Prosecution Insights
Last updated: July 17, 2026
Application No. 18/690,873

OPTICAL MODULE FOR EXTREME ULTRAVIOLET LIGHT SOURCE

Non-Final OA §103§112
Filed
Mar 11, 2024
Priority
Sep 20, 2021 — provisional 63/245,999 +1 more
Examiner
RICKEL, ALEX PARK
Art Unit
2881
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
ASML Holding N.V.
OA Round
1 (Non-Final)
73%
Grant Probability
Favorable
1-2
OA Rounds
9m
Est. Remaining
85%
With Interview

Examiner Intelligence

Grants 73% — above average
73%
Career Allowance Rate
38 granted / 52 resolved
+5.1% vs TC avg
Moderate +12% lift
Without
With
+11.8%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
23 currently pending
Career history
78
Total Applications
across all art units

Statute-Specific Performance

§103
85.1%
+45.1% vs TC avg
§102
3.3%
-36.7% vs TC avg
§112
11.6%
-28.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 52 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement filed on March 11, 2024 has been considered. Examiner’s Note Based on [0035] of the specification stating “a toroid surface can be a cylindrical surface”, Examiner will interpret cylindrical lenses as satisfying limitations for toroid lenses. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(d): (d) REFERENCE IN DEPENDENT FORMS.—Subject to subsection (e), a claim in dependent form shall contain a reference to a claim previously set forth and then specify a further limitation of the subject matter claimed. A claim in dependent form shall be construed to incorporate by reference all the limitations of the claim to which it refers. The following is a quotation of pre-AIA 35 U.S.C. 112, fourth paragraph: Subject to the following paragraph [i.e., the fifth paragraph of pre-AIA 35 U.S.C. 112], a claim in dependent form shall contain a reference to a claim previously set forth and then specify a further limitation of the subject matter claimed. A claim in dependent form shall be construed to incorporate by reference all the limitations of the claim to which it refers. Claims 2, 4, 6, 18, 20, and 33 are rejected under 35 U.S.C. 112(d) or pre-AIA 35 U.S.C. 112, 4th paragraph, as being of improper dependent form for failing to further limit the subject matter of the claim upon which it depends, or for failing to include all the limitations of the claim upon which it depends. Claims 2, 18, and 33 recite the limitation “the plurality of lenses comprises at least one toroid lens.” However, claims 1, 17, and 32 recite the limitation “the plurality of lenses including at least one aspheric toroid lens.” An aspheric toroid lens is a specific type of toroid lens thus the aspheric toroid lens of claims 1, 17, and 32 would satisfy the limitation for the toroid lens of claims 2, 18, and 33 and claims 2, 18, and 33 broadens the scope of the claims. Thus claims 2, 18, and 33 fail to further limit the claims from which they depend. Claims 4, 6, and 20 depend from claims 2, 17, and 32. For the purposes of compact prosecution and based on the disclosure, Examiner will interpret the “at least one toroid lens” of claims 2, 18, and 33 as additional toroid lens to the aspheric toroid lens of claims 1, 17, and 32. Applicant may cancel the claim(s), amend the claim(s) to place the claim(s) in proper dependent form, rewrite the claim(s) in independent form, or present a sufficient showing that the dependent claim(s) complies with the statutory requirements. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-2, 9-14, 16-18, 27-30, and 32-34 are rejected under 35 U.S.C. 103 as being unpatentable over Chuang et al. (U.S. Patent Application Publication No. 2017/0278694 – hereinafter referred to as “Chuang”) in view of Fomenkov et al. (Laser-Produced Plasma Sources for High-Volume-Manufacturing EUV Lithography – cited by Applicant – hereinafter referred to as “Fomenkov”). Regarding claim 1, Chuang teaches an optical module (Figure 1A anamorphic optics 113, [0039]) for passing an optical beam (beam 112), the optical module comprising: a plurality of lenses (Figure 2A anamorphic optics 113 contains a plurality of lenses) through which the optical beam passes, the plurality of lenses including at least one aspheric toroid lens (Figure 2A acylindrical plano-convex lens 203, [0051]), the plurality of lenses placed relative to a linearly focused curtain of the optical beam (Figure 2A lenses are placed relative to elliptical beam 117 on containment structure 101, [0052]), the linearly focused curtain intersecting a region of interest ([0052] elliptical beam 117 intersects region of interest at containment structure 101); and an optical mount apparatus in which the plurality of lenses is mounted (Figure 2A lenses of anamorphic optics 113 will inherently have an optical mount), an extreme ultraviolet (EUV) light source ([0034] wavelengths of light at 120 nm are generated which are in the EUV range). Chuang fails to teach the optical mount apparatus is arranged in or fixed to a wall of a chamber of the EUV light source such that an optical path is defined that passes through the EUV light source chamber and intersects the region of interest inside the chamber. However, Fomenkov teaches an apparatus for EUV lithography where the focusing optics of an EUV light source are fixed to the wall of chamber of the EUV light source (Figure 1 focusing optics mounted to vessel, page 4 vacuum vessel). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang to be is arranged in or fixed to a wall of a chamber of the EUV light source such that an optical path is defined that passes through the EUV light source chamber and intersects the region of interest inside the chamber as taught by Fomenkov in order to provide a stable optical arrangement and have the apparatus be under vacuum (Fomenkov page 4). Regarding claim 2, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the plurality of lenses comprises at least one toroid lens (Figure 2A cylindrical lens 201, [0051]). Regarding claim 9, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the linearly focused curtain is formed from the optical beam passing through the plurality of lenses and to the region of interest inside the chamber ([0052] elliptical beam 117 is formed by beam 112 passing through lenses of anamorphic optics 113 and intersects region of interest at containment structure 101). Regarding claim 10, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the aspheric toroid lens is the lens that is closest to the region of interest (Figure 2A acylindrical plano-convex lens 203 is closest to containment structure 101). Regarding claim 11, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. The optical module of claim 1, wherein the at least one aspheric toroid lens is a single lens that is plano-convex ([0051] acylindrical plano-convex lens 203) , plano-concave, meniscus with one face being aspheric toroid, or meniscus with both faces being aspheric toroid. Regarding claim 12, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the aspheric toroid lens is an acylindrical lens ([0051] acylindrical plano-convex lens 203). Regarding claim 13, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the plurality of lenses is configured and arranged to thereby reduce optical aberrations such that their actual resolution is diffraction limited ([0051] acylindrical lens 203 may significantly reduce the optical aberration in the beam 112 so the beam size at the waist is diffraction limited). Regarding claim 14, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang further teaches the optical beam travels along an optical axis of the chamber (Figure 2A optical axis running through center of lenses of anamorphic optics 113), and the linearly focused curtain of the optical beam has a beam profile along a first axis perpendicular (Figure 1C waist diameter 2wx) to the optical axis of the chamber that is at least 10, at least 20, at least 30, at least 40, at least 50, or at least 60 times a beam profile along a second axis perpendicular to the optical axis (Figure 1C waist diameter 2wy) of the chamber within the region of interest inside the chamber (Figure 1C, [0047] waist diameter 2wx is 10 to 100 times waist diameter 2wy). Regarding claim 16, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 1. Chuang fails to teach the optical mount apparatus is arranged in a wall of the EUV light source chamber; and wherein the optical path passes through an optically-transparent window fixed within the chamber wall. However, Fomenkov teaches the optical mount apparatus is arranged in a wall of the EUV light source chamber (Figure 1 focusing optics are fixed to wall of vessel); and wherein the optical path passes through an optically-transparent window fixed within the chamber wall (Figure 1 light is passed through the intermediate focus aperture in wall of vessel). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang to be is is arranged in a wall of the EUV light source chamber; and wherein the optical path passes through an optically-transparent window fixed within the chamber wall as taught by Fomenkov in order to provide a stable optical arrangement and have the apparatus be under vacuum (Fomenkov page 4). Regarding claim 17, Chuang teaches an illumination module (Figure 1A light source 100) for an extreme ultraviolet (EUV) light source ([0034] wavelengths of light at 120 nm are generated which are in the EUV range), the illumination module comprising: a light source (Figure 1A pump laser 111) configured to produce an optical beam (beam 112); and an optical module (Figure 1A anamorphic optics 113, [0039]) configured to pass the optical beam (Figure 1A anamorphic optics passes beam 112, [0039]) and to focus the optical beam as a linear curtain at a region of interest (Figure 2A lenses focus beam 112 to elliptical beam 117 on containment structure 101, [0052]), the optical module comprising a plurality of lenses through which the optical beam passes and defining an optical path from the light source to the region of interest (Figure 2A lenses of anamorphic optics 113 pass beam 112 and define optical axis), the plurality of lenses including at least one aspheric toroid lens (Figure 2A acylindrical plano-convex lens 203, [0051]). Chuang fails to teach the optical module is configured to pass the optical beam through a wall of or within a chamber of the EUV light source and to at a region of interest inside the chamber. However, Fomenkov teaches an apparatus for EUV lithography where the focusing optics of an EUV light source are fixed through a wall of chamber of the EUV light source (Figure 1 focusing optics mounted through a wall vessel, page 4 vacuum vessel). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang to be is arranged to pass the optical beam through a wall of or within a chamber of the EUV light source and to at a region of interest inside the chamber as taught by Fomenkov in order to provide a stable optical arrangement and have the apparatus be under vacuum (Fomenkov page 4). Regarding claim 18, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 17. Chuang further teaches the plurality of lenses comprises at least one toroid lens (Figure 2A cylindrical lens 201, [0051]). Regarding claim 27, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 17. Chuang further teaches the aspheric toroid lens is the lens that is closest to the region of interest (Figure 2A acylindrical plano-convex lens 203 is closest to containment structure 101). Regarding claim 28, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 17. Chuang further teaches the aspheric toroid lens is an acylindrical lens ([0051] acylindrical plano-convex lens 203). Regarding claim 29, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 17. Chuang further teaches the optical beam travels along an optical axis of the chamber (Figure 2A optical axis running through center of lenses of anamorphic optics 113), and the linearly focused curtain of the optical beam has a beam profile along a first axis perpendicular (Figure 1C waist diameter 2wx) to the optical axis of the chamber that is at least 10, at least 20, at least 30, at least 40, at least 50, or at least 60 times a beam profile along a second axis perpendicular to the optical axis (Figure 1C waist diameter 2wy) of the chamber within the region of interest inside the chamber (Figure 1C, [0047] waist diameter 2wx is 10 to 100 times waist diameter 2wy). Regarding claim 30, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 17. Chuang further teaches the optical beam is a continuous wave light beam ([0034] pump laser 111 includes one or more continuous wave lasers). Regarding claim 32, Chuang teaches an extreme ultraviolet (EUV) light source (Figure 1A, [0034] light source 100 is a EUV light source generating light at a wavelength of 120 nm) comprising: an optical module (Figure 1A anamorphic optics 113, [0039]) for passing an optical beam (beam 112), the optical module comprising: a plurality of lenses (Figure 2A anamorphic optics 113 contains a plurality of lenses) through which the optical beam passes, the plurality of lenses including at least one aspheric toroid lens (Figure 2A acylindrical plano-convex lens 203, [0051]), the plurality of lenses placed relative to a linearly focused curtain of the optical beam (Figure 2A lenses are placed relative to elliptical beam 117 on containment structure 101, [0052]), the linearly focused curtain intersecting a region of interest ([0052] elliptical beam 117 intersects region of interest at containment structure 101); and an optical mount apparatus in which the plurality of lenses is mounted (Figure 2A lenses of anamorphic optics 113 will inherently have an optical mount). Chuang fails to teach a chamber comprising a plurality of walls that together define a cavity, wherein a region of interest is defined inside the cavity and wherein the optical mount apparatus is arranged in or fixed to a wall of a chamber such that an optical path is defined that intersects the region of interest inside the chamber. However, Fomenkov teaches an apparatus for EUV lithography with a chamber comprising a plurality of walls that together define a cavity (Figure 1 vacuum vessel, page 4), the focusing optics of an EUV light source are fixed to the wall of chamber of the EUV light source (Figure 1 focusing optics mounted to vessel, page 4 vacuum vessel). It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang to provide a chamber with a plurality of walls and have the optical mount be is arranged in or fixed to a wall of a chamber of the EUV light source such that an optical path is defined that passes through the EUV light source chamber and intersects the region of interest inside the chamber as taught by Fomenkov in order to provide a stable optical arrangement and have the apparatus be under vacuum (Fomenkov page 4). Regarding claim 33, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 32. Chuang further teaches the plurality of lenses comprises at least one toroid lens (Figure 2A cylindrical lens 201, [0051]). Regarding claim 34, Chuang and Fomenkov teach all the limitations of the claimed invention with respect to claim 32. Chuang further teaches an illumination module (Figure 1A illumination source 100, [0039]) comprising a light source (Figure 1A pump laser 111) configured to produce the optical beam (beam 112) and the optical module (anamorphic optics 113) configured to receive the produced optical beam from the light source (Figure 1A anamorphic optics 113 receive beam 112 from pump laser 111). Claims 4 and 20 are rejected under 35 U.S.C. 103 as being unpatentable over Chuang (U.S. Patent Application Publication No. 2017/0278694) in view of Fomenkov (Laser-Produced Plasma Sources for High-Volume-Manufacturing EUV Lithography) as applied to claims 2 and 18 above, and further in view of Gross et al. (Handbook of Optical Systems Volume 3 Aberration Theory and Correction – hereinafter referred to as “Gross”), and in further view of Ryu (Internation Publication No. WO 2007/108589). Regarding claim 4, Chuang and Fomenkov teaches all the limitations of the claimed invention with respect to claim 2. Chuang further teaches the at least one toroid lens comprises a first plano-concave cylindrical lens (Figure 2A lens 201 is a plano-concave cylindrical lens, [0051]), and the at least one aspheric toroid lens is a single lens that is plano-convex ([0051] acylindrical plano-convex lens 203), plano- concave, meniscus with one face being aspheric toroid, or meniscus with both faces being aspheric toroid; and Chuang and Fomenkov fail to teach a second plano-concave cylindrical lens. However, Gross teaches spitting a lens element as a zero power operation in order to optimize the optical system and improve performance (pages 378-379). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang and Fomenkov by splitting the first plano-concave cylindrical lens into two plano-concave cylindrical lenses as taught by Gross in order optimize the optical system and improve performance (Gross pages 378-379). Chuang, Fomenkov, and Gross fail to teach the second plano-concave cylindrical lens and the aspheric toroid lens are fixed in position relative to each other and moveable together relative to the first plano-concave cylindrical lens. However, Ryu teaches a laser beam delivery system with cylindrical lenses (Figure 4) where a cylindrical lens is moved relative to other lenses in the system (Figure 4 lens 8 is moved from position 8A to 8B) in order to adjust the length and width of linearly focused beam ([38]-[40]). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the optical module taught by Chuang, Fomenkov, and Gross such that the the second plano-concave cylindrical lens and the aspheric toroid lens are fixed in position relative to each other and moveable together relative to the first plano-concave cylindrical lens based on the teachings of Ryu in order to adjust the length and width of the linearly focused beam (Ryu [38]-[40]). Regarding claim 20, Chuang and Fomenkov teaches all the limitations of the claimed invention with respect to claim 18. Chuang further teaches the at least one toroid lens comprises a first plano-concave cylindrical lens (Figure 2A lens 201 is a plano-concave cylindrical lens, [0051]), and the at least one aspheric toroid lens is a single lens that is plano-convex ([0051] acylindrical plano-convex lens 203), plano- concave, meniscus with one face being aspheric toroid, or meniscus with both faces being aspheric toroid; and Chuang and Fomenkov fail to teach a second plano-concave cylindrical lens. However, Gross teaches spitting a lens element as a zero power operation in order to optimize the optical system and improve performance (pages 378-379). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the illumination system taught by Chuang and Fomenkov by splitting the first plano-concave cylindrical lens into two plano-concave cylindrical lenses as taught by Gross in order optimize the optical system and improve performance (Gross pages 378-379). Chuang, Fomenkov, and Gross fail to teach the second plano-concave cylindrical lens and the aspheric toroid lens are fixed in position relative to each other and moveable together relative to the first plano-concave cylindrical lens. However, Ryu teaches a laser beam delivery system with cylindrical lenses (Figure 4) where a cylindrical lens is moved relative to other lenses in the system (Figure 4 lens 8 is moved from position 8A to 8B) in order to adjust the length and width of linearly focused beam ([38]-[40]). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the illumination system taught by Chuang, Fomenkov, and Gross such that the the second plano-concave cylindrical lens and the aspheric toroid lens are fixed in position relative to each other and moveable together relative to the first plano-concave cylindrical lens based on the teachings of Ryu in order to adjust the length and width of the linearly focused beam (Ryu [38]-[40]). Allowable Subject Matter Claim 6 would be allowable if rewritten to overcome the rejection(s) under 35 U.S.C. 112(d), set forth in this Office action and to include all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: Regarding claim 6, the best prior art of record, Chuang and Fomenkov, teach all the limitations of the claimed invention with respect to claim 2. Chuang further teaches the at least one toroid lens comprises a first plano-concave cylindrical lens (Figure 2A lens 201 is a plano-concave cylindrical lens, [0051]), and the at least one aspheric toroid lens is a single lens that is plano-convex ([0051] acylindrical plano-convex lens 203), plano- concave, meniscus with one face being aspheric toroid, or meniscus with both faces being aspheric toroid; and the linearly focused curtain of the optical beam is focused along an axis of the chamber (Figure 2A beam 112 is focused along an axis to elliptical beam 117 at containment structure 101); Chuang and Fomenkov fail to teach a second plano-concave cylindrical lens. However, Gross teaches spitting a lens element as a zero power operation in order to optimize the optical system and improve performance (pages 378-379). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the illumination system taught by Chuang and Fomenkov by splitting the first plano-concave cylindrical lens into two plano-concave cylindrical lenses as taught by Gross in order optimize the optical system and improve performance (Gross pages 378-379). Chuang, Fomenkov, and Gross fail to teach or reasonably suggest, alone or in combination, “the first plano-concave cylindrical lens has a radius of curvature along the axis that is -19 mm to -25 mm; the second plano-concave cylindrical lens has a radius of curvature along the axis that is -31 mm to -39 mm; and the aspheric toroid lens has a base radius of curvature along the axis that is -26 mm to -32 mm” in combination with the intervening limitations of the claims. Moreover, modifying the system to satisfy such a condition would not have been obvious to one having ordinary skill in the art at the time the invention was filed since such a modification would have unpredictable results on the overall optical system. As such, the prior art of record, taken alone or in combination, fails to teach the cumulative details of claim 6, specifically the limitation: “the first plano-concave cylindrical lens has a radius of curvature along the axis that is -19 mm to -25 mm; the second plano-concave cylindrical lens has a radius of curvature along the axis that is -31 mm to -39 mm; and the aspheric toroid lens has a base radius of curvature along the axis that is -26 mm to -32 mm” Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Shklover et al. (U.S. Patent Application Publication No. 2008/0272275) teaches an optical module for focusing EUV light into a linear focus using cylindrical lenses similar to the instant invention. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEX PARK RICKEL whose telephone number is (703)756-4561. The examiner can normally be reached Monday-Friday 8:30 a.m. - 6 p.m. ET. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Bumsuk Won can be reached at (571)272-2713. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. Alex Rickel Examiner Art Unit 2872 /A.P.R./Examiner, Art Unit 2872 /BUMSUK WON/Supervisory Patent Examiner, Art Unit 2872
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Prosecution Timeline

Mar 11, 2024
Application Filed
Jun 03, 2026
Non-Final Rejection mailed — §103, §112 (current)

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Prosecution Projections

1-2
Expected OA Rounds
73%
Grant Probability
85%
With Interview (+11.8%)
3y 1m (~9m remaining)
Median Time to Grant
Low
PTA Risk
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