Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1715 1718 1789 1792 2818
This examiner grants 84% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18876553 | METHODS OF FORMING STABLE CONDUCTIVE SURFACES | Non-Final OA | NORTHWESTERN UNIVERSITY |
| 18985474 | METHODS FOR DEPOSITING GAP FILLING FLUIDS AND RELATED SYSTEMS AND DEVICES | Non-Final OA | ASM IP Holding B.V. |
| 18906537 | VAPOR PHASE DEPOSITION OF ORGANIC FILMS | Non-Final OA | ASM IP Holding B.V. |
| 18895683 | SELECTIVE DEPOSITION | Non-Final OA | ASM IP Holding B.V. |
| 18790596 | POST-GAP FILL TREATMENT FOR SEAM REDUCTION | Final Rejection | Applied Materials, Inc. |
| 18372792 | Selective Deposition of Thin Films with Improved Stability | Final Rejection | Applied Materials, Inc. |
| 18870853 | HYBRID COATING PROCESS BY PVD AND THERMAL DIFFUSION | Non-Final OA | HUSQVARNA AB |
| 18982168 | SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18835836 | METHOD OF MANUFACTURE OF GRAPHENE COATED SURFACES BY ATOMIC OR MOLECULAR LAYER DEPOSITION | Non-Final OA | BAR-ILAN UNIVERSITY |
| 19001783 | METHOD FOR PROVIDING PROTECTION FOR METAL JOINT | Non-Final OA | Tyco Electronics (Shanghai) Co., Ltd. |
| 18981009 | METHODS FOR PREPARING ELECTRODES | Non-Final OA | Solid Power Operating, Inc. |
| 18978671 | THIN-FILM FORMING RAW MATERIAL USED IN ATOMIC LAYER DEPOSITION METHOD AND METHOD OF PRODUCING THIN-FILM | Non-Final OA | ADEKA CORPORATION |
| 18873363 | A PREPARATION PROCESS FOR MONOCLINIC TITANIUM DIOXIDE | Non-Final OA | Pacific Industrial Development Corporation |
| 18956483 | ARTIFICIAL TURF TREATMENT SYSTEM AND METHOD | Final Rejection | Tarkett Sports Canada Inc. |
| 18837560 | LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS | Non-Final OA | Lam Research Corporation |
| 18721457 | CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILANE PRECURSORS | Final Rejection | Lam Research Corporation |
| 18932381 | POLYMER TEMPLATING OF ALPHA-PHASE TANTALUM | Non-Final OA | Lawrence Livermore National Security, LLC |
| 18848153 | METHOD OF FORMING THIN FILM, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE | Non-Final OA | SOULBRAIN CO., LTD. |
| 18290234 | METHOD OF FORMING A LAYER OF A COMPOUND | Non-Final OA | MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. |
| 18142147 | METHOD FOR DEPOSITING A RUTHENIUM-CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS | Non-Final OA | Universiteit Gent |
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