Prosecution Insights
Last updated: August 15, 2026
Application No. 18/781,998

Chip with Top Metal Pad Pitch Adjustment

Non-Final OA §102
Filed
Jul 23, 2024
Priority
Sep 19, 2023 — provisional 63/539,327
Examiner
MENZ, LAURA MARY
Art Unit
Tech Center
Assignee
Tenstorrent AI Ulc
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
4m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allowance Rate
828 granted / 946 resolved
+27.5% vs TC avg
Moderate +9% lift
Without
With
+8.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
37 currently pending
Career history
975
Total Applications
across all art units

Statute-Specific Performance

§101
3.1%
-36.9% vs TC avg
§103
27.4%
-12.6% vs TC avg
§102
40.1%
+0.1% vs TC avg
§112
7.5%
-32.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 946 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Species 2 in the reply filed on 7/15/26 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 12-20 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Cheng et al (US 2023/0026676). 12. A method comprising: forming a first set of devices (Fig.2 (228) and [0034]) of a first integrated circuit (Fig.2 (108) and [0034]); forming a first set of internal connections (Fig.2 (206d) and [0034]) of the first integrated circuit (Fig.2 (108) and [0034]) that are coupled to the first set of devices (Fig.2 (228) and [0034]) of the first integrated circuit (Fig.2 (108) and [0034]); selecting a first set of masks from a library of sets of masks based at least in part on a first set of external connections (Fig.2 (210d pad and bump) and [0034]/see also[0102-0104-note solder masks sizing based upon bump size]; forming a first set of metal wiring layers (Fig.2 (214d/210d pad) and [100]) of the first integrated circuit (Fig.2 (108) and [0034]) using the first set of masks (Fig.2 (210d pad and bump) and [0034]/see also [0102-0104-note solder masks sizing based upon bump size]; forming a second set of devices (Fig.2 (218) and [0032]) of a second integrated circuit (Fig.2 (104) and [0032]), wherein the second set of devices (Fig.2 (218) and [0032]) is in a same configuration (Fig.2 (218/228) as a configuration of the first set of devices (Fig.2 (228) and [0034]); forming a second set of internal connections (Fig.2 (206b) and [0032]) of the second integrated circuit (Fig.2 (104) and [0032]) that are coupled to the second set of devices (Fig.2 (218) and [0032]) of the second integrated circuit (Fig.2 (104) and [0032]); selecting a second set of masks from the library of sets of masks based at least in part on a second set of external connections (Fig.2 (210b pad and bump) and [0032]/see also[0102-0104-note solder masks sizing based upon bump size], wherein the second set of masks is different than the first set of masks [0102-0104-note solder masks sizing based upon bump size] and the second set of external connections (Fig.2 (210b pad and bump) and [0032]) has a different configuration than a configuration of the first set of external connections (Fig.2 (210d pad and bump) and [0034]); and forming a second set of metal wiring layers (Fig.2 (214b) and [0032]) of the second integrated circuit (Fig.2 (104) and [0032]) using the second set of masks [0102-0104-note solder masks sizing based upon bump size], wherein the second integrated circuit (Fig.2 (104) and [0032]) has a configuration that is different than a configuration of the first set of metal wiring layers (Fig.2 (214d/210d pad) and [100]). 13. The method of claim 12, further comprising: coupling the first set of external connections (Fig.2 (210d pad and bump) and [0034] ) of the first integrated circuit (Fig.2 (108) and [0034]) to the first set of internal connections (Fig.2 (206d) and [0034]) via the first set of metal wiring layers (Fig.2 (214d/210d pad) and [100]); and coupling the second set of external connections (Fig.2 (210b pad and bump) and [0032]) of the second integrated circuit (Fig.2 (104) and [0032]) to the second set of internal connections (Fig.2 (206b) and [0032])via the second set of metal wiring layers (Fig.2 (214b) and [0032]). 14. The method of claim 13, wherein forming the first set of metal wiring layers (Fig.2 (214d/210d pad) and [100]) comprises leaving a subset of the first set of internal connections (Fig.2 (206d) and [0034]) uncoupled from the first set of external connections (Fig.2 (210d pad and bump) and [0034] ) in a first metal wiring configuration (Fig.2 (214d/210d pad) and [100]). 15. The method of claim 14, wherein forming the second set of metal wiring layers (Fig.2 (214b) and [0032]) comprises leaving a subset of the second set of internal connections (Fig.2 (206b) and [0032]) uncoupled from the second set of external connections (Fig.2 (210b pad and bump) and [0032]) in a second metal wiring configuration (Fig.2 (214b) and [0032]), a quantity of the subset of the first set of internal connections (Fig.2 (206d) and [0034]) uncoupled from the first set of external connections (Fig.2 (210d pad and bump) and [0034] ) being different than a quantity of the subset of the second set of internal connections (Fig.2 (206b) and [0032]) uncoupled from the second set of external connections (Fig.2 (210b pad and bump) and [0032]). 16. The method of claim 12, wherein: the first set of external connections (Fig.2 (210d pad and bump) and [0034] ) is associated with a first package (Fig.1 (108)); and the second set of external connections (Fig.2 (210b pad and bump) and [0032]) is associated with a second package (Fig.1 (104)). 17. The method of claim 16, wherein: the first package (Fig.1 (108)) is different than the second package (Fig.1 (104)). 18. The method of claim 12, wherein: the first set of external connections (Fig.2 (210d pad and bump) and [0034] ) are one of solder balls, bumps, pillars, leads; and the second set of external connections (Fig.2 (210b pad and bump) and [0032]) are one of solder balls, bumps, pillars, leads. 19. The method of claim 12, wherein: the first (Fig.2 (108) and [0034]) and second integrated circuits (Fig.2 (104) and [0032- chiplets]) are chiplets; and the first and second sets of devices (Fig.2 (228/218) and [0034/0032- transistors]) are transistors. 20. The method of claim 12, wherein: the first set of internal connections (Fig.2 (206d) and [0034]) are associated with a first pitch(Fig.2 (206d) and [0034]), the second set of internal connections (Fig.2 (206b) and [0032]) are associated with a second pitch (Fig.2 (206b) and [0032]), the first set of external connections (Fig.2 (210d pad and bump) and [0034]) are associated with a third pitch, and the second set of external connections (Fig.2 (210b pad and bump) and [0032]) are associated with a fourth pitch (Fig.2 (210b pad and bump) and [0032]); the first pitch (Fig.2 (206d) and [0034]) is different than the third pitch (Fig.2 (210d pad and bump) and [0034]); the second pitch (Fig.2 (206b) and [0032]) is different than the fourth pitch (Fig.2 (210b pad and bump) and [0032]); and the third pitch (Fig.2 (210d pad and bump) and [0034]) is different than the fourth pitch (Fig.2 (210b pad and bump) and [0032]). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Wang et al (US 9099999); Chen et al (US 20070145367) and Martorelli et al (US 11233002) teach similar IC package structures having devices with internal and external directions. Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAURA M MENZ whose telephone number is (571)272-1697. The examiner can normally be reached Monday-Friday 7:00-3:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Steven Gauthier can be reached at 571-270-0373. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAURA M MENZ/Primary Examiner, Art Unit 2813 7/25/26
Read full office action

Prosecution Timeline

Jul 23, 2024
Application Filed
Jul 29, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
96%
With Interview (+8.7%)
2y 5m (~4m remaining)
Median Time to Grant
Low
PTA Risk
Based on 946 resolved cases by this examiner. Grant probability derived from career allowance rate.

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