTANT-LOADED MOF-BASED ANTIVIRAL FABRIC FOR USE IN FACEMASKS AND RESPIRATORS Non-Final OA DREXEL UNIVERSITY
18908629 METHOD OF FORMING ALLOY THIN FILM USING ATOMIC LAYER DEPOSITION PROCESS INCLUDING OPTIMAL UNIT PROCESS, AND ELECTRONIC ELEMENT MANUFACTURED USING THE SAME Final Rejection INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
18601338 INHERENTLY SELECTIVE THERMAL ATOMIC LAYER DEPOSITION OF COPPER METAL FILMS Final Rejection WAYNE STATE UNIVERSITY
18698210 METHOD FOR PRODUCING A COATING ON AN OBJECT AND CORRESPONDINGLY PRODUCED COATED BODY Non-Final OA BOEHLERIT GmbH & Co.KG.

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