Prosecution Insights
Last updated: April 19, 2026
Application No. 18/847,832

VACUUM-BASED THIN FILM MODIFIER, THIN FILM MODIFICATION COMPOSITION INCLUDING VACUUM-BASED THIN FILM MODIFIER, METHOD OF FORMING THIN FILM USING THIN FILM MODIFICATION COMPOSITION, SEMICONDUCTOR SUBSTRATE INCLUDING THIN FILM, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE

Non-Final OA §102§Other
Filed
Sep 17, 2024
Examiner
MCDONOUGH, JAMES E
Art Unit
1734
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Soulbrain Co. Ltd.
OA Round
1 (Non-Final)
71%
Grant Probability
Favorable
1-2
OA Rounds
3y 2m
To Grant
82%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allow Rate
1017 granted / 1425 resolved
+6.4% vs TC avg
Moderate +11% lift
Without
With
+11.0%
Interview Lift
resolved cases with interview
Typical timeline
3y 2m
Avg Prosecution
50 currently pending
Career history
1475
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
59.6%
+19.6% vs TC avg
§102
17.8%
-22.2% vs TC avg
§112
10.3%
-29.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1425 resolved cases

Office Action

§102 §Other
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Applicant’s election without traverse of Group I, claims 1-9 in the reply filed on 12/22/2025 is acknowledged. Claims 10-17 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 12/22/2025. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-9 are rejected under 35 U.S.C. 102a)(1) as being anticipated by Clary et al. (USP 9,243,004) Regarding claims 1-4 and 6 Clary discloses a composition comprising (1-bromoethyl)benzene in tetrahydrofuran (i.e., THF) (Table 2, Entry 9). It is noted that (1-bromoethyl)benzene is an aromatic compound having a hydrocarbon group and a halogen group, and reads directly on Chemical Formula 1-2 of the instant claims. With respect to the limitations on being a vacuum based modifier for controlling film growth or quality of a vacuum based thin film formed from a precursor compound, it is noted that this is an intended or desires use. Further, as the composition of the reference reads directly on the claimed composition it is expected to also be capable of the same intended use. Regarding claim 5 The refractive index is a property of the composition, and as the reference is using an identical compound as claimed (i.e., (1-bromoethyl)benzene) it is expected to have the same properties. When the reference discloses all the limitations of a claim except a property or function, and the examiner cannot determine whether or not the reference inherently possesses properties which anticipate or render obvious the claimed invention but has basis for shifting the burden of proof to applicant as in In re Fitzgerald, 619 F.2d 67, 205 USPQ 594 (CCPA 1980). See MPEP § § 2112- 2112.02. Regarding claims 7-9 The dielectric constant of the solvent is a property of the composition, and as the reference is using an identical solvent as claimed (i.e., THF) it is expected to have the same properties. When the reference discloses all the limitations of a claim except a property or function, and the examiner cannot determine whether or not the reference inherently possesses properties which anticipate or render obvious the claimed invention but has basis for shifting the burden of proof to applicant as in In re Fitzgerald, 619 F.2d 67, 205 USPQ 594 (CCPA 1980). See MPEP § § 2112- 2112.02. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JAMES E MCDONOUGH whose telephone number is (571)272-6398. The examiner can normally be reached Mon-Fri 10-10. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jonathan Johnson can be reached at 5712721177. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. JAMES E. MCDONOUGH Examiner Art Unit 1734 /JAMES E MCDONOUGH/Primary Examiner, Art Unit 1734
Read full office action

Prosecution Timeline

Sep 17, 2024
Application Filed
Feb 27, 2026
Non-Final Rejection — §102, §Other (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
71%
Grant Probability
82%
With Interview (+11.0%)
3y 2m
Median Time to Grant
Low
PTA Risk
Based on 1425 resolved cases by this examiner. Grant probability derived from career allow rate.

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