Tech Center 2800 • Art Units: 2851 2882 2899
This examiner grants 91% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18899570 | LITHOGRAPHY TRACK SYSTEM | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18888268 | SEMICONDUCTOR PROCESS APPARATUS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18806848 | METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) ILLUMINATION SYSTEM, AND EUV EXPOSURE METHOD USING THE EUV ILLUMINATION SYSTEM | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18432182 | METHOD OF FORMING PHOTORESIST PATTERNS AND BAKING EQUIPMENT | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18628911 | EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER | Non-Final OA | FUJIFILM Corporation |
| 18775420 | DIGITAL LITHOGRAPHY APPARATUS WITH IMAGING DEVICE POSITIONED TO MITIGATE MOIRE EFFECT | Non-Final OA | Applied Materials, Inc. |
| 18788179 | CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYSTEM THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18788448 | SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18906920 | ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FACET MIRRORS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18437409 | EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS | Final Rejection | Carl Zeiss SMT GmbH |
| 18771025 | EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD | Non-Final OA | Tokyo Electron Limited |
| 18769841 | LIQUID TREATMENT METHOD AND STORAGE MEDIUM | Final Rejection | Tokyo Electron Limited |
| 18714547 | OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING | Non-Final OA | ASML NETHERLANDS B.V. |
| 18700780 | A FLUID EXTRACTION SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18286327 | METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL | Non-Final OA | ASML Netherlands B.V. |
| 18270988 | METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE ACTUATORS OF A LITHOGRAPHIC EXPOSURE APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18904718 | EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18902950 | PHOTOMASK AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Non-Final OA | Powerchip Semiconductor Manufacturing Corporation |
| 18849097 | APPARATUS FOR AND METHOD OF VIBRATION CANCELLATION FOR LASER WAVELENGTH AND BANDWIDTH STABILITY | Non-Final OA | Cymer, LLC |
| 18890360 | MULTI-CAMERA SYNCHRONIZATION FOR INSPECTION SYSTEMS | Non-Final OA | VIRTEK VISION INTERNATIONAL INC. |
| 18829227 | USE OF LAYOUT ANALYSIS TO ENABLE EFFICIENT AND EFFECTIVE RANDOM DEFECT INSPECTION USING A VECTOR-MODE E-BEAM INSPECTION MACHINE | Non-Final OA | PDF Solutions, Inc. |
| 18838815 | PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS | Non-Final OA | WESTLAKE UNIVERSITY |
| 18714411 | AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE | Non-Final OA | ASML NETHERLANDS B.V. P.O. |
| 18398651 | MICRO LED DETECTION DEVICE | Non-Final OA | BUENO OPTICS CO., LTD. |
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