Prosecution Insights
Last updated: August 18, 2026

Examiner: NGUYEN, HUNG

Tech Center 2800 • Art Units: 2851 2852 2882 2893 2899

This examiner grants 91% of resolved cases

Performance Statistics

90.8%
Allow Rate
+22.8% vs TC avg
1,506
Total Applications
+8.9%
Interview Lift
796
Avg Prosecution Days
Based on 1473 resolved cases, 2023–2026

Rejection Statute Breakdown

2.3%
§101 Eligibility
31.7%
§102 Novelty
40.3%
§103 Obviousness
15.2%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18952436 METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING MASK, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18753601 CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETICLE AND EUV EXPOSURE APPARATUS INCLUDING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
19082370 EXPOSURE APPARATUS, METHOD OF CONTROLLING EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING PRODUCT Non-Final OA CANON KABUSHIKI KAISHA
18984260 INSPECTION SUPPORT DEVICE, INSPECTION SUPPORT METHOD, AND INSPECTION SUPPORT PROGRAM Non-Final OA FUJIFILM Corporation
18628911 EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER Final Rejection FUJIFILM Corporation
18383525 ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY Non-Final OA NIKON CORPORATION
18788448 SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18782783 SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18771025 EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD Final Rejection Tokyo Electron Limited
19082502 EUV TRANSMISSIVE MEMBRANE, PELLICLE, AND EXPOSURE METHOD Non-Final OA NGK INSULATORS, LTD.
19086633 LASER PROCESSING UNIT AND METHOD AND APPARATUS FOR MANAGING MASKS Non-Final OA ORC MANUFACTURING CO., LTD.
19012047 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY Non-Final OA Carl Zeiss SMT GmbH
18999071 EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS Non-Final OA Carl Zeiss SMT GmbH
18998282 OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD Non-Final OA SCREEN Holdings Co., Ltd.
18999537 METHOD FOR PRODUCING OPTICAL ELEMENT Non-Final OA Mitsubishi Chemical Corporation

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