Prosecution Insights
Last updated: May 29, 2026
Application No. 18/794,557

ENHANCED CHLORIDE SELECTIVE MEMBRANE

Non-Final OA §101§112
Filed
Aug 05, 2024
Priority
May 18, 2015 — provisional 62/162,843 +5 more
Examiner
KAUR, GURPREET
Art Unit
1759
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Siemens Healthcare
OA Round
1 (Non-Final)
65%
Grant Probability
Moderate
1-2
OA Rounds
1y 7m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 65% of resolved cases
65%
Career Allowance Rate
501 granted / 773 resolved
At TC average
Strong +36% interview lift
Without
With
+36.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
23 currently pending
Career history
797
Total Applications
across all art units

Statute-Specific Performance

§101
1.5%
-38.5% vs TC avg
§103
79.5%
+39.5% vs TC avg
§102
5.8%
-34.2% vs TC avg
§112
5.5%
-34.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 773 resolved cases

Office Action

§101 §112
DETAILED ACTION Status of the Claims 1. Claims 1-20 are pending. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. 2. Claim 8 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 8 recites the limitation "the inert substrate" in line 1. There is insufficient antecedent basis for this limitation in the claim. Double Patenting 3. The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-8 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-8 of U.S. Patent No. 11,747,297 (hereinafter ‘297). Although the claims at issue are not identical, they are not patentably distinct from each other because ‘297 teach a chloride selective electrode that detects chloride in multiple biological samples comprising a chloride selective membrane, wherein the chloride selective membrane is provided with a plurality of quaternary functional groups, and wherein the chloride selective membrane comprises: an epoxide-based matrix comprising an epoxy resin having a predetermined number of epoxide groups per molecule; a mixture of an amino compound and an activator dispensed onto a surface of the epoxide-based matrix, wherein the amino compound and activator are present in the mixture in a stoichiometric amount relative to the number of epoxide groups in the epoxide-based matrix, and wherein the stoichiometric amount is in a range of from about 0.5:1 to about 1.5:1, and wherein the mixture comprises reactive species; and wherein the chloride selective membrane is stable for at least 14 days upon exposure to at least one biological sample (see claim 1). Claims 2-8 (see claims 2-8). Claims 13-19 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-7 of U.S. Patent No. 11,293,892 (hereinafter ‘892). Although the claims at issue are not identical, they are not patentably distinct from each other because ‘892 teach process for forming a chloride sensitive membrane of a chloride selective electrode that detects chloride in at least one biological sample, the process comprising the steps of: forming a layer of an epoxide-based matrix, wherein the epoxide-based matrix comprises an epoxy resin having a predetermined number of epoxide groups per molecule; separately combining an amino compound and an activator to form a mixture and allowing the amino compound and the activator to react and produce reactive species prior to contact with the epoxide-based matrix, wherein the amino compound and activator are combined in a stoichiometric amount relative to the number of epoxide groups in the epoxide-based matrix, and wherein the stoichiometric amount is in a range of from about 0.5:1 to about 1.5:1; and dispensing the mixture containing the reactive species onto a surface of the epoxide-based matrix to form the chloride selective membrane, wherein the membrane is provided with a plurality of quaternary functional groups; and wherein the chloride selective membrane is stable for at least 14 days upon exposure to multiple biological sample which would read on at least one biological sample as claimed. Claims 14-19 (see claims 2-7). Claims 9-12 and 20 are rejected under 35 U.S.C. 101 for being dependent on claims 1 and 13 respectively. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Treybig et al. (US 5,057,557) teach epoxy resin modified with an acidified polytertiary amine-containing compound in a suitable solvent such as toluene or xylene (see abstract and col. 5, ll. 53-60 over to col. 6, ll. 27-27). Any inquiry concerning this communication or earlier communications from the examiner should be directed to GURPREET KAUR whose telephone number is (571)270-7895. The examiner can normally be reached M-F 9:30-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Curtis Mayes can be reached at 571-272-1234. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /GURPREET KAUR/ Primary Examiner Art Unit 1759
Read full office action

Prosecution Timeline

Aug 05, 2024
Application Filed
Mar 10, 2026
Non-Final Rejection mailed — §101, §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
65%
Grant Probability
99%
With Interview (+36.5%)
3y 5m (~1y 7m remaining)
Median Time to Grant
Low
PTA Risk
Based on 773 resolved cases by this examiner. Grant probability derived from career allowance rate.

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