Last updated: July 17, 2026

Application No. 18/761,170

POLISHING SLURRY, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Non-Final OA

Filed

Jul 01, 2024

Priority

Jul 03, 2023 — RE 10-2023-0085965 +1 more

Examiner

DUCLAIR, STEPHANIE P.

Art Unit

1713

Tech Center

1700 — Chemical & Materials Engineering

Assignee

Samsung Electronics Co., Ltd.

OA Round

1 (Non-Final)

Interview Optional

— +19.8% interview lift. Examiner has a relatively high allowance rate (72%); +19.8% interview lift. A written response may suffice.

Based on 814 resolved cases, 2023–2026

Examiner Intelligence

DUCLAIR, STEPHANIE P. View full profile →

Grants 72% — above average

Career Allowance Rate

584 granted / 814 resolved

+6.7% vs TC avg

Strong +20% interview lift

Without

With

+19.8%

Interview Lift

resolved cases with interview

Typical timeline

2y 9m

Avg Prosecution

33 currently pending

Career history

850

Total Applications

across all art units

Statute-Specific Performance

§101

0.1%

-39.9% vs TC avg

§103

95.4%

+55.4% vs TC avg

§102

0.7%

-39.3% vs TC avg

§112

1.1%

-38.9% vs TC avg

Black line = Tech Center average estimate • Based on career data from 814 resolved cases

Prosecution Timeline

Jul 01, 2024

Application Filed

May 20, 2026

Non-Final Rejection mailed

Jul 15, 2026

Interview Requested

Precedent Cases

Applications granted by this same examiner with similar technology

17/869,412

Patent 12680173

PROCESS AND APPARATUS TO REMOVE METAL-CONTAINING FILMS FROM A CHAMBER

3y 12m to grant Granted Jul 14, 2026

18/031,979

Patent 12685051

ETCHING GAS, ETCHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

3y 3m to grant Granted Jul 14, 2026

18/032,786

Patent 12683120

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

3y 2m to grant Granted Jul 14, 2026

18/300,954

Patent 12685055

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

3y 3m to grant Granted Jul 14, 2026

18/303,283

Patent 12685052

LOW PRESSURE PLASMA ETCH PROCESS FOR PREFERENTIAL GENERATION OF OXIDE RESIDUE AND APPLICATIONS FOR THE SAME

3y 2m to grant Granted Jul 14, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2

Expected OA Rounds

72%

Grant Probability

92%

With Interview (+19.8%)

2y 9m (~8m remaining)

Median Time to Grant

Low

PTA Risk

Based on 814 resolved cases by this examiner. Grant probability derived from career allowance rate.