DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
Specification
The disclosure is objected to because of the following informalities:
paragraph [0001], line 1: The status of 17,881,307 needs to be addressed. This application is -- now U.S. Patent No. US12111233B2, also: line 2: The status of 16,521,989 needs to be addressed. This application is -- now U.S. Patent No. 11435257--.
Appropriate action is required.
Double Patenting
The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969).
A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b).
The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13.
The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer.
Claims 1-20 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of U.S. Patent No. US12111233B2, here cited as “233”.
Although the claims at issue are not identical, they are not patentably distinct from each other because first: the patented claims are narrower (contain more subject matter) than the broader application claims. Thus, the scope of the patented claims overlap the scope of the broader application claims.
18770570
US12111233B2, “233”
1. A vacuum valve monitoring system, comprising:
a vacuum valve comprising at least one sealing O-ring; and
a pressure monitoring tape attached to a surface of a vacuum processing chamber, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the surface and is configured to perform a pressure profile mapping between the surface on the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve to determine a condition of the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease.
1. A vacuum valve monitoring system, comprising:
a vacuum valve comprising at least one sealing O-ring; and
a pressure monitoring tape attached to a mating surface of a vacuum processing chamber, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the mating surface and is configured to perform a pressure profile mapping between the mating surface on the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve to determine a closing condition of the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
2. The system of claim 1, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
2. The system of claim 1, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
3. The system of claim 1, further comprising a local computer configured to determine based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether one or more of the plurality of pressure values are within predefined threshold values.
3. The system of claim 1, further comprising a local computer configured to determine based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether one or more of the plurality of pressure values are within predefined threshold values.
4. The system of claim 3, wherein the local computer is further configured to
compare the plurality of pressure values to a plurality of predetermined threshold pressure values; and
determine the condition of the vacuum valve.
4. The system of claim 3, wherein the local computer is further configured to
compare the plurality of pressure values to a plurality of predetermined threshold pressure values; and
determine the closing condition of the vacuum valve.
5. The system of claim 1, wherein the pressure monitoring tape is flexible.
5. The system of claim 1, wherein the pressure monitoring tape is flexible.
6. The system of claim 1, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements, and each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
6. The system of claim 1, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
7. The system of claim 6, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
7. The system of claim 1, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
8. The system of claim 6, further comprising:
a data acquisition unit to collect a respective plurality of signals from each of a respective plurality of pressure sensing elements on the pressure monitoring tape; and
a data processing unit to process the respective plurality of signals.
8. The system of claim 1, further comprising:
a data acquisition unit to collect a respective plurality of signals from each of a respective plurality of pressure sensing elements on the pressure monitoring tape; and
a data processing unit to process the respective plurality of signals.
9. A vacuum valve monitoring method, comprising:
closing a vacuum valve on a vacuum processing chamber, wherein the vacuum valve comprises at least one sealing O-ring;
determining a closing condition of the vacuum valve using a pressure monitoring tape, wherein the pressure monitoring tape is configured on a surface that is disposed on a wall of the vacuum processing chamber to perform a pressure profile mapping between the surface that is disposed on the wall of the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
determining based on the pressure profile mapping at least one pressure value for the at least one sealing O-ring; and
determining whether the at least one pressure value is within a predefined threshold value.
9. A vacuum valve monitoring method, comprising:
closing a vacuum valve on a vacuum processing chamber, wherein the vacuum valve comprises at least one sealing O-ring;
determining a closing condition of the vacuum valve using a pressure monitoring tape, wherein the pressure monitoring tape is configured on a mating surface that is disposed on a wall of the vacuum processing chamber to perform a pressure profile mapping between the mating surface that is disposed on the wall of the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the mating surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
determining based on the pressure profile mapping a plurality of pressure values for the at least one sealing O-ring; and
determining whether one or more of the plurality of pressure values are within predefined threshold values.
10. The method of claim 9, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
10. The method of claim 9, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
11. The method of claim 9, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
11. The method of claim 9, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
12. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
12. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
13. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
13. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
14. The method of claim 9, wherein the determining further comprising:
collecting a respective plurality of signals from a respective plurality of pressure sensing elements on the pressure monitoring tape; and
processing the respective plurality of signals from the respective plurality of pressure sensing elements to determine the pressure profile mapping.
14. The method of claim 9, wherein the determining further comprising:
collecting a respective plurality of signals from a respective plurality of pressure sensing elements on the pressure monitoring tape; and
processing the respective plurality of signals from the respective plurality of pressure sensing elements to determine the pressure profile mapping.
15. A vacuum valve monitoring system comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape disposed between a surface of a vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
a data acquisition unit configured to collect a signal from a pressure sensing element on the pressure monitoring tape;
a data processing unit configured to process the signal from the pressure sensing element; and
a local computer configured to determine a condition of the vacuum valve based on a pressure value obtained from the signal,
wherein the local computer determines whether the pressure value is within a predefined threshold value.
15. A vacuum valve monitoring system comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape disposed between a mating surface of a vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
a data acquisition unit configured to collect a respective plurality of signals from each of a respective plurality of pressure sensing elements on the pressure monitoring tape;
a data processing unit configured to process the respective plurality of signals from the respective plurality of pressure sensing elements; and
a local computer configured to determine a closing condition of the vacuum valve based on a plurality of pressure values obtained from the plurality of signals,
wherein the local computer determines whether the one or more of the plurality of pressure values are within predefined threshold values.
16. The system of claim 15, wherein the pressure monitoring tape is flexible.
16. The system of claim 15, wherein the pressure monitoring tape is flexible.
17. The system of claim 15, wherein the pressure sensing element comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
17. The system of claim 15, wherein the pressure sensing element comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
18. The system of claim 15, wherein the pressure sensing elements comprises a thin film sensor.
18. The system of claim 15, wherein the pressure sensing elements comprises a thin film sensor.
19. The system of claim 15, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
19. The system of claim 15, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
20. The system of claim 15, wherein if the pressure value is within the predefined threshold value, the local computer instructs the vacuum processing chamber to perform vacuum processing, and wherein if the pressure value is not within the predefined threshold value, the local computer sends an alarm to an operator and triggers a preconfigured maintenance procedure.
20. The system of claim 15, wherein if the pressure value is within the predefined threshold value, the local computer instructs the vacuum processing chamber to perform vacuum processing, and wherein if the pressure value is not within the predefined threshold value, the local computer sends an alarm to an operator and triggers a preconfigured maintenance procedure.
Claims 1, 3, 6-7, 9-19 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-20 of U.S. Patent No. US11435257B2, here cited as “257”.
Although the claims at issue are not identical, they are not patentably distinct from each other because first: the patented claims are narrower (contain more subject matter) than the broader application claims. Thus, the scope of the patented claims overlap the scope of the broader application claims. Also, although the claim language is not identical they are describing the same thing (ex: surface of a vacuum processing chamber (Claim 1) is functionally the same as surface that is disposed on a wall of a vacuum processing chamber (‘257 Claim 1)).
18770570
US11435257B2, “257”
1. A vacuum valve monitoring system, comprising:
a vacuum valve comprising at least one sealing O-ring; and
a pressure monitoring tape attached to a surface of a vacuum processing chamber, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the surface and is configured to perform a pressure profile mapping between the surface on the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve to determine a condition of the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease.
Claim 1 is rejected by claims 1 and 3 of “257”.
1. A vacuum valve monitoring system, comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape attached to a mating surface that is disposed on a wall of a vacuum processing chamber, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the mating surface and is configured to perform a pressure profile mapping between the mating surface on the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve to determine a closing condition of the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease; and
a local computer configured to determine based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether one or more of the plurality of pressure values are within predefined threshold values.
claim 3. The system of claim 1, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
3. The system of claim 1, further comprising a local computer configured to determine based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether one or more of the plurality of pressure values are within predefined threshold values.1
1. A vacuum valve monitoring system, comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape attached to a mating surface that is disposed on a wall of a vacuum processing chamber, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the mating surface and is configured to perform a pressure profile mapping between the mating surface on the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve to determine a closing condition of the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease; and
a local computer configured to determine based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether one or more of the plurality of pressure values are within predefined threshold values.
claim 3. The system of claim 1, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
6. The system of claim 1, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
4. The system of claim 3, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
7. The system of claim 1, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
5. The system of claim 3, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
9. A vacuum valve monitoring method, comprising:
closing a vacuum valve on a vacuum processing chamber, wherein the vacuum valve comprises at least one sealing O-ring;
determining a closing condition of the vacuum valve using a pressure monitoring tape, wherein the pressure monitoring tape is configured on a surface that is disposed on a wall of the vacuum processing chamber to perform a pressure profile mapping between the surface that is disposed on the wall of the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
determining based on the pressure profile mapping at least one pressure value for the at least one sealing O-ring; and
determining whether the at least one pressure value is within a predefined threshold value.
10. A vacuum valve monitoring method, comprising:
closing a vacuum valve on a vacuum processing chamber, wherein the vacuum valve comprises at least one sealing O-ring;
determining a closing condition of the vacuum valve using a pressure monitoring tape, wherein the pressure monitoring tape is configured on a mating surface that is disposed on a wall of the vacuum processing chamber to perform a pressure profile mapping between the mating surface that is disposed on the wall of the vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein the pressure monitoring tape is disposed between the at least one sealing O-ring and the mating surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
determining based on the pressure profile mapping a plurality of pressure values comprising an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring; and
determining whether one or more of the plurality of pressure values are within predefined threshold values.
10. The method of claim 9, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
11. The method of claim 10, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
11. The method of claim 9, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
12. The method of claim 10, wherein the pressure monitoring tape comprises a plurality of pressure sensing elements.
12. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
13. The method of claim 12, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
13. The method of claim 11, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
14. The method of claim 12, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
14. The method of claim 9, wherein the determining further comprising:
collecting a respective plurality of signals from a respective plurality of pressure sensing elements on the pressure monitoring tape; and
processing the respective plurality of signals from the respective plurality of pressure sensing elements to determine the pressure profile mapping.
15. The method of claim 10, wherein the determining further comprising:
collecting a respective plurality of signals from a respective plurality of pressure sensing elements on the pressure monitoring tape; and
processing the respective plurality of signals from the respective plurality of pressure sensing elements to determine the pressure profile mapping.
15. A vacuum valve monitoring system comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape disposed between a surface of a vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
a data acquisition unit configured to collect a signal from a pressure sensing element on the pressure monitoring tape;
a data processing unit configured to process the signal from the pressure sensing element; and
a local computer configured to determine a condition of the vacuum valve based on a pressure value obtained from the signal,
wherein the local computer determines whether the pressure value is within a predefined threshold value.
16. A vacuum valve monitoring system comprising:
a vacuum valve comprising at least one sealing O-ring;
a pressure monitoring tape disposed between a mating surface that is disposed on a wall of a vacuum processing chamber and a surface of the at least one sealing O-ring on the vacuum valve, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease;
a data acquisition unit configured to collect a respective plurality of signals from each of a respective plurality of pressure sensing elements on the pressure monitoring tape;
a data processing unit configured to process the respective plurality of signals from the respective plurality of pressure sensing elements; and
a local computer configured to determine a closing condition of the vacuum valve based on a plurality of pressure values,
wherein the plurality of pressure values comprises an average pressure value, a maximum pressure value, a minimum pressure value and a deviation of pressure values for the at least one sealing O-ring, wherein the local computer determines whether the one or more of the plurality of pressure values are within predefined threshold values.
16. The system of claim 15, wherein the pressure monitoring tape is flexible.
17. The system of claim 16, wherein the pressure monitoring tape is flexible.
17. The system of claim 15, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
18. The system of claim 16, wherein each of the plurality of pressure sensing elements comprises at least one of the following: capacitive, piezoresistive, and piezoelectric tactile sensors.
18. The system of claim 15, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
19. The system of claim 16, wherein each of the plurality of pressure sensing elements comprises a thin film sensor.
19. The system of claim 15, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
20. The system of claim 16, wherein the vacuum valve is configured to open and close a transfer port within the vacuum processing chamber.
Allowable Subject Matter
Claims 1-20 are rejected because of double patenting, but would be allowable if overcome double patenting rejection.
The following is a statement of reasons for the indication of allowable subject matter:
regarding independent claims:
The prior art of record documents, individually or in combination, fail to anticipate or render obvious a method/ a system for monitoring vacuum valve system comprising the pressure monitoring tape attached to a surface disposed between the at least one sealing O-ring and the surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease, in conjunction with the remaining claim limitations.
The closest prior art are:
“Eschenmoser”2, US20200056722A1
“Orthner”3, US 20110122419 A1
“Ales”4, US-20050092079-A1
” Corradi”5, 20130228712
“Lubomirsky”6, US 20090120368 A1
“Hillier”7, US 2360872 A
COOK8, JP 2017523809 A
“NAGAO”9, WO 2018159418 A1
ONODA, JP2017066488A
Galewski, US20070107523A1
Eschenmoser in Figs. 1-3 discloses:
A vacuum valve monitoring system, comprising:
a vacuum valve (Fig.1a/2a- valve 1 in open position and Fig.1b/2c shows it in a closed position) comprising at least one sealing O-ring (Fig1b- 10); and
a pressure monitoring (e.g. sensors 11a, 11b, 11c) attached to a surface of a vacuum processing chamber (e.g. ¶0024 and ¶0061- with element 2 in drawings showing the opening that the valve in attached to a surface of vacuum chamber is sealing the chamber), wherein the pressure monitoring (e.g.¶0074-¶0076 and ¶0022,¶0029, and ¶0061 and sensors 11a,11b,11c) is configured to perform a pressure (measuring) between the surface (the surface of the chamber in contact with valve plate where opening 2 is between chamber and valve plate) on the vacuum processing chamber and a surface of the at least one sealing O-ring (surface 6a, 6b, 4 of seal 10) on the vacuum valve (1) to determine a closing condition(e.g. ¶0022,¶0033, ¶0061, ¶0074-¶0076) of the vacuum valve (1).
Orthner teaches a pressure monitoring tape (pressure sensors 42/44) and profile mapping ( fig.7), wherein the pressure monitoring tape(42) comprises a plurality of pressure sensing elements (at least fig.4 plurality of pressure sensing elements 84/86).
Ales teaches a pressure monitoring tape (130 figs.7-8) and wherein the pressure monitoring tape(¶0038) comprises a plurality of pressure sensing elements (140/144).
Corradi in Figs. 2-6 teaches a pressure monitoring tape (pressure sensors 180) and profile mapping (¶0007, ¶0021-¶0022: measuring pressure in plurality of positions, different pressure in different positions), wherein the pressure monitoring tape comprises a plurality of pressure sensing elements (at least fig.5 plurality of pressure sensing elements 180).
Lubomirsky in fig. 2 teaches at least a portion of a surface of the at least one sealing O-ring (210) is coated with a film of grease (¶0029).
Hillier teaches at least a portion of a surface of the at least one sealing is coated with a film of low pressure grease (page 2, left column lines 30-35).
COOK teaches in figs. 43A/43B teaches a pressure sensitive adhesive tape attached to a surface 104 is disposed between the at least one sealing 106 and the surface 104, but the tape is not a sensing element.
NAGAO teaches a pressure sensing tape 100 attached to a sealing surface 27 but not between mating surface and sealing surface.
ONADA teaches a vacuum valve monitoring system, comprising: a vacuum valve 21; and a pressure monitoring 70 and tape (T) .
Galewski teaches a vacuum valve monitoring system, comprising: a vacuum chamber 400; and a pressure monitoring tape (406) .
Eschenmoser and listed prior art of record fail to teach the pressure monitoring tape attached to a mating surface is disposed between the at least one sealing O-ring and the mating surface, wherein at least a portion of a surface of the at least one sealing O-ring is coated with a film of low vapor pressure grease.
Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.”
Conclusion
Any inquiry concerning this communication or earlier communications from the examiner should be directed to Fatemeh E. Nia whose telephone number is (469)295-9187. The examiner can normally be reached 9:00 am to 4:00 pm.
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/FATEMEH ESFANDIARI NIA/Examiner, Art Unit 2855
1 Highlighted part of claim 1 “277” is teaching claim 3.
2 Prior art of record
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9 Prior art of record