Prosecution Insights
Last updated: October 02, 2026
Application No. 18/822,687

ELECTRONIC DEVICE

Non-Final OA §102
Filed
Sep 03, 2024
Priority
Oct 24, 2018 — continuation of 16/169,098 +2 more
Examiner
MOJADDEDI, OMAR F
Art Unit
Tech Center
Assignee
Innolux Corporation
OA Round
1 (Non-Final)
89%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allowance Rate
481 granted / 538 resolved
+29.4% vs TC avg
Moderate +10% lift
Without
With
+10.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
63 currently pending
Career history
579
Total Applications
across all art units

Statute-Specific Performance

§101
2.0%
-38.0% vs TC avg
§103
53.8%
+13.8% vs TC avg
§102
25.9%
-14.1% vs TC avg
§112
17.8%
-22.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 538 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Status of Claims 1. Applicant's submittal of claims 1-5 in the “Claims” filed on 09/03/2024 is acknowledged and entered by the Examiner. This office action considers claims 1-5 pending for prosecution. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Notes: when present, semicolon separated fields within the parenthesis (; ;) represent, for example, as (100; Fig 3A; [0063]) = (element 100; Figure No. 3A; Paragraph No. [0063]). For brevity, the texts “Element”, “Figure No.” and “Paragraph No.” shall be excluded, though; additional clarification notes may be added within each field. The number of fields may be fewer or more than three indicated above. These conventions are used throughout this document. 2. Claims 1-5 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Kashiwabara et al. (US 20180197923 A1; hereinafter Kashiwabara). Regarding claim 1, Kashiwabara teaches a system (see the entire document, specifically Fig. 5; [0163+], and as cited below), comprising: a substrate (111; Fig. 3; [0099]); a first electronic unit (130R; [0099]) disposed on the substrate (111); a second electronic unit (130B; [0099]) disposed on the substrate (111) and adjacent to the first electronic unit (130R; [0099]); a first buffer layer (120; [0099]; see Fig. 3; portion of layer 120 formed over 130R; see [0108], where layer 120 is a passivation film made of a light transmissible dielectric material such as silicon oxide (SiO.sub.2) and silicon nitride (SiN); see [0031] of the “Specification” of the instant disclosure where it states that the material of the buffer layers may include silicon nitride or silicon oxide; thus, it is construed that layer 120 is a buffer layer) disposed on the first electronic unit (130R) and having a first curved bottom surface (curved surface of 120 over 130R; see Fig. 3); and a second buffer layer (120; [0099]; see Fig. 3; portion of layer 120 formed over 130B; see [0108], where layer 120 is a passivation film made of a light transmissible dielectric material such as silicon oxide (SiO.sub.2) and silicon nitride (SiN); see [0031] of the “Specification” of the instant disclosure where it states that the material of the buffer layers may include silicon nitride or silicon oxide; thus, it is construed that layer 120 is a buffer layer) disposed on the second electronic unit (130B) and having a second curved bottom surface (curved surface of 120 over 130B; see Fig. 3), wherein a width of the first curved bottom surface (width of curved surface of 120 over 130R; see Fig. 3) is different from a width of the second curved bottom surface (width curved surface of 120 over 130B; see Fig. 3). Regarding claim 2, Kashiwabara teaches all of the features of claim 1. Kashiwabara further teaches wherein a width of the first electronic unit (130R; see Fig. 3; [0099]) is different from a width of the second electronic unit (130B; see Fig. 3; [0099]). Regarding claim 3, Kashiwabara teaches all of the features of claim 1. Kashiwabara further teaches wherein a first curvature of the first curved bottom (curved surface of 120 over 130R; see Fig. 3) surface is different from a second curvature of the second curved bottom surface (curved surface of 120 over 130B; see Fig. 3) Regarding claim 4, Kashiwabara teaches all of the features of claim 3. Kashiwabara further teaches wherein the width of the first curved bottom surface (width of curved surface of 120 over 130R; see Fig. 3) is less than the width of the second curved bottom surface (width of curved surface of 120 over 130B; see Fig. 3), and the second curvature (curved surface of 120 over 130B; see Fig. 3) is less than the first curvature (width of curved surface of 120 over 130R; see Fig. 3). Regarding claim 5, Kashiwabara teaches all of the features of claim 1. Kashiwabara further comprising an insulating layer (117; Fig. 3; [0099, 0107]), wherein the first electronic unit (130R; [0099]) and the second electronic (130B; [0099]) unit are surrounded by the insulating layer (117; Fig. 3; [0099, 0107]). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to Omar Mojaddedi whose telephone number is 313-446-6582. The examiner can normally be reached on Monday – Friday, 8:00 a.m. to 4:00 p.m.. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Julio J. Maldonado, can be reached on 571-272-1864. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /OMAR F MOJADDEDI/Examiner, Art Unit 2898
Read full office action

Prosecution Timeline

Sep 03, 2024
Application Filed
Sep 16, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12745424
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
3y 7m to grant Granted Sep 22, 2026
Patent 12745529
DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE
3y 0m to grant Granted Sep 22, 2026
Patent 12745495
DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
2y 11m to grant Granted Sep 22, 2026
Patent 12740422
ELECTRONIC DEVICE
4y 1m to grant Granted Sep 15, 2026
Patent 12740187
Light emitting device and apparatus having the same
2y 11m to grant Granted Sep 15, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
89%
Grant Probability
99%
With Interview (+10.4%)
2y 4m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 538 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month