Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2851 2852 2882 2893 2899
This examiner grants 91% of resolved cases
NGUYEN, HUNG operates within Tech Center 2800 and Art Unit 2851, where they have managed 1486 resolved cases. This volume of cases indicates the examiner's level of experience in handling patent applications within this technology sector. The examiner maintains an allowance rate of 90.7 percent, which provides a baseline for the probability of securing a patent grant. This percentage suggests the likelihood that an application reaching a final disposition will be allowed. Practitioners can use this figure to gauge the general receptivity of the examiner to patentable subject matter.
The data shows an interview lift of 9.0 percent, indicating how direct communication correlates with the probability of success. The interview lift of 9.0 percent is lower than the 90.7 percent allowance rate, which helps determine the relative impact of verbal engagement. The median days to allowance stands at 796, providing a timeline expectation for the prosecution process from filing to grant. This duration reflects the typical pendency for successful applications. Understanding these metrics allows for a more informed strategy when navigating the examination process with this examiner.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19007073 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18952436 | METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING MASK, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18628911 | EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER | Non-Final OA | FUJIFILM Corporation |
| 19082370 | EXPOSURE APPARATUS, METHOD OF CONTROLLING EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING PRODUCT | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18145035 | SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPER SOLUTION | Final Rejection | Intel Corporation |
| 18383525 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY | Non-Final OA | NIKON CORPORATION |
| 19068296 | METHOD OF USING WAFER STAGE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 19015027 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18931576 | METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18782783 | SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18771025 | EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD | Final Rejection | Tokyo Electron Limited |
| 18999537 | METHOD FOR PRODUCING OPTICAL ELEMENT | Non-Final OA | Mitsubishi Chemical Corporation |
| 19082502 | EUV TRANSMISSIVE MEMBRANE, PELLICLE, AND EXPOSURE METHOD | Non-Final OA | NGK INSULATORS, LTD. |
| 18998282 | OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 19047910 | CHAMBER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19009341 | GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19059808 | INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, METHOD FOR PRODUCING AN INTERMEDIATE PRODUCT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT | Non-Final OA | Carl Zeiss SMT GmbH |
| 18984649 | IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD | Non-Final OA | Carl Zeiss SMT GmbH |
| 18861859 | METHOD AND SYSTEM OF OVERLAY MEASUREMENT USING CHARGED-PARTICLE INSPECTION APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
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