Prosecution Insights
Last updated: October 04, 2026
Application No. 18/740,706

DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

Non-Final OA §102
Filed
Jun 12, 2024
Priority
Nov 02, 2023 — RE 10-2023-0150325
Examiner
PAGE, STEVEN MITCHELL CHR
Art Unit
Tech Center
Assignee
Silicon Display Technology
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
387 granted / 463 resolved
+23.6% vs TC avg
Moderate +9% lift
Without
With
+8.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
24 currently pending
Career history
477
Total Applications
across all art units

Statute-Specific Performance

§101
3.8%
-36.2% vs TC avg
§103
38.9%
-1.1% vs TC avg
§102
35.6%
-4.4% vs TC avg
§112
20.6%
-19.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 463 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-3, 5, and 7-8 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Kwon et al. (US 20150243720 A1, hereinafter Kwon) With regards to claim 1, Kwon discloses a display device (FIGS. 1-6A) comprising: a first TFT implemented as a Low-Temperature Polycrystalline Silicon (LTPS) TFT; (LTPS TFT, see FIG. 6A) a second TFT implemented as an oxide TFT (oxide TFT, see FIG. 6A) stacked on the LTPS TFT; (see FIG. 6A, where the oxide TFT is stacked on the LTPS TFTF from left to right of the figure) and a light emitting device (pixel circuit/OLED) formed next to a structure in which the first TFT and the second TFT are stacked, (See FIG. 1 and 2a) wherein one electrode of the first TFT is connected to a gate of the second TFT, and one electrode of the second TFT is connected to the light emitting device. (See FIGS. 1, 2A, and 6A, showing the connections between the first TFT, the second TFT, and the OLED) With regards to claim 2, Kwon discloses the display device of claim 1, wherein: the second TFT includes: a first active layer (active layer 610) formed on a substrate; (substrate 602) a first insulation layer (insulation layer 612) formed on the first active layer; a first gate electrode (metal layer 614) formed on the first insulation layer; a second insulation layer (insulation layer 616) formed on the first insulation layer and the first gate electrode; a first electrode layer (left electrode layer 618) connected to any one of a source region and a drain region of the first active layer through a first via electrode formed to penetrate the first insulation layer and the second insulation layer and formed on the second insulation layer; and a second electrode layer (right electrode layer 618) connected to the other of the source region and the drain region of the first active layer through a second via electrode formed to penetrate the first insulation layer and the second insulation layer and formed on the second insulation layer, and the first electrode layer is electrically connected to the light emitting device. (See FIGS. 1, 2A, and 6A, showing the connections) With regards to claim 3, Kwon discloses the display device of claim 2, wherein: the first TFT includes: a third insulation layer (insulation layer 604) formed on the first electrode layer and the second electrode layer; a second active layer (poly-si active layer 608) formed on the third insulation layer; a third electrode layer (right metal 614) formed on any one of a source region and a drain region of the second active layer; a fourth electrode layer (left metal 614) formed on the other of the source region and the drain region of the second active layer; a fourth insulation layer (insulation layer 616) formed on the third insulation layer, the third electrode layer, and the fourth electrode layer; and a second gate electrode (metal oxide 610, see Paragraph [0080) formed on the fourth insulation layer to overlap the second active layer in a vertical direction, and the third electrode layer is electrically connected to the first gate electrode. (See FIG. 6A) With regards to claim 5, Kwon discloses the display device of claim 3, further comprising: a fifth insulation layer (dielectric 620) formed on the fourth insulation layer and the second gate electrode; and a sixth electrode layer and a seventh electrode layer (electrodes 618 and 622) formed on the fourth insulation layer, wherein the light emitting device includes an anode connected to the sixth electrode layer and a cathode connected to the seventh electrode layer. (Paragraphs [0086]-[0090]: “Accordingly, the second metal layer 618 may serves as a signal line…By way of an example, the LTPS TFT shown in FIG. 6A may be a driving TFT in a pixel circuit, and the third metal layer 622 may serve as an anode of an OLED element.”) With regards to claim 7, Kwon discloses the display device of claim 1, wherein: the light emitting device is a micro LED. (OLED, see FIG. 2A) With regards to claim 8, Kwon discloses a method of manufacturing a display device, (FIGS. 1-6A) the method comprising: forming a first TFT, which is an LTPS TFT, ; (LTPS TFT, see FIG. 6A) on a substrate; (substrate 602) forming a second TFT, which is an Oxide TFT, ; (oxide TFT, see FIG. 6A) on the first TFT; and forming a light emitting device (OLED) next to a structure in which the first TFT and the second TFT are stacked, wherein one electrode of the second TFT is connected to a gate of the first TFT, and one electrode of the first TFT is connected to the light emitting device. (See FIGS. 1, 2A, and 6A, showing the connections) Allowable Subject Matter Claims 4 and 6 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Im (US 20150179679 A1) – two TFTs on the same substrate Any inquiry concerning this communication or earlier communications from the examiner should be directed to STEVEN M Page whose telephone number is (571)272-3249. The examiner can normally be reached M-F: 10:00AM-6:00PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine S. Kim can be reached at 571-272-8548. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STEVEN M PAGE/Primary Patent Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jun 12, 2024
Application Filed
Aug 20, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12751001
SEMICONDUCTOR DEVICE, MEMORY SYSTEM AND FABRICATION METHOD OF A SEMICONDUCTOR DEVICE
3y 2m to grant Granted Sep 29, 2026
Patent 12751092
ELECTROSTATIC DISCHARGE (ESD) PROTECTION DEVICE
3y 0m to grant Granted Sep 29, 2026
Patent 12751251
METHOD OF MANUFACTURING LAMINATED ASSEMBLY
2y 4m to grant Granted Sep 29, 2026
Patent 12745386
SEMICONDUCTOR APPARATUS HAVING MULTI-LAYERED BIT LINE CONTACT AND MANUFACTURING METHOD OF THE SAME
3y 2m to grant Granted Sep 22, 2026
Patent 12745484
QUANTUM DEVICE FOR FORMING AN ARRAY OF QUANTUM DOTS AND ASSOCIATED MANUFACTURING METHOD
2y 9m to grant Granted Sep 22, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
92%
With Interview (+8.7%)
2y 3m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 463 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month