Prosecution Insights
Last updated: October 01, 2026
Application No. 18/813,003

ELECTRONIC DEVICE AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

Non-Final OA §102§103
Filed
Aug 22, 2024
Priority
Sep 27, 2023 — CN 202311255557.5
Examiner
ENAD, CHRISTINE A
Art Unit
Tech Center
Assignee
Innolux Corporation
OA Round
1 (Non-Final)
84%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 84% — above average
84%
Career Allowance Rate
1149 granted / 1361 resolved
+24.4% vs TC avg
Moderate +10% lift
Without
With
+10.3%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 12m
Avg Prosecution
28 currently pending
Career history
1398
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
64.5%
+24.5% vs TC avg
§102
19.3%
-20.7% vs TC avg
§112
8.1%
-31.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1361 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 14 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Ro et al (US Publication No. 2014/0346496). Regarding claim 14, Ro discloses a manufacturing method of an electronic device, comprising: providing a substrate Fig 2, 100; forming a circuit layer Fig 1 and Fig 2 on the substrate; forming a light filtering layer Fig 2, 230 on the circuit layer Fig 1 and Fig 2; forming an organic insulating layer Fig 2, 235 on the light filtering layer Fig 2, 230; forming a first via Fig 3I in the organic insulating layer; forming a second via Fig 3F in the light filtering layer Fig 2, 230, wherein the second via is corresponding to the first via; and forming a transparent conductive layer electrically connected to the circuit layer through the first via and the second via Fig 2, wherein the first via has a first sidewall, the second via has a second sidewall Fig 2, the first sidewall and the second sidewall are not continuous, and a width of the second via is less than a width of the first via Fig 2, 230. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1, 3-5, 12-13, 15, 20 are rejected under 35 U.S.C. 103 as being unpatentable over Ro et al (US Publication No. 2014/0346496) in view of Chen et al (US Publication No. 2022/0302180). Regarding claim 1, Ro discloses a method of manufacturing and an electronic device, comprising: a substrate Fig 2, 100; a circuit layer Fig 1 and Fig 2 disposed on the substrate Fig 2, 100; a light filtering layer Fig 2, 230 disposed on the circuit layer and having a first via Fig 3F; an organic insulating layer Fig 2, 235 disposed on the light filtering layer Fig 2, 230 and having a second via Fig 3I, wherein the second via is corresponding to the first via Fig 3I; and a transparent conductive layer Fig 2, 271 ¶ 0066 electrically connected to the circuit layer through the first via and the second via Fig 2, wherein the first via has a first sidewall Fig 2, the second via has a second sidewall Fig 2, the first sidewall and the second sidewall are not continuous Fig 2. Ro discloses all the limitations but silent on the width of the second via to be less than the first via. Whereas Chen discloses wherein the first via has a first sidewall Fig 9, the second via has a second sidewall Fig 9, and a width of the second via is less than a width of the first via Fig 9.Therefore it would have been obvious to one having ordinary skill of the art before the effective filing date of the claimed invention to modify the via arrangement and incorporate the teachings of Chen to improve device connectivity and it would have been an obvious matter of design choice to (modification), since such a modification would have involved a mere change in the size of a component. A change in size is generally recognized as being within the level of ordinary skill in the art. In re Rose, 220 F.2d 459, 105 USPQ 237 (CCPA 1995). Regarding claim 3, Chen discloses wherein the light filtering layer comprises a first light filtering element, a second light filtering element and a third light filtering element of different colors ¶0034. Regarding claim 4, Chen discloses wherein the first via is formed in the first light filtering element, the second light filtering element and the third light filtering element Fig 9¶0034. Regarding claim 5, Chen discloses wherein the light filtering layer has a plurality of the first vias respectively corresponding to the first light filtering element, the second light filtering element and the third light filtering element Fig 9-12. Regarding claim 12, Ro discloses wherein the first sidewall and the second sidewall form a staircase-shaped sidewall Fig 4. Regarding claim 13, Chen discloses wherein the transparent conductive layer directly contacts the first sidewall and the second sidewall Fig 9. Regarding claim 15, Chen discloses wherein the transparent conductive layer directly contacts the first sidewall and the second sidewall Fig 9. Regarding claim 20, Chen discloses wherein the second via is formed through an etching process ¶0010. Allowable Subject Matter Claims 2, 6-11, 16-19 objected to as being dependent upon a rejected base claim but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to CHRISTINE A ENAD whose telephone number is (571)270-7891. The examiner can normally be reached Monday-Friday, 7:30 am -4:30 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Lynne Gurley can be reached at 571 272 1670. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /CHRISTINE A ENAD/Primary Examiner, Art Unit 2811
Read full office action

Prosecution Timeline

Aug 22, 2024
Application Filed
Aug 25, 2026
Non-Final Rejection mailed — §102, §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
84%
Grant Probability
95%
With Interview (+10.3%)
1y 12m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1361 resolved cases by this examiner. Grant probability derived from career allowance rate.

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