Prosecution Insights
Last updated: April 19, 2026
Application No. 18/838,815

PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS

Non-Final OA §103
Filed
Aug 15, 2024
Examiner
NGUYEN, HUNG
Art Unit
2882
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Westlake University
OA Round
1 (Non-Final)
91%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
99%
With Interview

Examiner Intelligence

Grants 91% — above average
91%
Career Allow Rate
1313 granted / 1449 resolved
+22.6% vs TC avg
Moderate +9% lift
Without
With
+9.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
31 currently pending
Career history
1480
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
40.6%
+0.6% vs TC avg
§102
32.0%
-8.0% vs TC avg
§112
14.5%
-25.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1449 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-9 are rejected under 35 U.S.C. 103 as being unpatentable over Ghosh (U.S.Pat. 11,067,816) in view of Wieland et al (U.S 2006/0006349 A1). With respect to claim 1, Ghosh discloses a photoetching machine (100; see figure 1) with comprising: a control device (102); a light focusing array and an electric device workpiece table/Piezo Stage; a photoetching light source (106); a de-excitation light source (see figure 10, steps 1004-1008); an electro-optical modulation array (108); and wherein the photoetching light source and the de-excitation light source respectively emit an exposure Gaussian beam and a de-excitation Gaussian beam with different wavelengths (see figure 5A) and a doughnut-shaped depletion beam having a zero-intensity center (figures 5A) , the control device is connected to the electro-optical modulation array (108) and the electric device workpiece table for controlling the electro-optical modulation array for modulating a laser emitted by the laser light source and controlling the electric drive workpiece table to move based on a design layout/pattern (118). As to claim 5, Ghosh teaches focusing excitation/depletion beams (figure 1B) As to claim 6, Ghosh teaches optical alignment and focusing along an optical axis (figure 1B). As to claim 7, Ghosh explicitly discloses conversion of an excitation/depletion beam into a doughnut-shaped structured light beam via wavefront shaping (see figure 5A). As to claim 8, Ghosh discloses positioning substrates during exposure (see figure 5B). As to claim 9, Ghosh discloses precise spatial control of the exposure region. Ghosh does not expressly disclose an optical fiber transmission arrays for delivering the light beams, a first stage light splitting array and a second stage light splitting array, as recited in the claims. However, these features are well known in the art. For example, Wieland discloses an optical fiber transmission device, including optical fibers/fiber arrays configured to transmit modulated light beams in a lithography system (see fiber-based optical transmission description) and Wieland further teaches splitting light into a plurality of beamlets/light channels that propagate in parallel optical paths (see Figures 1A- 1b and description of plurality of beamlets and optical couplers) and Wieland discloses a control system that controls optical switching/modulation based on pattern or layout information in a lithography system (see figure 13). As to claim 2, the claim recites corresponding between light channels and modulation/control elements. Wieland teaches correspondence between individual beamlets/light channels and corresponding optical/modulation paths (see paragraph [0092]). As to claim 3, Wieland discloses transmitting multiple beamlets via optical fibers/fiber arrays (see paragraph [0034]). As to claim 4, Wieland teaches distributing light through multiple parallel channels to achieve controlled and uniform exposure (see paragraph [0092]). In view of such teachings, it would have been obvious to one of ordinary skill in the art at the time before the effective filling date of the claimed invention to combine the teachings of Wieland and Ghosh to obtain the claimed invention. It would have been obvious to a skilled artisan to incorporate the optical fiber transmission and multi-channel beam splitting architecture taught by Wieland into the photoetching machine of Ghosh in order to increase throughput and enable parallel exposure while retaining excitation/de-excitation beam shaping of Ghosh to improve resolution beyond the diffraction limit. Such a combination represents the predictable use of known lithography techniques to achieve improved performance. Prior Art Made of Record The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Johnson (U.S.Pat. 9,188,874) discloses a photoetching machine and has been cited for technical background. Any inquiry concerning this communication or earlier communications from the examiner should be directed to HUNG HENRY NGUYEN whose telephone number is (571)272-2124. The examiner can normally be reached Monday-Friday 7:00AM-4:30PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Toan Minh Ton can be reached at 571-272-2303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. HUNG HENRY NGUYEN Primary Examiner Art Unit 2882 Hvn 1/21/26 /HUNG V NGUYEN/ Primary Examiner, Art Unit 2882
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Prosecution Timeline

Aug 15, 2024
Application Filed
Jan 21, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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STAGE APPARATUS, EXPOSURE APPARATUS, METHOD OF MANUFACTURING FLAT PANEL DISPLAY, AND DEVICE MANUFACTURING METHOD
2y 5m to grant Granted Apr 14, 2026
Patent 12601979
MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM
2y 5m to grant Granted Apr 14, 2026
Patent 12601984
METROLOGY METHOD AND APPARATUS
2y 5m to grant Granted Apr 14, 2026
Patent 12591180
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
2y 5m to grant Granted Mar 31, 2026
Patent 12585182
OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES
2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
91%
Grant Probability
99%
With Interview (+9.0%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 1449 resolved cases by this examiner. Grant probability derived from career allow rate.

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