Prosecution Insights
Last updated: October 02, 2026
Application No. 18/733,611

Diode and Method of Manufacturing Same

Non-Final OA §102§103
Filed
Jun 04, 2024
Priority
Sep 07, 2023 — provisional 63/537,151
Examiner
HUNTER III, CARNELL
Art Unit
Tech Center
Assignee
Microchip Technology Incorporated
OA Round
1 (Non-Final)
92%
Grant Probability
Favorable
1-2
OA Rounds
1y 1m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 92% — above average
92%
Career Allowance Rate
67 granted / 73 resolved
+31.8% vs TC avg
Moderate +15% lift
Without
With
+14.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
22 currently pending
Career history
96
Total Applications
across all art units

Statute-Specific Performance

§103
54.8%
+14.8% vs TC avg
§102
26.0%
-14.0% vs TC avg
§112
18.2%
-21.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 73 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election Applicant’s election without traverse of Group II, Claims 1-10, in the reply filed on 07/15/2026 is acknowledged. IDS The IDS document(s) filed on 10/04/2024 and 04/21/2026 have been considered. Copies of the PTO-1449 documents are herewith enclosed with this office action. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-5 and 7-10 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Chau et al. (US 2019/0081184 A1), hereafter “Chau”. As to claim 1, Chau teaches a diode comprising: a substrate (110+120, Fig. 1A, ⁋ [0030]); a cathode terminal (140) on a first surface of the substrate; an anode terminal (130) on a second surface of the substrate; and an implant portion (126+128) disposed within the substrate. As to claim 2, Chau teaches the diode of claim 1, wherein the substrate comprises an n-type semiconductor (⁋ [0031], “a first conductivity type (e.g., n-type)”). As to claim 3, Chau teaches the diode of claim 2, wherein the implant portion comprises a p-type semiconductor (⁋ [0035], “a second conductivity type (e.g., p-type)”). As to claim 4, Chau teaches the diode of claim 1, wherein the implant portion comprises a circular shape, a rectangular shape, a triangular shape, a pentagonal shape, a hexagonal shape, or an octagonal shape (⁋ [0046], Figs. 2+3). As to claim 5, Chau teaches a diode comprising: a substrate (110+120, Fig. 1A, ⁋ [0030]); a cathode terminal (140) on a first surface of the substrate; an anode terminal (130) on a second surface of the substrate; a first implant portion (128, ⁋ [0030]) having a first concentration (⁋ [0040], “a second impurity concentration”) disposed within the substrate; and a second implant portion (126) having a second concentration (⁋ [0035], “a first impurity concentration”) disposed within the first implant portion wherein the first implant portion encompasses the second implant portion (Figs. 1A+2+3), wherein the second concentration is not equal to the first concentration (⁋ [0040], “a second impurity concentration that is smaller than the first impurity concentration”). As to claim 7, Chau teaches the diode of claim 5, wherein the substrate comprises an n-type semiconductor (⁋ [0031], “a first conductivity type (e.g., n-type)”). As to claim 8, Chau teaches the diode of claim 7, wherein the first implant portion and the second implant portion comprises a p-type semiconductor (⁋ [0035], “a second conductivity type (e.g., p-type)”). As to claim 9, Chau teaches the diode of claim 5, wherein the first implant portion comprises a circular shape, a rectangular shape, a triangular shape, a pentagonal shape, a hexagonal shape, or a octagonal shape (⁋ [0046], Figs. 2+3). As to claim 10, Chau teaches the diode of claim 9, wherein the second implant portion comprises a shape generally corresponding to the shape of the first implant portion (Figs. 2+3). Claim Rejections - 35 U.S.C. § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim 6 is rejected under 35 U.S.C. 103 as being unpatentable over Chau. As to claim 6, Chau teaches the diode of claim 5, wherein the second concentration of the second implant portion (126) is 2 to 20 times greater than the first concentration of the first implant portion (128) (⁋ [0040] teaches the concentration range). It would have been obvious to one of ordinary skill in the art before the effective filing date to apply the ranges of Chau because in the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art”, a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ 2d 1934 (Fed. Cir. 1990). MPEP 2144.05. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to CARNELL HUNTER whose telephone number is (571)270-1796. The examiner can normally be reached Monday - Friday 7:30 am - 4:30pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sue Purvis can be reached on 571-272-1236. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CARNELL HUNTER III/ Examiner, Art Unit 2893 /SUE A PURVIS/Supervisory Patent Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Jun 04, 2024
Application Filed
Aug 26, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
92%
Grant Probability
99%
With Interview (+14.9%)
3y 5m (~1y 1m remaining)
Median Time to Grant
Low
PTA Risk
Based on 73 resolved cases by this examiner. Grant probability derived from career allowance rate.

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