Prosecution Insights
Last updated: August 17, 2026
Application No. 18/730,425

SEMICONDUCTOR DEVICE

Non-Final OA §102§103
Filed
Jul 19, 2024
Priority
Mar 10, 2022 — JP 2022-036968 +2 more
Examiner
TRAPANESE, WILLIAM C
Art Unit
Tech Center
Assignee
Sony Group Corporation
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
1y 1m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
501 granted / 650 resolved
+17.1% vs TC avg
Strong +21% interview lift
Without
With
+20.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
21 currently pending
Career history
667
Total Applications
across all art units

Statute-Specific Performance

§101
12.0%
-28.0% vs TC avg
§103
56.9%
+16.9% vs TC avg
§102
23.1%
-16.9% vs TC avg
§112
2.6%
-37.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 650 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1, 2, 10 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Marui et al. (Hereinafter Marui, US 2021/0367070). In regards to independent claim 1, Marui teaches a semiconductor device comprising: an SJ layer extending in a first direction in a plane and configured by alternately arraying a plurality of semiconductor regions of a first conductivity type and a plurality of semiconductor regions of a second conductivity type in a second direction orthogonal to the first direction (Marui, [0044], SJ Structure, Fig. 1-4); a first drain layer of the first conductivity type electrically connected to the SJ layer on one end side in the first direction (Marui, 50, Fig. 1-4); a channel layer of the second conductivity type provided on the SJ layer on the other end side in the first direction (Marui, 30, Fig. 1-4); a first source layer of the first conductivity type provided on the channel layer (Marui, 40, Fig. 1-4); and a first gate electrode provided on a side of the channel layer and the first source layer in the first direction with a first insulating layer interposed therebetween (Marui, 60, 65, Fig. 1-4). In regards to dependent claim 2, Marui teaches the semiconductor device according to claim 1, wherein the first insulating layer is provided on the SJ layer with the first gate electrode embedded therein (Marui, 60, 65, Fig. 1-4). In regards to dependent claim 10, Marui teaches wherein a depletion layer is formed in the semiconductor region of the first conductivity type of the SJ layer (Marui, [0024], Fig. 1-4). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 3 is/are rejected under 35 U.S.C. 103 as being unpatentable over Marui in view of Sato et al. (hereinafter Sato, US 2016/0079416). In regards to dependent claim 3, Marui teaches all limitations from claim 1. Marui fails to teach wherein the first gate electrode is provided between the channel layer and the first source. Sato teaches wherein the first gate electrode is provided between the channel layer and the first source layer, and the first drain layer. It would have been obvious to one of ordinary skill in the art, having the teachings of Marui and Sato before him before the effective filing date of the claimed invention, to modify the super junction transistor taught by Marui to include gate electrode between the source and drain of Sato in order to obtain a super junction transistor with a gate electrode between the source and drain. One would have been motivated to make such a combination because it reduces the one resistance. Claim(s) 11, 12 is/are rejected under 35 U.S.C. 103 as being unpatentable over Marui in view of Kitigawa et al. (hereinafter Kitigawa, US 2003/0183858). In regards to dependent claim 11, Marui teaches all limitations from claim 1. Marui fails to teach wherein the SJ layer is provided on an interlayer insulating layer including an insulating material. Kitigawa teaches wherein the SJ layer is provided on an interlayer insulating layer including an insulating material (Kitigawa, 3, 12, and 13 Fig. 13). It would have been obvious to one of ordinary skill in the art, having the teachings of Marui and Kitigawa before him before the effective filing date of the claimed invention, to modify the super junction transistor taught by Marui to include the insulating layer of Kitigawa in order to obtain a super junction transistor deposited on an insulating layer. One would have been motivated to make such a combination because it reduces leakage current from the transistor. In regards to dependent claim 12, Marui teaches all limitations from claim 1. Marui fails to teach the interlayer insulating layer is laminated with a semiconductor substrate, and the SJ layer is provided on a laminated substrate including the interlayer insulating layer and the semiconductor substrate. Kitigawa teaches wherein the interlayer insulating layer is laminated with a semiconductor substrate, and the SJ layer is provided on a laminated substrate including the interlayer insulating layer and the semiconductor substrate (Kitigawa, 3, 12, and 13 Fig. 13). It would have been obvious to one of ordinary skill in the art, having the teachings of Marui and Kitigawa before him before the effective filing date of the claimed invention, to modify the super junction transistor taught by Marui to include the insulating layer of Kitigawa in order to obtain a super junction transistor deposited on an insulating layer. One would have been motivated to make such a combination because it reduces leakage current from the transistor. Claim(s) 13 is/are rejected under 35 U.S.C. 103 as being unpatentable over Marui in view of Kitigawa and Yokoyama (US 2012/0248544) In regards to dependent claim 13, Marui in view of Kitigawa teach all limitations from claim 12. Marui fails to teach wherein the laminated substrate is provided with a pixel including a logic circuit or a photodiode. Yokoyama teaches wherein the laminated substrate is provided with a pixel including a logic circuit or a photodiode (Yokoyama, [0702]). It would have been obvious to one of ordinary skill in the art, having the teachings of Marui Kitigawa and Yokoyama before him before the effective filing date of the claimed invention, to modify the super junction transistor taught by Marui to include the pixel circuit of Yokoyama in order to obtain a super junction transistor used within a pixel circuit. One would have been motivated to make such a combination because it enables the pixel to be smaller thereby enabling a higher resolution screen. Allowable Subject Matter Claims 4-9 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to WILLIAM C TRAPANESE whose telephone number is (571)270-3304. The examiner can normally be reached Monday - Friday 7am-12pm & 8pm-10pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached at (571)272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /WILLIAM C TRAPANESE/Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jul 19, 2024
Application Filed
Jul 29, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12707696
METHOD FOR MANUFACTURING A CONTACT ON A SILICON CARBIDE SEMICONDUCTOR SUBSTRATE, AND SILICON CARBIDE SEMICONDUCTOR DEVICE
3y 0m to grant Granted Aug 11, 2026
Patent 12696546
DISPLAY SUBSTRATE, MANUFACTURING METHOD AND DISPLAY DEVICE
2y 9m to grant Granted Jul 28, 2026
Patent 12690226
METAL-OXIDE SEMICONDUCTOR TRANSISTORS
3y 0m to grant Granted Jul 21, 2026
Patent 12672332
LDMOS DEVICE AND METHOD OF FABRICATION OF SAME
3y 7m to grant Granted Jun 30, 2026
Patent 12660318
ARRAY SUBSTRATE, AND DISPLAY PANEL
3y 2m to grant Granted Jun 16, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
98%
With Interview (+20.9%)
3y 2m (~1y 1m remaining)
Median Time to Grant
Low
PTA Risk
Based on 650 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month