Tech Center 3700 • Art Units: 1715 1718 1792 3774
This examiner grants 72% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18748021 | SLURRY INFILTRATION WITH FREEZE DRYING AND GELLING FOR MORE UNIFORM DISTRIBUTION OF PARTICULATE MATERIAL | Non-Final OA | RTX CORPORATION |
| 18678693 | DAMAGE RESISTANT CERAMIC MATRIX COMPOSITES | Non-Final OA | RTX CORPORATION |
| 18636461 | METHODS FOR IMPROVING THROUGHPUT AND GAPFILL QUALITY FOR METAL DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18233984 | METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND INCREASED DENSITY | Final Rejection | Applied Materials, Inc. |
| 18551302 | SUBSTRATE TREATING METHOD AND TREATMENT LIQUID | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18690370 | GAS-ASSISTED COCRYSTAL DE-SUBLIMATION | Final Rejection | THE REGENTS OF THE UNIVERSITY OF MICHIGAN |
| 18850155 | FILLING METHOD AND SUBSTRATE PROCESSING SYSTEM | Non-Final OA | Tokyo Electron Limited |
| 18584114 | METHOD AND APPARATUS FOR EMBEDDING TUNGSTEN INTO RECESS FORMED ON SUBSTRATE | Final Rejection | Tokyo Electron Limited |
| 18410046 | METHOD OF FORMING SILICON NITRIDE FILM | Non-Final OA | Tokyo Electron Limited |
| 18333724 | FILM FORMING METHOD | Non-Final OA | Tokyo Electron Limited |
| 17906731 | COMPOSITE SUBSTRATE AND PRODUCTION METHOD THEREFOR | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 19008803 | METHOD AND APPARATUS FOR AREA-SELECTIVE DEPOSITION | Non-Final OA | ASM IP Holding B.V. |
| 18524307 | SUBSTRATE PROCESSING METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18300301 | DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Non-Final OA | ASM IP HOLDING B.V. |
| 18127505 | MASK PROCESSING METHOD AND APPARATUS | Non-Final OA | TES Co., Ltd |
| 18598293 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 17951205 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 18832814 | METHOD FOR GROWING DIAMOND ON SILICON SUBSTRATE AND METHOD FOR SELECTIVELY GROWING DIAMOND ON SILICON SUBSTRATE | Final Rejection | SHIN-ETSU HANDOTAI CO., LTD. |
| 18975045 | FINISHING OF ADDITIVELY MANUFACTURED PARTS WITH SMOOTHING AND COLOR | Non-Final OA | PostProcess Technologies, Inc. |
| 18847652 | LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE | Non-Final OA | Lam Research Corporation |
| 18219368 | ATOMIC LAYER DEPOSITION METHODS FOR MAKING OMNIDIRECTIONAL STRUCTURAL COLOR MULTILAYER STRUCTURES | Non-Final OA | Toyota Motor Engineering & Manufacturing North America, Inc. |
| 18764717 | Area-Selective Hardmask Deposition: Methods and Tools for Advanced Patterning | Non-Final OA | Nederlandse Organisatie voor Toegepast-natuurwetenschappelijk onderzoek TNO |
| 18698210 | METHOD FOR PRODUCING A COATING ON AN OBJECT AND CORRESPONDINGLY PRODUCED COATED BODY | Final Rejection | BOEHLERIT GmbH & Co.KG. |
| 18614659 | APPLICATIONS OF A MATTE COATING LAYER IN PRINTING PROCESSES TO CREATE VARYING VISUAL EFFECTS ON PRINTED ARTICLES | Non-Final OA | HARRIS & BRUNO INTERNATIONAL, INC. |
| 18291335 | SOLUBLE POLYIMIDES FOR COATING ON POLYMERIC SUBSTRATES | Final Rejection | HD MICROSYSTEMS |
| 18416325 | SCALABLE METHOD FOR ACHIEVING SHAPE CONTROL OF DIAMOND MICRO-NANOPARTICLES | Non-Final OA | Dongguan Institute of Opto-electronics, Peking University |
| 18219022 | USING PLASMA ENHANCED PROCESS TO DO PERIODIC MAINTENANCE | Final Rejection | SKY TECH INC. |
| 17611754 | PLASMA ETCHING METHOD | Final Rejection | SHOWA DENKO K.K. |
| 18168311 | Stents Having Biodegradable Layers | Non-Final OA | MT Acquisition Holdings LLC |
| 17309458 | A WORKPIECE, A WORKPIECE PROCESSING METHOD AND A WORKPIECE PROCESSING SYSTEM THEREOF | Non-Final OA | Nanowall Technology PTE LTD |
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