Prosecution Insights
Last updated: October 02, 2026
Application No. 18/737,207

IMAGE SENSOR

Non-Final OA §112
Filed
Jun 07, 2024
Priority
Jul 19, 2023 — RE 10-2023-0094017
Examiner
OJEH, NDUKA E
Art Unit
Tech Center
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
88%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allowance Rate
729 granted / 812 resolved
+29.8% vs TC avg
Minimal -2% lift
Without
With
+-2.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
21 currently pending
Career history
816
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
53.5%
+13.5% vs TC avg
§102
28.7%
-11.3% vs TC avg
§112
12.2%
-27.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 812 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 6/7/2024 was filed. The submission is in compliance with the provisions of 37 CFR 1.97. Accordingly, the information disclosure statement is being considered by the examiner. Specification The abstract is consistent with the requirements set forth in the MPEP 608.01(b). The title of the invention is not descriptive. A new title is required that is clearly indicative of the invention to which the claims are directed. The following title is suggested: IMAGE SENSOR COMPRISING TRANSMISSION GATE Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112: The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention. Claims 1-20 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the enablement requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to enable one skilled in the art to which it pertains, or with which it is most nearly connected, to make and/or use the invention. Specifically, claim 1 recites “a third stack, attached to the second stack and comprising a logic transistor configured to provide signals to the pixel gate and to the transmission gate” in lines 18-19; claim 12 recites “a third stack, attached to the second stack, the third stack comprising a logic transistor configured to provide signals to the pixel gate and the transmission gate” in lines 18-19; and claim 18 recites “wherein the third stack includes a logic transistor configured to provide signals to the pixel gate and the transmission gate” in lines 25-26. The specification simply discloses that the logic transistor is configured to provide signals to the transmission gate ([0004]-[0006]) but there is no description or drawings that show how the logic transistor in the third stack is directly or indirectly connected to the transmission gate in the first stack in order for one of ordinary skill in the art would make the connected or configure the logic transistor to provide signals to the transmission gate. The drawings show an electrical connection between the logic transistor and the pixel gate (fig. 4) but fails to show any connection between the logic transistor and the transmission gate in any of the drawings or provide any explanation on how the connection or configuration is done. Claims 2-11, 13-17 and 19-20 are also rejected under 35 U.S.C. 112(a) as failing to comply with the enablement requirement for being dependent on claims 1, 12 and 18. Allowable Subject Matter Regarding claim 1, the closest prior art Jang et al. US PGPub. 2023/0081238 teaches an image sensor (100, fig. 2) [0025] comprising: a first stack (SUB1) comprising a first semiconductor substrate (110, fig. 2) [0030] having a first surface (bottom) and a second surface (top) that is opposite to the first surface, a photoelectric conversion region (PD, fig. 2) [0027] in the first semiconductor substrate (110), a floating diffusion region (FD, fig. 2) [0044] arranged in the first semiconductor substrate (110) and configured to store charges transferred from the photoelectric conversion region (PD), a transmission gate (transfer gate TG, fig. 2) [0044] on the first surface (bottom) of the first semiconductor substrate (110), a second stack (SUB2, fig. 2), attached to the first stack (SUB1), the second stack (SUB2) comprising a second semiconductor substrate (120, fig. 2) [0031] having a first surface (bottom) and a second surface (top) that is opposite to the first surface, a pixel gate (PXT, fig. 2) [0045] arranged on the first surface of the second semiconductor substrate or on the second surface (top) of the second semiconductor substrate (120), the pixel gate (PXT) being electrically connected (fig. 2) with the floating diffusion region (FD), and a gate spacer (176, fig. 2-3) [0045] on a sidewall of the pixel gate (PXT); and a third stack (SUB3), attached to the second stack (SUB2) and comprising a logic transistor (LCT, fig. 2) [0029] (Jang et al., fig. 2). But Jang fails to teach and a first etch stop film arranged on an upper surface and a sidewall of the transmission gate (TG) and on the first surface of the first semiconductor substrate (110); and a third stack (SUB3), attached to the second stack (SUB2) and comprising a logic transistor (LCT) configured to provide signals to the pixel gate (PXT) and to the transmission gate (TG). Claims 1-20 would be allowable if rewritten or amended to overcome the rejection(s) under 35 U.S.C. 112(a), set forth in this Office action. The following is a statement of reasons for the indication of allowable subject matter: the prior arts of record taken alone or in combination neither anticipates nor renders obvious an image sensor comprising “a first etch stop film arranged on an upper surface and a sidewall of the transmission gate and on the first surface of the first semiconductor substrate” and “a pixel gate arranged on the first surface of the second semiconductor substrate or on the second surface of the second semiconductor substrate, the pixel gate being electrically connected with the floating diffusion region, and a gate spacer on a sidewall of the pixel gate; and a third stack, attached to the second stack and comprising a logic transistor configured to provide signals to the pixel gate” as recited in claim 1; an image sensor comprising “a first etch stop film arranged on an upper surface of a first portion of the transmission gate, on a sidewall of the first portion of the transmission gate, and on the first surface of the first semiconductor substrate” and “a pixel gate arranged on the first surface of the second semiconductor substrate or on the second surface of the second semiconductor substrate, the pixel gate being electrically connected with the floating diffusion region; and a third stack, attached to the second stack, the third stack comprising a logic transistor configured to provide signals to the pixel gate” as recited in claim 12; and an image sensor comprising “a transmission gate arranged on the first surface of the first semiconductor substrate and having a first portion and having a second portion that is arranged in a transmission trench extending to an inside of the first semiconductor substrate, a first etch stop film arranged on an upper surface and a sidewall of the first portion of the transmission gate and on the first surface of the first semiconductor substrate, and a passivation layer arranged between the first etch stop film and each of the upper surface and the sidewall of the first portion of transmission gate and between the first etch stop film and the first surface of the first semiconductor substrate” in combination with the limitation wherein “the pixel gate being electrically connected with the floating diffusion region, a gate spacer on a sidewall of the pixel gate, and a second etch stop film arranged on an upper surface of the pixel gate and on a sidewall of the gate spacer, and wherein the third stack includes a logic transistor configured to provide signals to the pixel gate” as recited in claim 18. Claims 2-11, 13-17 and 19-20 are also allowable for further limiting and depending upon allowable claims 1, 12 and 18. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Jang et al. US PGPub. 2023/0030489 teaches an image sensor comprising three stacks but the logic transistor in the third stack is not connected or configured to provide any signals to the pixel gate or the transmission gate. Any inquiry concerning this communication or earlier communications from the examiner should be directed to NDUKA E OJEH whose telephone number is (571)270-0291. The examiner can normally be reached M-F; 9am - 5pm.. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, DREW N RICHARDS can be reached at (571) 272-1736. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /NDUKA E OJEH/Primary Examiner, Art Unit 2892
Read full office action

Prosecution Timeline

Jun 07, 2024
Application Filed
Sep 08, 2026
Non-Final Rejection mailed — §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
88%
With Interview (-2.2%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 812 resolved cases by this examiner. Grant probability derived from career allowance rate.

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