Tech Center 2800 • Art Units: 2851 2852 2882 2893 2899
This examiner grants 91% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18952436 | METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING MASK, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18753601 | CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETICLE AND EUV EXPOSURE APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19082370 | EXPOSURE APPARATUS, METHOD OF CONTROLLING EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING PRODUCT | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18984260 | INSPECTION SUPPORT DEVICE, INSPECTION SUPPORT METHOD, AND INSPECTION SUPPORT PROGRAM | Non-Final OA | FUJIFILM Corporation |
| 18628911 | EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER | Final Rejection | FUJIFILM Corporation |
| 18383525 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY | Non-Final OA | NIKON CORPORATION |
| 18788448 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18782783 | SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18771025 | EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD | Final Rejection | Tokyo Electron Limited |
| 19082502 | EUV TRANSMISSIVE MEMBRANE, PELLICLE, AND EXPOSURE METHOD | Non-Final OA | NGK INSULATORS, LTD. |
| 19086633 | LASER PROCESSING UNIT AND METHOD AND APPARATUS FOR MANAGING MASKS | Non-Final OA | ORC MANUFACTURING CO., LTD. |
| 19012047 | PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY | Non-Final OA | Carl Zeiss SMT GmbH |
| 18999071 | EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18998282 | OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18999537 | METHOD FOR PRODUCING OPTICAL ELEMENT | Non-Final OA | Mitsubishi Chemical Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy