Prosecution Insights
Last updated: October 02, 2026

Examiner: ENAD, CHRISTINE A

Tech Center 2800 • Art Units: 2811 2823

This examiner grants 84% of resolved cases

Analysis

Christine A. Enad has a high volume of 1361 resolved cases in Tech Center 2800 and Art Unit 2811. Her allowance rate is 84.4 percent, which indicates a high frequency of successful outcomes for applicants. The median time to allowance is 727 days, suggesting efficient processing of applications. This 727 days figure is relatively low, pointing to a faster path to grant than many other examiners.

The interview lift for this examiner is 10.3 percent. While the baseline allowance rate is already high at 84.4 percent, the data indicates that conducting an interview still provides a measurable benefit. This 10.3 percent lift can be a useful tool for finalizing the few cases that do not immediately reach allowance. With 1361 resolved cases, the 84.4 percent allowance rate is a robust indicator of the examiner's tendency to grant patents, and the 10.3 percent lift offers a clear strategy for further improving those odds. The 727 days median pendency is a positive factor for applicants.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

84.4%
Allow Rate
+16.4% vs TC avg
1,398
Total Applications
+10.3%
Interview Lift
727
Avg Prosecution Days
Based on 1361 resolved cases, 2023–2026

Rejection Statute Breakdown

1.7%
§101 Eligibility
19.3%
§102 Novelty
64.5%
§103 Obviousness
8.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18777722 SEMICONDUCTOR DEVICES Non-Final OA Samsung Electronics Co., Ltd.
18437236 SEMICONDUCTOR PACKAGE INCLUDING A PLURALITY OF SEMICONDUCTOR CHIPS Final Rejection SAMSUNG ELECTRONICS CO., LTD.
18683690 DISPLAYING BASE BOARD AND DISPLAYING DEVICE Non-Final OA BOE Technology Group Co., Ltd.
18888991 DISPLAY DEVICE Non-Final OA Samsung Display Co., Ltd.
18663651 LIGHT-EMITTING DEVICE, PLANAR LIGHT SOURCE, AND LIQUID CRYSTAL DISPLAY DEVICE Non-Final OA NICHIA CORPORATION
18813003 ELECTRONIC DEVICE AND MANUFACTURING METHOD OF ELECTRONIC DEVICE Non-Final OA InnoLux Corporation
18644445 SENSING DEVICE Non-Final OA InnoLux Corporation
18651878 SEMICONDUCTOR DEVICE, COMMUNICATION APPARATUS, AND IMAGE CAPTURING SYSTEM Non-Final OA CANON KABUSHIKI KAISHA
18472074 TRANSISTOR DEVICES WITH DOUBLE-SIDE CONTACTS AND STANDARD CELL Non-Final OA QUALCOMM Incorporated
17951532 MULTI-STAGE MASK ETCH PROCESS Final Rejection Intel Corporation
18700432 VIAS INCLUDING A POROUS ELECTRICALLY CONDUCTIVE MATERIAL AND METHODS FOR FABRICATING THE VIAS Non-Final OA CORNING INCORPORATED
18529029 STACKED TRANSISTORS HAVING DUAL WORK FUNCTION GATES Non-Final OA International Business Machines Corporation
17847679 PROCESS FOR MANUFACTURING A VERTICAL CONDUCTION SILICON CARBIDE ELECTRONIC DEVICE AND VERTICAL CONDUCTION SILICON CARBIDE ELECTRONIC DEVICE Non-Final OA STMicroelectronics S.r.l.
18589527 DAMAGE PREVENTION DURING WAFER EDGE TRIMMING Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18227731 CONTACT STRUCTURES IN SEMICONDUCTOR DEVICES Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
18348064 SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING Final Rejection Taiwan Semiconductor Manufacturing Company, Ltd.
17897151 SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME Final Rejection TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18526498 THROUGH VIAS AND GUARD RINGS OF SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THEREOF Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18355258 CONTACT PLUG STRUCTURES OF SEMICONDUCTOR DEVICE AND METHODS OF FORMING SAME Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
17896970 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18457368 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MODULE Final Rejection ROHM CO., LTD.
18584075 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF Non-Final OA NANYA TECHNOLOGY CORPORATION
18255516 METALLIZATION OF SEMICONDUCTOR WAFER Non-Final OA Heraeus Deutschland GmbH & Co. KG
18545601 HYBRID THERMAL INTERFACE MATERIAL WITH EMBEDDED METAL LAYER Final Rejection Sandisk Technologies, Inc.
18405172 SEMICONDUCTOR PACKAGE STRUCTURE Final Rejection MediaTek Singapore Pte. Ltd.
18080688 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME Non-Final OA UNITED MICROELECTRONICS CORP.
18650805 SEMICONDUCTOR DEVICE WITH DECREASED SOURCE AND DRAIN RESISTANCE AND MANUFACTURING METHOD Non-Final OA INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

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