Prosecution Insights
Last updated: October 04, 2026
Application No. 18/780,504

CONTACT STRUCTURE, CONTACT PAD LAYOUT AND STRUCTURE, MASK COMBINATION AND MANUFACTURING METHOD THEREOF

Non-Final OA §102
Filed
Jul 23, 2024
Priority
Sep 27, 2019 — CN 201910926986.8 +3 more
Examiner
PAGE, STEVEN MITCHELL CHR
Art Unit
Tech Center
Assignee
Fujian Jinhua Integrated Circuit Co., Ltd.
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
1m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
387 granted / 463 resolved
+23.6% vs TC avg
Moderate +9% lift
Without
With
+8.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
24 currently pending
Career history
477
Total Applications
across all art units

Statute-Specific Performance

§101
3.8%
-36.2% vs TC avg
§103
38.9%
-1.1% vs TC avg
§102
35.6%
-4.4% vs TC avg
§112
20.6%
-19.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 463 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-15 in the reply filed on 08/14/2026 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-2 and 5 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Nakamura et al. (US 6756262 B1, hereinafter Nakamura) With regards to claim 1, Nakamura discloses a semiconductor device, (FIG. 19) comprising: a substrate; (substrate 1) multiple core components (components comprising at least source/drain 17) formed in the substrate and comprising active areas; (See FIG. 19) multiple contact plugs (plugs 20) formed on the core components in an interlayer dielectric layer; (SiO film 16/21) multiple edge contact pads (pads 39) on parts of the contact plugs in the interlayer dielectric layer, wherein at least two of the contact plugs and the edge contact pads are integrally-formed; (see FIG. 19, showing layers integral to each other) and multiple capacitors (capacitors 45-49) formed on the interlayer dielectric layer, and parts of the capacitors with bottoms contacting the edge contact pads. (See FIG. 19) With regards to claim 2, Nakamura discloses the semiconductor device of claim 1, wherein the substrate comprises a core region (region comprising capacitors 45-49) with a boundary (region on the edge of the capacitors 45-49) and a central region, and the core components are formed in the core region, and a bottom of each of the contact plugs contacts the active area of the corresponding core component. (see FIG. 19, showing the contact) With regards to claim 5, Nakamura discloses a semiconductor device of claim 2, further comprising: multiple word lines, (word line WL) each of the word lines intersects the active areas in the core region; multiple bit lines, (bit line BL) wherein an extending direction of the bit lines is perpendicular to an extending direction of the word lines; (See FIGS. 1 -19) and wherein the edge contact pad crosses over at least one of the word lines. (see at least FIG. 19, where the pads 39 are over the word lines WL) Allowable Subject Matter Claims 7-15 are allowed. Claims 3-4 and 6 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Han et al. (US 8928092 B2) – memory device Any inquiry concerning this communication or earlier communications from the examiner should be directed to STEVEN M Page whose telephone number is (571)272-3249. The examiner can normally be reached M-F: 10:00AM-6:00PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Christine S. Kim can be reached at 571-272-8548. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /STEVEN M PAGE/Primary Patent Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jul 23, 2024
Application Filed
Aug 27, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12751001
SEMICONDUCTOR DEVICE, MEMORY SYSTEM AND FABRICATION METHOD OF A SEMICONDUCTOR DEVICE
3y 2m to grant Granted Sep 29, 2026
Patent 12751092
ELECTROSTATIC DISCHARGE (ESD) PROTECTION DEVICE
3y 0m to grant Granted Sep 29, 2026
Patent 12751251
METHOD OF MANUFACTURING LAMINATED ASSEMBLY
2y 4m to grant Granted Sep 29, 2026
Patent 12745386
SEMICONDUCTOR APPARATUS HAVING MULTI-LAYERED BIT LINE CONTACT AND MANUFACTURING METHOD OF THE SAME
3y 2m to grant Granted Sep 22, 2026
Patent 12745484
QUANTUM DEVICE FOR FORMING AN ARRAY OF QUANTUM DOTS AND ASSOCIATED MANUFACTURING METHOD
2y 9m to grant Granted Sep 22, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
92%
With Interview (+8.7%)
2y 3m (~1m remaining)
Median Time to Grant
Low
PTA Risk
Based on 463 resolved cases by this examiner. Grant probability derived from career allowance rate.

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