Prosecution Insights
Last updated: October 02, 2026
Application No. 18/830,662

OZONE CONCENTRATOR, SUBSTRATE PROCESSING APPARATUS, AND OZONE SUPPLY METHOD

Non-Final OA §102
Filed
Sep 11, 2024
Priority
Sep 22, 2023 — JP 2023-159094
Examiner
CHORBAJI, MONZER R
Art Unit
Tech Center
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
76%
Grant Probability
Favorable
1-2
OA Rounds
6m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 76% — above average
76%
Career Allowance Rate
928 granted / 1214 resolved
+16.4% vs TC avg
Strong +21% interview lift
Without
With
+21.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 6m
Avg Prosecution
29 currently pending
Career history
1228
Total Applications
across all art units

Statute-Specific Performance

§101
2.6%
-37.4% vs TC avg
§103
46.5%
+6.5% vs TC avg
§102
36.1%
-3.9% vs TC avg
§112
10.8%
-29.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1214 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA This first action is on the merits for this regular application filed on 09/11/2024 Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-10 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Denvir et al. (US 6,120,822). Regarding claims 1 and 9-10, Denvir et al. discloses an ozone concentrator (Fig.1:14,16,38,17, and 22), a substrate processing apparatus (Fig.1:10) and an ozone supply method of supplying an ozone gas by an ozone concentrator (col.5, lines 28-42), comprising: a pump (Fig.1:16) provided in a supply passage (unlabeled pipes connecting 14, 16, 38, 17, 22, and 12 as shown in Fig.1) through which an ozone gas (Fig.1:14) flows; a flow rate controller (Fig.1:17) provided in the supply passage downstream of the pump (Fig.1:16); a pressure controller (Fig.1:38 and col.13, lines 35-42) configured to control a pressure of the supply passage between the pump (Fig.1:16) and the flow rate controller (Fig.1:17) to a set pressure (Fig.1:42, col.5, lines 54-61, and coll16, Example 2, lines 21-23); a processor (Fig.1:12) that is capable of being configured to process a substrate; and an ozone concentrator (Fig.1:14) connected (Fig.1:32, 22, and 12) to the processor, wherein the ozone concentrator includes: a pump (Fig.1:16) provided in a supply passage through which an ozone gas (Fig.1:14) flows; a flow rate controller (Fig.1:17) provided in the supply passage downstream of the pump (Fig.1:16); a pressure controller (Fig.1:38 and col.13, lines 35-42) configured to control a pressure of the supply passage between the pump (Fig.1:16) and the flow rate controller (Fig.1:17) to a set pressure (Fig.1:42, col.5, lines 54-61, and coll16, Example 2, lines 21-23); a pump (Fig.1:16) provided in a supply passage through which the ozone gas flows; a flow rate controller (Fig.1:17) provided in the supply passage downstream of the pump (Fig.1:16); a pressure controller (Fig.1:38 and col.13, lines 35-42) configured to control a pressure of the supply passage between the pump (Fig.1:16) and the flow rate controller (Fig.1:17) to a set pressure (Fig.1:42, col.5, lines 54-61, and coll16, Example 2, lines 21-23); and a pressure gauge (Fig.1:42) that is capable of being configured to detect a pressure of the supply passage downstream of the flow rate controller (Fig.1:17), and wherein the ozone supply method comprises controlling the set pressure (col.5, lines 54-61, and coll16, Example 2, lines 21-23) to be a sum of the pressure detected by the pressure gauge and a inimum required differential pressure (the set pressure value is made up of the pressure value obtained by pressure sensor 42 and the pressure of gas source 38) of the flow rate controller (col.13, lines 35-42). Regarding claim 2, Denvir et al. discloses that the pressure controller (Fig.1:42) is provided in a vacuum exhaust passage branched off (Fig.1:22) from the supply passage between the pump and the flow rate controller. Regarding claim 3, Denvir et al. discloses that the set pressure is a predetermined fixed value (col.16, Example 2, lines 20-23). Regarding claims 4 and 7, Denvir et al. discloses a pressure gauge (Fig.1:42) configured to detect a pressure (col.5, lines 57-61) of the supply passage downstream of the flow rate controller (Fig.1:17), wherein the set pressure is capable of being a variable value determined based on the pressure detected by the pressure gauge. Regarding claims 5 and 8, Denvir et al. discloses a controller configured to control the set pressure (col.5, lines 54-61, and coll16, Example 2, lines 21-23) to be a sum of the pressure detected by the pressure gauge and a minimum required differential pressure (the set pressure value is made up of the pressure value obtained by pressure sensor 42 and the pressure of gas source 38) of the flow rate controller (col.13, lines 35-42). Regarding claim 6, Denvir et al. discloses that the set pressure (col.5, lines 54-61, and coll16, Example 2, lines 21-23) is a predetermined fixed value. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MONZER R CHORBAJI whose telephone number is (571)272-1271. The examiner can normally be reached M-F 5:30-12:00 and 6:00-9:00. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jill J Warden can be reached at (571)272-1267. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MONZER R CHORBAJI/Primary Examiner, Art Unit 1799
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Prosecution Timeline

Sep 11, 2024
Application Filed
Sep 09, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
76%
Grant Probability
98%
With Interview (+21.3%)
2y 6m (~6m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1214 resolved cases by this examiner. Grant probability derived from career allowance rate.

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