Prosecution Insights
Last updated: April 19, 2026
Application No. 18/754,701

SUBSTRATE-PROCESSING APPARATUS

Non-Final OA §102
Filed
Jun 26, 2024
Examiner
BAUER, SCOTT ALLEN
Art Unit
2838
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
82%
Grant Probability
Favorable
1-2
OA Rounds
2y 7m
To Grant
96%
With Interview

Examiner Intelligence

Grants 82% — above average
82%
Career Allow Rate
804 granted / 977 resolved
+14.3% vs TC avg
Moderate +13% lift
Without
With
+13.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
22 currently pending
Career history
999
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
57.2%
+17.2% vs TC avg
§102
32.3%
-7.7% vs TC avg
§112
5.8%
-34.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 977 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-4 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Brown (US 2006/0002053). With regard to claims 1-4, Brown, in Figures 1A & 4, discloses a substrate-processing apparatus (paragraph 0020), comprising: a substrate support (10) that includes an electrostatic chuck (20), the electrostatic chuck including a support surface (as seen in Fig. 1A) configured to support an annular member (104), wherein the support surface includes a diffusion groove (29) through which a heat transfer gas is diffused into a gap between the annular member and the support surface (paragraph 0020), and the diffusion groove includes an annular groove (any of the circular grooves provided between circular grooves 37 & 39) provided concentrically with the electrostatic chuck, and a radial groove (any one of the radial grooves 29 which extend entirely from outer groove 39 & inner groove 37) that is in communication with the annular groove and is provided from the annular groove in a radial direction of the electrostatic chuck (as seen in Fig. 1A and described in paragraph 0020) (re claim 1), wherein the diffusion groove includes multiple annular grooves that are each the annular groove, and the radial groove is in communication with the multiple annular grooves (as seen in Fig. 1A, many adjacent circular grooves between inner groove 37 & outer groove 39 are in communication with many of the radial grooves) (re claim 2), wherein one end of the radial groove is provided inward of the annular groove in the radial direction, and another end of the radial groove is provided outward of the annular groove in the radial direction (as seen in Fig. 1A, many of the radial grooves 29 extend inwardly and outwardly beyond the circular grooves between inner groove 27 & outer groove 39) (re claim 3), wherein one end of the radial groove is provided inward, in the radial direction, of the annular groove that is closest to an inner circumference of the electrostatic chuck, of the multiple annular grooves, and another end of the radial groove is provided outward, in the radial direction, of the annular groove that is closest to an outer circumference of the electrostatic chuck, of the multiple annular grooves (as seen in Fig. 1A, many of the radial grooves 29 extend inwardly and outwardly beyond two adjacent circular grooves between inner groove 27 & outer groove 39) (re claim 4). Allowable Subject Matter Claims 5-8 would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Claim 5 would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims because the prior art of record does not teach or fairly suggest a substrate-processing apparatus comprising all the features as recited in the claims and in combination with in a plan view of the support surface, the annular groove is provided at a position not overlapping the electrodes, and at least a part of the radial groove is provided at a position overlapping the electrodes. Claims 6-8 would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims because they depend on claim 5 which would also be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Steger (US 5,522,131), Busse (US 6,215,641), Moslehi (US 6,907,924), Kamitani (US 2008/0037194) and Matyushkin (US 2021/0005494) all teach an electrostatic chuck with annular and radial gas passages which are relevant to Applicant’s invention. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SCOTT BAUER whose telephone number is (571)272-5986. The examiner can normally be reached M-F 12pm - 8pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, THIENVU TRAN can be reached at (571)270-1276. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Scott Bauer/Primary Examiner, Art Unit 2838
Read full office action

Prosecution Timeline

Jun 26, 2024
Application Filed
Feb 18, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
82%
Grant Probability
96%
With Interview (+13.3%)
2y 7m
Median Time to Grant
Low
PTA Risk
Based on 977 resolved cases by this examiner. Grant probability derived from career allow rate.

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