Prosecution Insights
Last updated: April 19, 2026
Application No. 18/692,836

APPARATUS AND METHOD FOR PRODUCING DOPED DIAMOND LAYERS

Non-Final OA §102§112
Filed
Mar 18, 2024
Examiner
CHEN, BRET P
Art Unit
1718
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Yg-1 Co. Ltd.
OA Round
2 (Non-Final)
84%
Grant Probability
Favorable
2-3
OA Rounds
2y 9m
To Grant
99%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allow Rate
944 granted / 1122 resolved
+19.1% vs TC avg
Strong +17% interview lift
Without
With
+16.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
29 currently pending
Career history
1151
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
50.4%
+10.4% vs TC avg
§102
7.8%
-32.2% vs TC avg
§112
27.7%
-12.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1122 resolved cases

Office Action

§102 §112
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Claims 1-20 are pending in this application, which is a 371 of PCT/AT2022/060363. Amended claim 8 is noted. The amendment dated 11/25/2025 has been entered. The examiner appreciates the amendment to the abstract, title, and claims. In view of said amendments, the objections to the abstract and title have been withdrawn. In addition, in view of the arguments presented on pp.9-10, the art rejection has been withdrawn. However, in view of an updated search, another art rejection is being proffered. The examiner regrets the inconvenience. Claims 1-7, 13-17 are withdrawn from consideration as being directed to a nonelected invention. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 12 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 12 is dependent on withdrawn apparatus claim 1 and thus is confusing. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 8-12, 18-20 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Steinmuller-Nethl et al. (2019/0226117). Steinmuller-Nethl teaches a method for applying a carbon layer (title), in particular a diamond layer, to a substrate (2, 2a) by means of chemical vapour deposition, comprising a deposition chamber (3) into which a process gas, in particular molecular hydrogen and/or a mixture of molecular hydrogen and a carbon-containing gas, such as methane can be supplied, wherein a gas inlet and gas activation element (7) is provided in the form of a hollow body with a flow channel (7b) for the process gas, a wall (7a) surrounding the flow channel (7b), and an outlet opening (16) feeding from the flow channel (7b) into the deposition chamber (3), and a heating device (8) is provided for heating the wall (7a) of the gas inlet and gas activation element (7) (abstract). In one embodiment, the diamond can be doped with boron, phosphorus, nitrogen, or sulphur and which can be gaseous, solid, or liquid (0032). Thermal and impact excitation can be used (0010). Regarding claim 9, Steinmuller-Nethl teaches boron (0032). Regarding claim 10, Steinmuller-Nethl teaches boron and particles (0039-0042). Regarding claim 11, Steinmuller-Nethl teaches over the entire length of the wall (0011). Regarding claim 12, Steinmuller-Nethl teaches thermal and impact excitation (0010) and doping with solid boron (0032). Regarding claim 18, Steinmuller-Nethl teaches boron and particles (0039-0042). Regarding claim 19, Steinmuller-Nethl teaches carbon containing gas (0011). Regarding claim 20, Steinmuller-Nethl teaches hydrogen (0011). Desphandey et al. (4,961,958) teaches a process for making doped diamond films by reactive vapor deposition using gas activation and has been provided as relevant art. Coe et al. (GB 2486778) teaches a process for making doped diamond films by chemical vapor deposition using an activated gas species and has been provided as relevant art. Response to Arguments Applicant’s arguments, see pp.10-11, filed 11/25/2025, with respect to the rejection(s) of the claims above have been fully considered and are persuasive. Therefore, the rejection has been withdrawn. However, upon further consideration, a new ground(s) of rejection is made in view of Steinmuller-Nethl et al. (2019/0226117). This application is NOT made final. The examiner regrets the inconvenience. Any inquiry concerning this communication or earlier communications from the examiner should be directed to BRET CHEN whose telephone number is (571)272-1417. The examiner can normally be reached M-F 8:30-8:30 MT. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at (571) 272-5166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /BRET P CHEN/Primary Examiner, Art Unit 1718 02/18/2026
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Prosecution Timeline

Mar 18, 2024
Application Filed
Aug 02, 2025
Non-Final Rejection — §102, §112
Nov 18, 2025
Applicant Interview (Telephonic)
Nov 18, 2025
Examiner Interview Summary
Nov 25, 2025
Response Filed
Feb 18, 2026
Non-Final Rejection — §102, §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

2-3
Expected OA Rounds
84%
Grant Probability
99%
With Interview (+16.6%)
2y 9m
Median Time to Grant
Moderate
PTA Risk
Based on 1122 resolved cases by this examiner. Grant probability derived from career allow rate.

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