Prosecution Insights
Last updated: August 06, 2026
Application No. 18/725,284

LIGHT-EMITTING DIODE EPITAXIAL STRUCTURE AND LIGHT-EMITTING DIODE

Non-Final OA §112
Filed
Jun 28, 2024
Priority
Dec 30, 2021 — CN 202111655093.8 +2 more
Examiner
CHI, SUBERR L
Art Unit
Tech Center
Assignee
Huaian Aucksun Optoelectronics Technology Co. Ltd.
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
8m
Est. Remaining
87%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
550 granted / 652 resolved
+24.4% vs TC avg
Minimal +3% lift
Without
With
+2.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
22 currently pending
Career history
669
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
44.6%
+4.6% vs TC avg
§102
23.8%
-16.2% vs TC avg
§112
28.3%
-11.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 652 resolved cases

Office Action

§112
DETAILED ACTION Notice of AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Specifications The title is objected to because a more descriptive title is requested. Claim Rejections – 35 U.S.C. § 112(b) The following is a quotation of 35 U.S.C. § 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. Claims 1-11 are rejected under 35 U.S.C. § 112(b) or pre-AIA 35 U.S.C. § 112, second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor, or for pre-AIA the applicant, regards as the invention. As to claim 1, it is unclear what is meant by “different doping concentrations or concentration variations in different sub-layers”. The limitations “different doping concentrations” and “concentration variations” seem redundant and it is unclear how they differ from each other. Indication of Allowable Subject Matter The following is a statement of reasons for the indication of allowable subject matter: claims 12-20 are indicated as being allowable because prior art fails to teach “the P-type semiconductor layer comprises a first electron-blocking layer, a first hole- injecting layer, a second electron-blocking layer and a second hole-injecting layer which are sequentially stacked on a surface of the multi-quantum well light-emitting layer; an energy level of the first electron-blocking layer is lower than that of the second electron- blocking layer; and the first electron-blocking layer comprises a plurality of sub-layers” (claim 12). Claims 1-11 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action. As to claim 1, Wang (CN 110707188 A), machine translation provided and hereafter “Wang”, is the closest prior art. Wang teaches in FIG. 1 a substrate 10; and an N-type semiconductor layer 40, a multi-quantum well light-emitting layer 60, and a P-type semiconductor layer 70 is doped therein with a P-type impurity Mg, and the P-type impurity Mg has different doping concentrations in different sub-layers of the P-type semiconductor layer (layer 712 has lightly doped Mg while layer 713 has heavy doped Mg). See Wang, pg. 7. However, Wang does not teach the limitations of the substituent parts of the P-type semiconductor layer nor the limitations of the Mg-modulation layer nor the limitations of the average doping concentration relationship. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SUBERR CHI whose telephone number is (571)270-3955. The examiner can normally be reached 10am to 6pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached on (571) 272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SUBERR L CHI/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Jun 28, 2024
Application Filed
Jul 15, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
87%
With Interview (+2.8%)
2y 9m (~8m remaining)
Median Time to Grant
Low
PTA Risk
Based on 652 resolved cases by this examiner. Grant probability derived from career allowance rate.

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