Prosecution Insights
Last updated: October 23, 2026
Application No. 18/780,735

FLEXIBLE ACTIVE REGION FOR STACKED FETS

Non-Final OA §102
Filed
Jul 23, 2024
Examiner
TRAN, TAN N
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
International Business Machines Corporation
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
980 granted / 1128 resolved
+18.9% vs TC avg
Moderate +10% lift
Without
With
+9.9%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
36 currently pending
Career history
1168
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
50.2%
+10.2% vs TC avg
§102
34.0%
-6.0% vs TC avg
§112
7.7%
-32.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1128 resolved cases

Office Action

§102
DETAILED ACTION Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1 - 8 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Yamazaki et al. (7982250). With regard to claim 1, Yamazaki et al. disclose a semiconductor device (for example, see fig. 2A), comprising: a stacked transistor structure having field effect transistors (for example, transistors 210, 231) on at least two levels (referred to as “A1” and “A2” by examiner’s annotation shown in fig. 2A below); active regions (119, 208a, 208b, 216, 220a, 220b wherein the regions 208b, 220a are annotated below) longitudinally disposed on each of the at least two levels (A1, A2), the active regions (119, 208a, 208b, 216, 220a, 220b) including source/drain regions (208a, 208b, 220a, 220b) and channel regions (119, 216); at least one active region (216, 220a, 220b; 119, 208a, 208b; or 208a, 220b) of the active regions (119, 208a, 208b, 216, 220a, 220b) includes a transition region (referred to as “216A1” by examiner’s annotation shown in fig. 2A below; wherein the transition region 216A1 is a portion of the channel region 216) wherein longitudinal portions (220b, 220a; or 208a, 208b; or 208a, 220b) of the at least one active region (216, 220a, 220b; or 208a, 208b, 119) are laterally offset within a same level (for example, a same level A1, A2) by the transition region (216A1 or 119) to provide an offset space (referred to as “S1” by examiner’s annotation shown in fig. 2A below); and the offset space (S1) including a vertical interconnect (referred to as “S1” by examiner’s annotation shown in fig. 2A below). PNG media_image1.png 610 840 media_image1.png Greyscale With regard to claim 2, Yamazaki et al. disclose the transition region (216A1) is disposed within a channel region (referred to as “216B1” by examiner’s annotation shown in fig. 2A below) of the channel regions (referred to as “216B1 “216B2” by examiner’s annotation shown in fig. 2A below). PNG media_image2.png 606 846 media_image2.png Greyscale With regard to claim 3, Yamazaki et al. disclose the vertical interconnect (240A1) includes a middle (referred to as “240A2” by examiner’s annotation shown in fig. 2A below) of the line contact (referred to as “240A3” by examiner’s annotation shown in fig. 2A below). PNG media_image3.png 610 844 media_image3.png Greyscale With regard to claim 4, Yamazaki et al. disclose the vertical interconnect (240A1) includes a backside contact (referred to as “240A4” by examiner’s annotation shown in fig. 2A below). PNG media_image4.png 602 841 media_image4.png Greyscale With regard to claim 5, Yamazaki et al. disclose the longitudinal portions (220a, 220b) of the at least one active region (220a, 216, 220b) are laterally offset from a longitudinal portion (208b) of a different level. With regard to claim 6, Yamazaki et al. disclose a plurality of transition regions (first and second channel regions 216B1, 216B2 function as transition regions) along a same active region (220a, 216, 220b). With regard to claim 7, Yamazaki et al. disclose a plurality of transition regions (first and second channel regions 216B1, 216B2 function as transition regions) within active regions (216A1, 216B1, 216B2) of a same level (A2) of the at least two levels (A1, A2). With regard to claim 8, Yamazaki et al. disclose a plurality of transition regions (first and second channel regions 216B1, 216B2 function as transition regions and regions 119A1, 119A2 as annotated in fig. 2A below) within the active regions at different levels (A1, A2) of the at least two levels (A1, A2). PNG media_image5.png 614 852 media_image5.png Greyscale Allowable Subject Matter 3. Claims 9 - 17 are allowable over the prior art of record because none of these references disclose or can be combined to yield the claimed invention such as a transition region along at least one of the second active regions to provide an offset between at least one active region in the second level and a corresponding active region in the first level, the transition region bending the at least one active region in the second level to provide an offset space; and a vertical interconnect disposed in the offset space as recited in claim 9. 4. Claims 18 - 20 are allowable over the prior art of record because none of these references disclose or can be combined to yield the claimed invention such as a transition region along at least one of the second active regions to provide an offset between at least one active region in the second level and a corresponding active region in an adjacent level, the transition region bending the at least one active region in the second level to provide an offset space; and a vertical interconnect disposed in the offset space as recited in claim 18. Conclusion 5. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TAN N TRAN whose telephone number is (571) 272 - 1923. The examiner can normally be reached on 8:30-5:00PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached on (571) 272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TAN N TRAN/ Primary Examiner, Art Unit 2812
Read full office action

Prosecution Timeline

Jul 23, 2024
Application Filed
Sep 17, 2026
Non-Final Rejection mailed — §102
Oct 19, 2026
Interview Requested

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
97%
With Interview (+9.9%)
2y 1m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1128 resolved cases by this examiner. Grant probability derived from career allowance rate.

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