Prosecution Insights
Last updated: August 17, 2026
Application No. 18/699,894

DISPLAY PANEL AND PREPARATION METHOD THEREFOR, AND DISPLAY DEVICE

Non-Final OA §102§103
Filed
Apr 10, 2024
Priority
May 23, 2022 — CN 202210564884.8 +1 more
Examiner
GEBREMARIAM, SAMUEL A
Art Unit
Tech Center
Assignee
BOE Technology Group Co., Ltd.
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
4m
Est. Remaining
91%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allowance Rate
697 granted / 838 resolved
+23.2% vs TC avg
Moderate +8% lift
Without
With
+8.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
19 currently pending
Career history
855
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
38.3%
-1.7% vs TC avg
§102
28.4%
-11.6% vs TC avg
§112
22.5%
-17.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 838 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-3, 9-13, 15-16 and 20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Chung et al., US 2019/0280075. Regarding claim 1, Chung discloses (figs. 1-5 and related text) a display substrate (110, fig. 5), comprising: a display region (DA); and a peripheral region (NA) disposed at a periphery of the display region (DA) and comprising a bending region (BR); wherein, an edge of the peripheral region (Fig. 1, area where BR is formed) is provided with a protruding part (fig. 1), and the protruding part has an alignment mark (AM) for the bending region (BR). Regarding claim 2, Chung discloses a plane parallel to the display region (taking a plane in the z-direction) is used as a reference plane (fig. 1), and an orthographic projection of the bending region on the reference plane is not overlapped with an orthographic projection of the protruding part on the reference plane (fig. 1). Regarding claim 3, Chung discloses wherein, when a surface of the display substrate is planar, one end of a first region away from the bending region for disposing the protruding part in the display substrate has an arc chamfer, a plane parallel to the display region is used as a reference plane, and an orthographic projection of the arc chamfer on the reference plane is not overlapped with an orthographic projection of the protruding part on the reference plane (the protruding part will not overlap the Z plane). Regarding claim 9, Chung discloses a plurality of thin film transistors (only one pixel is shown [0068]), wherein the thin film transistors comprise a gate layer (124) and a source-drain layer [0071], and the alignment mark is disposed in the same layer as the gate layer or the source-drain layer [0075]. Regarding claim 10, Chung discloses further comprising a protective layer (50) disposed on an outer surface of the bending region (BR); wherein in a direction of the peripheral region away from the display region (DA), an edge of the protruding part away from the display region does not exceed a surface of the protective layer farthest away from the display region (figs. 2-3 [0059]). Regarding claim 11, Chung discloses a heat dissipation film (393, is an inorganic film and have heat dissipation property) disposed facing away from a light emitting side of the display substrate (fig. 5); a plane parallel to the display region is used as a reference plane, and an orthographic projection of the heat dissipation film on the reference plane is at least partially overlapped with an orthographic projection of the display region on the reference plane (fig. 5, a plane parallel to the display region is used as a reference plane (a plane parallel to the substrate, an orthographic projection of the heat dissipation film (393) on the reference plane is will be partially overlapped with an orthographic projection of the display region on the reference plane). Regarding claim 12, Chung discloses an edge of the peripheral region is further provided with a second protruding part (fig. 4), and the second protruding part has the same structure as the protruding part (AM, fig. 4). Regarding claim 13, Chung discloses a cover plate (120) disposed on the light emitting side of the display substrate, wherein the cover plate is configured to fit a shape of one side of the display substrate (110) and is adapted to the shape of the display substrate (110, fig. 5). Regarding claim 15, Chung discloses a display device (10), comprising: the display substrate (110) according to claim 1. Regarding claim 16, Chung discloses a manufacturing method of a display substrate, comprising: forming a display substrate (110), wherein the display substrate (110) comprises a display region (DA) and a peripheral region (NA) disposed at a periphery of the display region (fig. 5) and comprising a bending region (BR); forming a protruding part at an edge of the peripheral region (fig. 1, where BR is formed); forming an alignment mark (AM) for the bending region (BR) on the protruding part (fig. 4). Regarding claim 20, Chung discloses a display device (10), comprising: the display substrate (110) according to claim 2. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 4-8 and 18-19 are rejected under 35 U.S.C. 103 as being unpatentable over Chung. Regarding claims 4-8 and 18-19, Chung does not explicitly disclose a distance between a side of the arc chamfer or the curved region close to the bending region and an edge of the bending region close to the protruding part is less than 3mm, the protruding part is disposed at a side of the first region close to the bending region, and a third edge of the protruding part close to the bending region does not exceed a first edge of the bending region close to the first region, a distance between the arc chamfer and the bending region is greater than or equal to 3mm, the protruding part is close to the arc chamfer, and a second edge of the protruding part away from the bending region does not exceed an edge of the arc chamfer close to the bending region, a distance between the curved region and the bending region is greater than or equal to 3mm, and the protruding part is disposed at a side of the first region close to the curved region, a distance between an edge of the protruding part close to the curved region and an edge of the curved region close to the bending region is greater than or equal to 0.2 mm, a distance between a third edge of the protruding part close to the bending region and a first edge of the bending region close to the first region is greater than or equal to 1mm, a distance between a third edge of the protruding part close to the bending region and a first edge of the bending region close to the first region is greater than or equal to 1mm, or a distance between a third edge of the protruding part close to the bending region and a first edge of the bending region close to the first region is greater than or equal to 1mm. Parameters such as distance between different regions of a device in the art of semiconductor process are subject to routine experimentation and optimization to achieve the desired device characterization during fabrication. It would have been obvious to one having ordinary skill in the art before the effective filing date of the claimed invention to utilize appropriate distance between the different regions of the device as claimed to meet the requirements of the particular design, since it has been held that where the general conditions of a claim are disclosed in the prior art, discovering the optimum or workable ranges involves only routine skill in the art. /n re Aller, 105 USPQ 233. Allowable Subject Matter Claims 14 and 17 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SAMUEL A GEBREMARIAM whose telephone number is (571)272-1653. The examiner can normally be reached 8:30-4PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Lynne Gurley can be reached at 571-272-1670. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SAMUEL A GEBREMARIAM/Primary Examiner, Art Unit 2811
Read full office action

Prosecution Timeline

Apr 10, 2024
Application Filed
Aug 06, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Patent 12696547
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Patent 12696644
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
91%
With Interview (+8.0%)
2y 9m (~4m remaining)
Median Time to Grant
Low
PTA Risk
Based on 838 resolved cases by this examiner. Grant probability derived from career allowance rate.

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