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The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Double Patenting
The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969).
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Claims 1-13, 15-19 rejected on the ground of non-statutory double patenting as being unpatentable over claims 1-17 of U.S. Patent No. US12087544 B2. Although the claims at issue are not identical, they are not patentably distinct from each other because they represent the same assignee, same authors, same invention and identical limitations. Except for the limitation of process areas rest of the limitations are identical. However, process areas has been recited as process chambers in the issued patent.
US18828021 Application claim obvious
Over US Patent US12087544 claim
1. A plasma generator for the pulsed provision of electrical power having a frequency of at least 40 KHz to at least two process areas, the plasma generator comprising: a control unit configured to obtain and evaluate process data about processes in the at least two process areas; a controllable power supply having an output, the controllable power supply configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit; and a switching unit having a first input connected to the output of the power supply, and having at least two switching unit outputs for respective connection to one of the at least two process areas; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 KHz as an output signal and to selectively output the output signal as a pulse for a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit; wherein the control unit is configured to coordinate power requirements of the at least two process areas and to drive the power supply and the switching unit such that at the respective switching unit outputs communicating with the process areas, the power corresponding to the power requirements is provided as pulses over a period of time, wherein the pulses of the respective process areas are temporally offset from each other such that the process areas can be operated simultaneously; and wherein the control unit is configured to shift pulses or portions thereof in time with respect to the power requirements if the power requirements would lead to an overlapping of pulses at different outputs, wherein a respective time shift is selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time.
1. A plasma generator for the pulsed provision of electrical power having a frequency of at least 40 KHz to at least two process chambers, the plasma generator comprising: a control unit configured to obtain and evaluate process data about processes in the at least two process chambers; a controllable power supply having an output, the controllable power supply configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit; and a switching unit having a first input connected to the output of the power supply, and having at least two switching unit outputs for respective connection to one of the at least two process chambers; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 KHz as an output signal and to selectively output the output signal as a pulse for a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit; wherein the control unit is configured to coordinate power requirements of the at least two process chambers and to drive the power supply and the switching unit such that at the respective switching unit outputs communicating with the process chambers, the power corresponding to the power requirements is provided as pulses over a period of time, wherein the pulses of the respective process chambers are temporally offset from each other such that the process chambers can be operated simultaneously; and wherein the control unit is configured to shift pulses or portions thereof in time with respect to the power requirements if the power requirements would lead to an overlapping of pulses at different outputs, wherein a respective time shift is selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time.
2. The plasma generator according to claim 1, wherein the control unit has a number of controllers corresponding to the number of process units to be connected to the switching unit, each controller being configured to obtain process data on processes in a respective one of the process areas, each controller being in connected to the power supply and/or the switch to drive the same in response to the received process data.
2. The plasma generator according to claim 1, wherein the control unit has a number of controllers corresponding to the number of process units to be connected to the switching unit, each controller being configured to obtain process data on processes in a respective one of the process chambers, each controller being in connected to the power supply and/or the switch to drive the same in response to the received process data.
3. The plasma generator according to claim 1, further comprising at least one arc suppression unit configured to obtain and evaluate in real time current process data on processes in the at least two process areas and current data of the power supply and/or the switch to detect an arc or an impending arc, wherein the arc suppression unit being in communication with the power supply and/or the switch to drive the same, if needed, in response to the detection of an arc or an impending arc, wherein the arc suppression unit may form part of the control unit.
3. The plasma generator according to claim 1, further comprising at least one arc suppression unit configured to obtain and evaluate in real time current process data on processes in the at least two process chambers and current data of the power supply and/or the switch to detect an arc or an impending arc, wherein the arc suppression unit being in communication with the power supply and/or the switch to drive the same, if needed, in response to the detection of an arc or an impending arc, wherein the arc suppression unit may form part of the control unit.
4. The plasma generator according to claim 1, wherein the controllers and/or the at least one arc suppression unit are formed as separate software modules executable on a common processor or on separate processors of the plasma generator.
4. The plasma generator according to claim 1, wherein the controllers and/or the at least one arc suppression unit are formed as separate software modules executable on a common processor or on separate processors of the plasma generator.
5. The plasma generator according to claim 1, wherein the switching unit has at least one third switching unit output configured for connection to at least one further process area or absorber, and wherein the switching unit is configured to, in response to an incoming control signal from the control unit, apply the output signal as a pulse selectively to a respective one of the switching unit outputs for a predetermined pulse duration.
5. The plasma generator according to claim 1, wherein the switching unit has at least one third switching unit output configured for connection to at least one further process chamber or absorber, and wherein the switching unit is configured to, in response to an incoming control signal from the control unit, apply the output signal as a pulse selectively to a respective one of the switching unit outputs for a predetermined pulse duration.
6. The plasma generator according to claim 1, the control unit being configured to coordinate the sum of pulse duration and a corresponding pulse pause at the respective switching unit outputs such that the sum is equal in each case or that the sum at one of the switching unit outputs is a multiple of the sum at another switching unit output.
6. The plasma generator according to claim 1, the control unit being configured to coordinate the sum of pulse duration and a corresponding pulse pause at the respective switching unit outputs such that the sum is equal in each case or that the sum at one of the switching unit outputs is a multiple of the sum at another switching unit output.
7. The plasma generator according claim 1, wherein the control unit is further configured to perform at least one of the following: split individual pulses into two separate pulses with respect to the power requirements and to shift them in time if the power requirements would result in overlapping of pulses at different outputs, wherein a respective splitting of the pulse and a respective time shift are selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time; shift individual pulses in time with respect to the power requirements if the power requirements would lead to overlapping of pulses at different outputs, wherein a respective shift in time is selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time; and vary at least one of the following parameters of a pulse: a position of a pulse in a pulse sequence, a division of a pulse into partial pulses, a pulse duration, and an amplitude of a pulse when actual power requirements would lead to overlapping of pulses at different outputs.
7. The plasma generator according claim 1, wherein the control unit is further configured to perform at least one of the following: split individual pulses into two separate pulses with respect to the power requirements and to shift them in time if the power requirements would result in overlapping of pulses at different outputs, wherein a respective splitting of the pulse and a respective time shift are selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time; shift individual pulses in time with respect to the power requirements if the power requirements would lead to overlapping of pulses at different outputs, wherein a respective shift in time is selected such that the energy output at the respective outputs essentially corresponds to the power requirement over time; and vary at least one of the following parameters of a pulse: a position of a pulse in a pulse sequence, a division of a pulse into partial pulses, a pulse duration, and an amplitude of a pulse when actual power requirements would lead to overlapping of pulses at different outputs.
8. The plasma generator according to claim 1, wherein for the pulsed provision of electrical power at a frequency of at least 40 KHz to at least three process areas, the plasma generator further comprises: a control unit configured to obtain and evaluate process data about processes in the at least three process areas; an additional controllable power supply having an output, the controllable power supply being configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit; and an additional switching unit having a power input connected to the output of the additional power supply and having at least three switching unit outputs for respective connection to one of the at least three process areas; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 KHz as an output signal and to selectively output the output signal as a pulse having a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit; wherein the control unit is configured to coordinate power requirements of the at least three process areas and to drive the power supplies and the switching units such that at a respective one of the switching unit outputs, communicating with the process areas, the respective power corresponding to the power requirements is in substance available as pulses over time, wherein the pulses provided by one switching unit for the process areas are temporally offset from each other, while the pulses of the two switching units may overlap, wherein the power supplies may have different rated powers.
8. The plasma generator according to claim 1, wherein for the pulsed provision of electrical power at a frequency of at least 40 KHz to at least three process chambers, the plasma generator further comprises: a control unit configured to obtain and evaluate process data about processes in the at least three process chambers; an additional controllable power supply having an output, the controllable power supply being configured to output a direct current having a predetermined voltage and/or intensity at its output in response to a control signal from the control unit; and an additional switching unit having a power input connected to the output of the additional power supply and having at least three switching unit outputs for respective connection to one of the at least three process chambers; wherein the switching unit is configured to form from a direct current at the input an alternating current having a predetermined frequency of at least 40 KHz as an output signal and to selectively output the output signal as a pulse having a predetermined pulse duration to one of the switching unit outputs in response to a control signal from the control unit; wherein the control unit is configured to coordinate power requirements of the at least three process chambers and to drive the power supplies and the switching units such that at a respective one of the switching unit outputs, communicating with the process chambers, the respective power corresponding to the power requirements is in substance available as pulses over time, wherein the pulses provided by one switching unit for the process chambers are temporally offset from each other, while the pulses of the two switching units may overlap, wherein the power supplies may have different rated powers.
9. A plasma treatment apparatus comprising: at least two separate process areas in each of which a plasma can be generated; and a plasma generator according to claim 1, wherein the process areas are each connected to one of the switching unit outputs of the switching unit.
11. A plasma treatment apparatus comprising: at least two separate process chambers in each of which a plasma can be generated; and a plasma generator according to claim 1, wherein the process chambers are each connected to one of the switching unit outputs of the switching unit.
10. The plasma processing apparatus according to claim 9, wherein the at least two separate process areas comprises at least three process areas, wherein the switching unit of the plasma generator has at least three switching unit outputs, and the process areas are each connected to one of the switching unit outputs.
12. The plasma processing apparatus according to claim 11, wherein the at least two separate process chambers comprises at least three process chambers, wherein the switching unit of the plasma generator has at least three switching unit outputs, and the process chambers are each connected to one of the switching unit outputs.
12. The plasma generator according to claim 1, wherein the power corresponding to the power requirements can have a deviation of +/−5% of the power requirements.
9. The plasma generator according to claim 1, wherein the power corresponding to the power requirements can have a deviation of +/−5% of the power requirements.
13. The plasma generator according to claim 1, wherein the power corresponding to the power requirements can have a deviation of +/−2% of the power requirements.
10. The plasma generator according to claim 1, wherein the power corresponding to the power requirements can have a deviation of +/−2% of the power requirements.
15. A method for the pulsed provision of electrical power having a predetermined frequency of at least 40 KHz to at least two process areas, the method comprising the steps of: providing a direct current having a predetermined voltage and/or intensity at an input of a switching unit in response to a control signal from a control unit; and forming, from the direct current, an alternating current output signal having a predetermined frequency of at least 40 KHz in the switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse at one of at least two switching unit outputs of the switching unit, each of which is connected to one of the at least two process areas; wherein the control unit generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal in response to power requirements of the at least two process areas and in response to process data about processes in the at least two process areas, wherein the control signals are coordinated such that at the respective switching unit outputs, which are connected to the process areas, essentially the power corresponding to the power requirements is made available as pulses over time, and the pulses for the process areas are temporally offset with respect to each other, while the process areas operated simultaneously, wherein the control unit changes at least one of the following parameters of a pulse: a position of a pulse in a pulse sequence, a division of a pulse into partial pulses, a pulse duration and an amplitude of a pulse, if actual power requirements would lead to an overlapping of pulses at different outputs.
13. A method for the pulsed provision of electrical power having a predetermined frequency of at least 40 KHz to at least two process chambers, the method comprising the steps of: providing a direct current having a predetermined voltage and/or intensity at an input of a switching unit in response to a control signal from a control unit; and forming, from the direct current, an alternating current output signal having a predetermined frequency of at least 40 KHz in the switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse at one of at least two switching unit outputs of the switching unit, each of which is connected to one of the at least two process chambers; wherein the control unit generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal in response to power requirements of the at least two process chambers and in response to process data about processes in the at least two process chambers, wherein the control signals are coordinated such that at the respective switching unit outputs, which are connected to the process chambers, essentially the power corresponding to the power requirements is made available as pulses over time, and the pulses for the process chambers are temporally offset with respect to each other, while the process chambers operated simultaneously, wherein the control unit changes at least one of the following parameters of a pulse: a position of a pulse in a pulse sequence, a division of a pulse into partial pulses, a pulse duration and an amplitude of a pulse, if actual power requirements would lead to an overlapping of pulses at different outputs.
16. The method according to claim 15, wherein the control unit makes changes according to one of the following: predetermined fixed rules, rules adjustable by an operator, or by comparing the power output in pulses per process area over a period of time with the power requested over the period of time and automatically changing at least one parameter of a pulse on the basis of the comparison.
14. The method according to claim 13, wherein the control unit makes changes according to one of the following: predetermined fixed rules, rules adjustable by an operator, or by comparing the power output in pulses per process chamber over a period of time with the power requested over the period of time and automatically changing at least one parameter of a pulse on the basis of the comparison
17. The method according to claim 15, wherein the electrical power is provided to at least three process areas, wherein the switching unit has at least three switching unit outputs, each connected to one of the at least three process areas; and wherein the control unit generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal in response to power requirements of the at least three process areas and in response to process data about processes in the at least three process areas, wherein the control signals are coordinated such that at the respective switching outputs, which are connected to the process areas, the power corresponding to the power requirements is in substance made available as pulses over time, wherein the pulses for the process areas are temporally offset from each other, while the process areas are operated simultaneously.
15. The method according to claim 13, wherein the electrical power is provided to at least three process chambers, wherein the switching unit has at least three switching unit outputs, each connected to one of the at least three process chambers; and wherein the control unit generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal in response to power requirements of the at least three process chambers and in response to process data about processes in the at least three process chambers, wherein the control signals are coordinated such that at the respective switching outputs, which are connected to the process chambers, the power corresponding to the power requirements is in substance made available as pulses over time, wherein the pulses for the process chambers are temporally offset from each other, while the process chambers are operated simultaneously.
18. The method according to claim 15, wherein the control unit coordinates the sum of pulse duration and a corresponding pulse pause at the respective switching unit outputs such that the sum is equal in each case or that the sum at one of the switching unit outputs is a multiple of the sum at another switching unit output.
16. The method according to claim 13, wherein the control unit coordinates the sum of pulse duration and a corresponding pulse pause at the respective switching unit outputs such that the sum is equal in each case or that the sum at one of the switching unit outputs is a multiple of the sum at another switching unit output.
19. The method according to claim 15 for the pulsed provision of electrical power having a predetermined frequency of at least 40 KHz to at least three process areas, the method comprising the following further steps: providing a direct current having a predetermined voltage and/or intensity at an input of an additional switching unit in response to a control signal from the control unit; forming, from the direct current, an alternating current output signal having a predetermined frequency of at least 40 KHz in the additional switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse having a predetermined pulse duration at one of at least three switching unit outputs of the additional switching unit, each of which is connected to one of the at least three process areas; wherein the control unit, in response to power requirements of the at least three process areas and in response to process data about processes in the at least three process areas, generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal, wherein the control signals are coordinated such that at the respective switching unit outputs, which are connected to the process areas, the power corresponding to the power requirements is in substance made available as pulses over time, wherein the pulses which are output by one of the switching units are offset in time with respect to each other, while the pulses of the two switching units may overlap in time.
17. The method according to claim 13 for the pulsed provision of electrical power having a predetermined frequency of at least 40 KHz to at least three process chambers, the method comprising the following further steps: providing a direct current having a predetermined voltage and/or intensity at an input of an additional switching unit in response to a control signal from the control unit; forming, from the direct current, an alternating current output signal having a predetermined frequency of at least 40 KHz in the additional switching unit and, in response to a control signal from the control unit, selectively outputting the alternating current output signal as a pulse having a predetermined pulse duration at one of at least three switching unit outputs of the additional switching unit, each of which is connected to one of the at least three process chambers; wherein the control unit, in response to power requirements of the at least three process chambers and in response to process data about processes in the at least three process chambers, generates control signals for providing the direct current and control signals for selectively outputting the alternating current output signal, wherein the control signals are coordinated such that at the respective switching unit outputs, which are connected to the process chambers, the power corresponding to the power requirements is in substance made available as pulses over time, wherein the pulses which are output by one of the switching units are offset in time with respect to each other, while the pulses of the two switching units may overlap in time.
Claims 14, and 20 are rejected on the ground of non-statutory double patenting as being unpatentable over claims 1, 13 of U.S. Patent No US12087544 B2.
Referring to claim 14, U S patent Schulz544 claim 1 recites the plasma generator according to claim 1, but silent on wherein the at least two process areas comprise wafer boats, wafers in the wafer boats, and an atmosphere surrounding the wafer boats and the wafers in the wafer boats.
It is within the scope of a person with ordinary skill in the art to use wafer boats.
Referring to claim 20, U S patent Schulz544 claim 13 recites the method according to claim 15, wherein the at least two process areas comprise wafer boats, wafers in the wafer boats, and an atmosphere surrounding the wafer boats and the wafers in the wafer boats.
It is within the scope of a person with ordinary skill in the art to use wafer boats.
Conclusion
Claim 1-20 are rejected.
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/SRINIVAS SATHIRAJU/Examiner, Art Unit 2844 12/02/2025
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